A glass-ceramic article includes at least one substrate, such as a plate, made of glass-ceramic, the substrate having a face including a microtexturing such that the arithmetic mean surface roughness Ra, measured according to standard ISO 4287, is between 0.14 and 0.40 μm, and the total roughness, Rt, measured according to standard ISO 4287, is between 1.15 and 5.00 μm.

The present invention relates to a method for producing a chemically strengthened glass substrate, the method including the following steps (A) to (C): (A) preparing a chemically strengthened glass substrate A having a main surface and an end surface; (B) obtaining a glass substrate by polishing a surface of the chemically strengthened glass substrate A; and (C) performing ion exchange by bringing the glass substrate into contact with an inorganic salt composition including 90% by mass or more of KNO.sub.3 and 1.0% by mass or more and 6.0% by mass or less of NaNO.sub.3 to obtain a chemically strengthened glass substrate C.

Provided is a manufacturing method for a thin phosphor glass plate by which a thin phosphor glass plate can be more certainly produced. A manufacturing method includes the steps of: preparing a phosphor glass base material 21 having a first principal surface 21a and a second principal surface 21b opposed to each other; placing the phosphor glass base material 21 on a stage 22 and fixing the second principal surface 21b onto the stage 22; and polishing the first principal surface 21a of the phosphor glass base material 21 with a polishing member 23 including an abrasive layer 24.

The present disclosure provides a device for repairing appearance defects and repair method. The device comprises: a moving platform and at least one repair mechanism, each the repair mechanism comprises at least one sub-repair mechanism, each the sub-repair mechanism comprises a first moving portion, a second moving portion, and a repair portion; the moving platform is configured to support an apparatus to be repaired and move in a first direction to drive the apparatus to be repaired to move in the first direction; the first moving portion is configured to move in a second direction to drive the repair portion to move in the second direction, and the second direction intersects the first direction perpendicularly; the second moving portion is configured to move in a third direction to drive the repair portion to move in the third direction.

A grinding apparatus includes a table that holds a workpiece, and a grinding unit including a grinding wheel mounted to a spindle. The grinding wheel has a grindstone formed by binding abrasive grains with a bonding agent. In addition, the grinding apparatus further includes: a supply unit that supplies grinding water to at least the grindstone when grinding the workpiece; and a light applying unit that is disposed adjacent to the table and that applies light to a grinding surface of the grindstone grinding the workpiece held by the table. The light applying unit includes a light emission section that emits light, and a diffusion preventive wall that surrounds the light emission section and prevents diffusion of the light.

A glass polishing apparatus includes a jig that holds a glass structure. The glass polishing apparatus includes a first flat portion, a second flat portion opposite to the first flat portion, and a curved portion connecting the first flat portion to the second flat potion The jig and includes a first holding surface holding the first flat portion, a second holding surface disposed opposite to the first holding surface and holding the second flat portion, and a third holding surface connecting the first holding surface to the second holding surface and holding the curved portion. At least a portion of a roller unit having a cylindrical shape is inserted between the first flat portion and the second flat portion.

A cleaning method capable of removing abrasive grains adhering to a light passage provided in a polishing table is disclosed. The cleaning method includes: while supplying slurry containing abrasive grains onto a polishing pad supported by a polishing table, placing a substrate in sliding contact with the polishing pad to polish the substrate; during polishing of the substrate, directing light to the substrate through a light passage provided in the polishing table, and causing reflected light from the substrate to pass through the light passage; removing the polished substrate from the polishing pad; and supplying a chemical liquid into the light passage when the substrate is not present on the polishing pad to remove the abrasive grains adhering to the light passage by the chemical liquid.

A method for forming a depression into a glass object for storing cremated remains may include coating a metal sphere with diamond dust. The method may include spinning the diamond dust coated metal sphere via a spindle and motor arrangement. The method further may include pressing the spinning diamond dust coated metal sphere against at least one face of the glass object. Furthermore, the method may include applying coolant while pressing the spinning diamond dust coated metal sphere against at least one face of the glass object. The continuous spin and pressure of the diamond dust coated metal sphere against at least one face of the glass object grinds the depression into the glass object.

A method for forming a depression into a glass object for storing cremated remains may include coating a metal sphere with diamond dust. The method may include spinning the diamond dust coated metal sphere via a spindle and motor arrangement. The method further may include pressing the spinning diamond dust coated metal sphere against at least one face of the glass object. Furthermore, the method may include applying coolant while pressing the spinning diamond dust coated metal sphere against at least one face of the glass object. The continuous spin and pressure of the diamond dust coated metal sphere against at least one face of the glass object grinds the depression into the glass object.

A polishing agent for a synthetic quartz glass substrate contains polishing particles and water. The polishing particles are composite oxide particles of cerium and yttrium. A content by percent of the cerium in the polishing particles is 71 mol % or more and 79 mol % or less. This provides a polishing agent for a synthetic quartz glass substrate, the polishing agent being capable of sufficiently reducing generation of defects on the surface of the synthetic quartz glass substrate due to polishing without decreasing the polishing rate.