Patent classifications
B24B7/241
Glass device housings
An electronic device may have a glass housing structures. The glass housing structures may be used to cover a display and other internal electronic device components. The glass housing structure may have multiple glass pieces that are joined using a glass fusing process. A peripheral glass member may be fused along the edge of a planar glass member to enhance the thickness of the edge. A rounded edge feature may be formed by machining the thickened edge. Raised fused glass features may surround openings in the planar glass member. Multiple planar glass members may be fused together to form a five-sided box in which electronic components may be mounted. Raised support structure ribs may be formed by fusing glass structures to a planar glass member. Opaque masking material and colored glass may be used to create portions of the glass housing structures that hide internal device components from view.
Method of grinding wafer
Disclosed herein is a grinding wheel including an annular wheel base and a plurality of grinding stones fixed to an outer circumferential portion of the lower end of the annular wheel base. Each of the grinding stones is made of a mixture of abrasive grains and photocatalytic particles which are held together by a binder. The abrasive grains are diamond abrasive grains, and the photocatalytic particles are titanium oxide (TiO.sub.2) particles.
Polishing pads and systems and methods of making and using the same
The present disclosure relates to polishing pads which include a polishing layer, wherein the polishing layer includes a working surface and a second surface opposite the working surface. The working surface includes a plurality of precisely shaped pores, a plurality of precisely shaped asperities and a land region. The present disclosure further relates to a polishing system, the polishing system includes the preceding polishing pad and a polishing solution. The present disclosure relates to a method of polishing a substrate, the method of polishing including: providing a polishing pad according to any one of the previous polishing pads; providing a substrate, contacting the working surface of the polishing pad with the substrate surface, moving the polishing pad and the substrate relative to one another while maintaining contact between the working surface of the polishing pad and the substrate surface, wherein polishing is conducted in the presence of a polishing solution.
GLASS-PLATE WORKING APPARATUS
A glass-plate working apparatus 1 includes: a scribe line forming device 5, glass-plate bend-breaking devices 15A and 15B, glass-plate peripheral edge grinding devices 19A and 19B, and a glass-plate transporting device 20 for carrying in and carrying out two glass plates 2 at a time with respect to each of the scribe line forming device 5, the glass-plate bend-breaking devices 15A and 15B, and the glass-plate peripheral edge grinding devices 19A and 19B, and X-Y coordinate system controlled movement of the glass-plate peripheral edge grinding devices 19A and 19B in simultaneous grinding of peripheral edges of the glass plates 2 is adapted to be effected independently of each other.
Exterior mirror reflective element with auxiliary reflector
A mirror reflective element suitable for use in an exterior rearview mirror assembly of a vehicle includes a glass substrate having a first side and an opposing second side. The mirror reflective element has a principal reflector portion and an auxiliary reflector portion. The auxiliary reflector portion includes a curved recess established at the second side of the glass substrate. An auxiliary mirror metallic reflector is coated at the curved recess at the second side of the glass substrate and a principal mirror metallic reflector is coated at the principal reflector portion. The mirror reflective element is configured so that, when an exterior rearview mirror assembly equipped with the mirror reflective element is normally mounted at a side of a vehicle, the curved recess is disposed at an outboard upper region of the mirror reflective element relative to the side of the equipped vehicle.
Method for producing a mirror substrate blank of titanium-doped silica glass for EUV lithography, and system for determining the position of defects in a blank
A method for producing a mirror substrate blank made from titanium-doped silica glass for EUV lithography, having a thickness of at least 40 millimeters, includes steps of face grinding the surface of the blank and identifying data on defects in a surface layer of the blank. Light penetrates the blank at a predetermined angle of incidence of less than 90 at a location on the flat surface of the blank. The light scatters on a defect in the blank, and the scattered light is detected at a distance x from the penetration location on the surface of the blank by a light detection element arranged perpendicularly thereabove. The method further includes steps of determining the position of the defect in the surface layer based on the obtained data, and partial or complete removal of the surface layer in consideration of the position determination and forming the mirror substrate blank.
GLASS POLISHING APPARATUS AND GLASS POLISHING METHOD USING THE SAME
A glass polishing apparatus includes a jig that holds a glass structure. The glass polishing apparatus includes a first flat portion, a second flat portion opposite to the first flat portion, and a curved portion connecting the first flat portion to the second flat portion. The jig and includes a first holding surface holding the first flat portion, a second holding surface disposed opposite to the first holding surface and holding the second flat portion, and a third holding surface connecting the first holding surface to the second holding surface and holding the curved portion. At least a portion of a roller unit having a cylindrical shape is inserted between the first flat portion and the second flat portion.
Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
In polishing of synthetic quartz glass substrates, a polishing slurry is used comprising (i) an oligopeptide comprising recurring units of pentapeptide: -[valine-proline-glycine-valine-glycine]- and having a molecular weight of 800-150,000 or a copolymer of the pentapeptide with another monomer, and (ii) a colloidal solution.
EXTERIOR MIRROR REFLECTIVE ELEMENT WITH AUXILIARY REFLECTOR
A mirror reflective element suitable for use in an exterior rearview mirror assembly of a vehicle includes a glass substrate having a first side and an opposing second side. The mirror reflective element has a principal reflector portion and an auxiliary reflector portion. The auxiliary reflector portion includes a curved recess established at the second side of the glass substrate. An auxiliary mirror metallic reflector is coated at the curved recess at the second side of the glass substrate and a principal mirror metallic reflector is coated at the principal reflector portion. The mirror reflective element is configured so that, when an exterior rearview mirror assembly equipped with the mirror reflective element is normally mounted at a side of a vehicle, the curved recess is disposed at an outboard upper region of the mirror reflective element relative to the side of the equipped vehicle.
PROCESS FOR FABRICATING CHLORO ALKALI PHOSPHATE DOPED/ CODOPED BY RARE EARTH IONS FOR OPTICAL LASER AMPLIFIERS
The present invention generally relates to a process for fabricating Chloro Alkali Phosphate Doped/Codoped by rare earth ions for optical laser amplifiers. The process includes mixing 38-42 wt. % of Phosphorus pentoxide (P.sub.2O.sub.5), 28-32 wt. % of Zinc oxide (ZnO), 9-11 wt. % of Barium fluoride (BaF.sub.2), 17-19 wt. % of Lithium chloride (LiCl), and 1-3 wt. % of Lead(II) fluoride (PbF.sub.2); filling a silica, platinum, and alumina crucible to the mixture; heating the mixture upon increasing a furnace temperature to 1000-1050 C. at a rate of 10 C. per minute and maintaining it for two hours to melt the glass; and pouring the glass melt into a preheated stainless steel mold at 350 C. and transferring the mold to a holding furnace heated to 350-370 C. and annealing for two hours thereby cooling to room temperature to obtain Chloro Alkali Phosphate matrix glass that is undoped, doped, or codoped with high thermal stability.