A pad conditioner includes a carrier, at least one abrasive element, and a spacer. The carrier includes a surface with an exposed region and a plurality of mounting regions. The abrasive element is disposed on the mounting region of the carrier, and at least one abrasive element has a working surface including a plurality of features each having a distal end. The spacer is disposed on the surface of the carrier and covers at least a portion of the exposed region. The spacer has a first surface and a second surface, wherein the second surface is opposed to the first surface and adjacent to the surface of the carrier. The distance D1 between the distal end of the highest feature of the at least one abrasive element and the surface of the carrier is greater than the distance D2 between the first surface of the spacer and the surface of the carrier.

A formulation, system, and method for additive manufacturing of a polishing pad. The formulation includes monomer, dispersant, and nanoparticles. A method of preparing the formulation includes adding a dispersant that is a polyester derivative to monomer, adding metal-oxide nanoparticles to the monomer, and subjecting the monomer having the nanoparticles and dispersant to sonication to disperse the nanoparticles in the monomer.

A surface machining method for a single crystal SiC substrate, including: a step of mounting a grinding plate which includes a soft pad and a hard pad sequentially attached onto a base metal having a flat surface, a step of generating an oxidation product by using the grinding plate, and a step of grinding the surface while removing the oxidation product, wherein abrasive grains made of at least one metallic oxide that is softer than single crystal SiC and has a bandgap are fixed to the surface of the hard pad.

A method of polishing an SiC substrate in contact with a polishing pad containing abrasive grains includes the steps of polishing the SiC substrate while supplying an acid polishing liquid to an area where the SiC substrate and the polishing pad contact each other, and thereafter, polishing the SiC substrate while supplying only water to the area while stopping supplying the acid polishing liquid.

A polishing method capable of removing waviness on a resin-coated surface having a curved surface is provided. The resin-coated surface having the curved surface is polished by using a polishing pad having a polishing surface formed of a hard resin layer.

A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a base material from a first nozzle and an additive material from a second nozzle and solidifying the base and additive material to form a solidified pad material.

The present invention is objected to polish the surface of the object material with a high quality at a high polishing rate. The object surface is polished using a wet polishing method. Slurry is produced by scattering abrasive particles into pure water. In the abrasive particle, where components which has a mechanochemical effect and which reacts to the friction heat generated in polishing the object material are joined with each other and integrated to a particle. There, respective component is joined with each other using a mechanical alloying process, while maintaining the inherent material properties. When the slurry is used in a lapping process of sapphire, silicon carbide, gallium nitride and the like, the polishing process can be substantially shortened and the processing cost is drastically reduced. Further, it secures a high quality of the polishing surface. The abrasive particle can be used repeatedly in the polishing process. Since the pH value of the slurry is around 3 to 9, it does not deteriorate working environment and the liquid-waste treatment is easy.

Embodiments described herein relate to integrated abrasive (IA) polishing pads, and methods of manufacturing IA polishing pads using, at least in part, surface functionalized abrasive particles in an additive manufacturing process, such as a 3D inkjet printing process. In one embodiment, a method of forming a polishing article includes dispensing a first plurality of droplets of a first precursor, curing the first plurality of droplets to form a first layer comprising a portion of a sub-polishing element, dispensing a second plurality of droplets of the first precursor and a second precursor onto the first layer, and curing the second plurality of droplets to form a second layer comprising portions of the sub-polishing element and portions of a plurality of polishing elements. Here, the second precursor includes functionalized abrasive particles having a polymerizable group chemically bonded to surfaces thereof.

Magnetic sample holders for abrasive operations include an array of magnets embedded in a matrix material. Each magnet of the array is positioned between about 0 mm and about 4 mm from at least one adjacent magnet of the array. Exposed surfaces of the magnets of the array are coplanar with a planar working surface of the matrix material. Methods of forming a polycrystalline diamond compact element include magnetically securing an alloy sample to an array of magnets embedded in a matrix. Each of the magnets of the array is within about 4 mm of at least one adjacent magnet of the array. A portion of the alloy sample is abraded away, and the alloy sample is positioned proximate to diamond grains and a substrate. The alloy sample, diamond grains, and substrate are subjected to a high pressure/high temperature process to sinter the diamond grains.

A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a base material from a first nozzle and an additive material from a second nozzle and solidifying the base and additive material to form a solidified pad material.