Patent classifications
B24D3/30
Sintered metal carbide containing diamond particles and induction heating method of making same
A method to produce a sintered metal carbide article containing diamond particles throughout said article is disclosed. In one embodiment, the method involves creating a mixture of metal carbide (MC) particles, metallic binder (MB) particles and coated diamond (D) particles is compacted into a desired shape and then heated at a temperature below the graphitization temperature of the D particles to produce an under sintered MC-MB-D article which is then rapidly heated in an induction heating device to surprisingly produce a sintered MC-MB-D article containing diamond particles throughout the article. The MC-MB-D article exhibits excellent drilling/cutting capacity and surprisingly high impact resistance. One useful MC-B-D article made according to the disclosed invention is a tungsten carbide-cobalt (WCCo) article containing diamonds WCCo-D throughout the article.
SYSTEMS AND METHODS FOR MAKING ABRASIVE ARTICLES
Methods of making an abrasive article. Abrasive particles are loaded to a distribution tool including a plurality of walls defining a plurality of slots. Each slot is open to a lower side of the tool. The loaded particles are distributed from the distribution tool to a major face of a backing web below the lower side and moving relative to the tool. At least a majority of the particles distributed from the tool undergo an orientation sequence in which each particle first enters one of the slots. The particle then passes partially through the slot such that a first portion is beyond the lower side and in contact with the major face, and a second portion within the slot. The sequence then includes the particle remaining in simultaneous contact with one of the walls and the major face for a dwell period while the web moves relative to the tool.
SYSTEMS AND METHODS FOR MAKING ABRASIVE ARTICLES
Methods of making an abrasive article. Abrasive particles are loaded to a distribution tool including a plurality of walls defining a plurality of slots. Each slot is open to a lower side of the tool. The loaded particles are distributed from the distribution tool to a major face of a backing web below the lower side and moving relative to the tool. At least a majority of the particles distributed from the tool undergo an orientation sequence in which each particle first enters one of the slots. The particle then passes partially through the slot such that a first portion is beyond the lower side and in contact with the major face, and a second portion within the slot. The sequence then includes the particle remaining in simultaneous contact with one of the walls and the major face for a dwell period while the web moves relative to the tool.
CMP POLISHING PAD
A polishing pad has a polishing layer comprising a polymer matrix comprising the reaction product of an isocyanate terminated urethane prepolymer and a chlorine-free aromatic polyamine cure agent and chlorine-free microelements. The microelements can be expanded, hollow microelements. The microelements can have a specific gravity measured of 0.01 to 0.2. The microelements can have a volume averaged particle size of 1 to 120 or 15 to 30 micrometers. The polishing layer is chlorine free.
CMP POLISHING PAD
A polishing pad has a polishing layer comprising a polymer matrix comprising the reaction product of an isocyanate terminated urethane prepolymer and a chlorine-free aromatic polyamine cure agent and chlorine-free microelements. The microelements can be expanded, hollow microelements. The microelements can have a specific gravity measured of 0.01 to 0.2. The microelements can have a volume averaged particle size of 1 to 120 or 15 to 30 micrometers. The polishing layer is chlorine free.
CMP polishing pad with window having transparency at low wavelengths and material useful in such window
The polishing pad is useful in chemical mechanical polishing. The polishing pad includes a polishing portion having a top polishing surface and a polishing material. There is an opening through the polishing pad and a transparent window within the opening. The transparent window is secured to the polishing pad. The window includes a polyurethane composition formed by reacting, in the presence of a hard segment inhibitor for reducing size of hard segment domains, a polymeric polyol, a polyisocyanate and a curing agent. The curing agent includes three or more hydroxyl groups forming hard segments and the polyurethane composition is an amorphous mixture of hard segments in a soft segments matrix and is free of carbon-carbon double bonds.
CMP polishing pad with window having transparency at low wavelengths and material useful in such window
The polishing pad is useful in chemical mechanical polishing. The polishing pad includes a polishing portion having a top polishing surface and a polishing material. There is an opening through the polishing pad and a transparent window within the opening. The transparent window is secured to the polishing pad. The window includes a polyurethane composition formed by reacting, in the presence of a hard segment inhibitor for reducing size of hard segment domains, a polymeric polyol, a polyisocyanate and a curing agent. The curing agent includes three or more hydroxyl groups forming hard segments and the polyurethane composition is an amorphous mixture of hard segments in a soft segments matrix and is free of carbon-carbon double bonds.
SHEET-LIKE ABRASIVE ARTICLE
[Problem]
Provided is a long-life sheet-like abrasive article which comprises an abrasive material layer comprising closed-cell bodies and abrasive grains, wherein the closed-cell bodies not only provide air voids for discharging chips, but also ensure a space between the surface of the abrasive material layer and a workpiece material, thereby facilitating discharge of chips of the workpiece material, and, as the closed-cell bodies in a surface part of the abrasive material layer break up due to friction caused by an abrading work, new abrasive grains act on a workpiece material, thereby allowing the abrasive material layer to have self-dressing ability.
[Solution]
The sheet-like abrasive article comprises a substrate, and an abrasive material layer provided on one surface of the substrate, wherein the abrasive material layer comprises closed-cell bodies, first abrasive grains, and a first adhesive binder, wherein: each of the closed-cell bodies has an inner diameter of 30 m to 200 m; the first abrasive grains have an average grain size which is equal to or less than of one third of the inner diameter of each of the closed-cell bodies; and the first adhesive binder adhesively bonds the abrasive material layer to the substrate, and wherein the closed-cell bodies, the first abrasive grains and the first adhesive binder account for 70% by volume to 85% by volume, 5% by volume to 13% by volume, and a remainder, respectively, based on a volume of an entirety of the abrasive material layer.