Disclosed herein is a method for forming a surface relief microstructure, including the steps of A) applying a curable composition to at least a portion of the frontside of the paper substrate, B) contacting at least a portion of the curable composition with surface relief microstructure, C) curing the composition by using at least one UV lamp which is arranged on the backside of the paper substrate, and D) depositing a metallic layer, and optionally a layer of a transparent high refractive index material, on at least a portion of the cured composition, wherein the UV lamp has an emission peak in a UV-A range of 320 nm to 400 nm and additionally in a near VIS range of 400 nm to 450 nm, the curable composition comprises a photoinitiator which absorbs in the UV-A range and also in the near VIS range.

Disclosed herein is a method for forming a surface relief microstructure, including the steps of A) applying a curable composition to at least a portion of the frontside of the paper substrate, B) contacting at least a portion of the curable composition with surface relief microstructure, C) curing the composition by using at least one UV lamp which is arranged on the backside of the paper substrate, and D) depositing a metallic layer, and optionally a layer of a transparent high refractive index material, on at least a portion of the cured composition, wherein the UV lamp has an emission peak in a UV-A range of 320 nm to 400 nm and additionally in a near VIS range of 400 nm to 450 nm, the curable composition comprises a photoinitiator which absorbs in the UV-A range and also in the near VIS range.

A credit card with an obscurable account identifier. The credit card further comprises a substrate defining a first surface with a chromogenic feature wherein the chromogenic feature is capable of changing from a first state and a second state based on an activating trigger. In the first state, the chromogenic feature appears with a first optical property that obscures the account identifier, and in the second state, the chromogenic feature appears with a second optical property that reveals the account identifier.

A plasmonic structure having an identifier pattern indicating a genuine product for preventing counterfeiting, falsification or reuse, includes a metal layer; a photoconversion pattern layer including a plurality of photoconverting nanoparticles disposed in a pattern on and in direct contact with the metal layer; a metal pattern layer including a plurality of metal particles disposed in a pattern on and in direct contact with the photoconversion pattern layer; and an adhesive film disposed on the metal pattern layer. An identifier pattern indicating a genuine product is easily identified even by visual inspection after irradiation with infrared light irradiation. The plasmonic structure is fundamentally impossible to re-assemble after deformation of the plasmonic structure caused by disassembly of a product or packaging container, thereby preventing counterfeiting, falsification or reuse.

A plasmonic structure having an identifier pattern indicating a genuine product for preventing counterfeiting, falsification or reuse, includes a metal layer; a photoconversion pattern layer including a plurality of photoconverting nanoparticles disposed in a pattern on and in direct contact with the metal layer; a metal pattern layer including a plurality of metal particles disposed in a pattern on and in direct contact with the photoconversion pattern layer; and an adhesive film disposed on the metal pattern layer. An identifier pattern indicating a genuine product is easily identified even by visual inspection after irradiation with infrared light irradiation. The plasmonic structure is fundamentally impossible to re-assemble after deformation of the plasmonic structure caused by disassembly of a product or packaging container, thereby preventing counterfeiting, falsification or reuse.

A method of manufacturing an image pattern for a security device includes providing a metallised substrate; applying a first photosensitive resist layer to a substrate first metal layer exposing the resist layer to radiation; exposing the resist layer to a first reactant substance; activating a cross linking agent in the resist layer; exposing first and second pattern elements of the resist layer to radiation of a wavelength to which the resist layer is responsive whereupon newly-exposed first pattern elements of the first photosensitive resist layer react, resulting in increased solubility by the second etchant substance, the second pattern elements remaining relatively insoluble by the second etchant substance; and applying first and second etchant substances to the substrate whereupon the first pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining second pattern elements of the first metal layer forming an image pattern.

A credit card with an obscurable account identifier. The credit card further comprises a substrate defining a first surface with a chromogenic feature wherein the chromogenic feature is capable of changing from a first state and a second state based on an activating trigger. In the first state, the chromogenic feature appears with a first optical property that obscures the account identifier, and in the second state, the chromogenic feature appears with a second optical property that reveals the account identifier.

Aspects of the present disclosure include an anti-counterfeiting pattern that is identifiable by sheet resistance mapping metrology, a method of fabricating such an anti-counterfeiting device, and a method of detecting such an anti-counterfeiting device by imaging the pattern with sheet resistance mapping metrology. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Aspects of the present disclosure include an anti-counterfeiting pattern that is identifiable by sheet resistance mapping metrology, a method of fabricating such an anti-counterfeiting device, and a method of detecting such an anti-counterfeiting device by imaging the pattern with sheet resistance mapping metrology. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Products, such as branding labels and currency, fabricated to include an optical security element. The optical security assembly may include a carrier film or substrate. An image element, e.g., a printed ink layer, is provided on a first surface of the carrier film/substrate, and the optical security assembly further includes an array or plurality of micro lenses on a second surface of the carrier film/substrate opposite the image element. In order to make the registration and print requirements easier, a mask is provided between the printed ink layer to define color pixels, and the printed ink layer is provided in the form of color blocks in a checkboard pattern with each block aligned with a portion of the mask and a subset of the holes or openings that define the viewable color pixels.