This application relates to a method of forming nano-patterns on a substrate comprising the step of forming a plurality of nanostructures on a dielectric substrate, wherein the nanostructures are dimensioned or spaced apart from each other by a scaling factor of the dielectric substrate with reference to a silicon substrate.

A surface acoustic wave (SAW) performs a rapid, label-free detection of biological species. Biosensing and detection of multiple analytes multiplexed by an array of sensing lanes is configured to enable bio-amplification using engineered DNA encoded libraries as the probe through a phage display procedure to enhance specificity, capture statistics for the detection, screening and analyzing of the analyte in vitro. A biochemical formulation minimizes the limit of detection (LOD) at a threshold magnitude on the order of a femtomolar concentration. Additional enhancement of the apparatus is achieved by use of an analog front end to amplify biochemical events.

Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause phototransistors or electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler.

The disclosure relates to a method for producing a sequencing unit for sequencing a biochemical material. In this case, at least one sequencing pore for sequencing the biochemical material in a precursor layer is created in a thermal lithography process in order to produce a pre-structured layer. The pre-structured layer is then converted into a graphene layer by heating to a conversion temperature in order to produce the sequencing unit. The sequencing pore is reduced to a size suitable for sequencing, depending on the transformation temperature.

The present invention relates to a molding die comprising a base portion and a pattern portion having recesses and protrusions provided on a surface of the base portion, wherein a distance between the centers of protruding portions of the pattern portion is 15 to 50 nm, a ratio of recessed and protruding portion (protrusion/distance between centers of the protruding portions) of the pattern portion is 0.5 or less, a height of the protruding portion of the pattern portion is 2 nm or more, and a defect density of the pattern portion is 10×10.sup.10 cm.sup.2 or less. The present invention also relates to a lens comprising a base portion and a pattern portion having recesses and protrusions provided on a surface of the base portion, wherein a distance between centers of protruding portions of the pattern portion is 15 to 50 nm.

Methods for forming an electrode structure, which can be used as a biosensor, are provided in which the electrode structure has non-random topography located on one surface of an electrode base. In some embodiments, an electrode structure is obtained that contains no interface between the non-random topography of the electrode structure and the electrode base of the electrode structure. In other embodiments, electrode structures are obtained that have an interface between the non-random topography of the electrode structure and the electrode base of the electrode structure.

Technologies are described for methods and systems effective for etching nanostructures in a substrate. The methods may comprise depositing a patterned block copolymer on the substrate. The patterned block copolymer may include first and second polymer block domains. The methods may comprise applying a precursor to the patterned block copolymer to generate an infiltrated block copolymer. The precursor may infiltrate into the first polymer block domain and generate a material in the first polymer block domain. The methods may comprise applying a removal agent to the infiltrated block copolymer to generate a patterned material. The removal agent may be effective to remove the first and second polymer block domains from the substrate. The methods may comprise etching the substrate. The patterned material on the substrate may mask the substrate to pattern the etching. The etching may be performed under conditions to produce nanostructures in the substrate.

A method (200) for fabricating patterns on the surface of a layer of a device (100), the method comprising: providing at least one layer (130, 230); adding at least one alkali metal (235) comprising Cs and/or Rb; controlling the temperature (2300) of the at least one layer, thereby forming a plurality of self-assembled, regularly spaced, parallel lines of alkali compound embossings (1300, 1305) at the surface of the layer. The method further comprises forming cavities (236, 1300) by dissolving the alkali compound embossings. The method (200) is advantageous for nanopatterning of devices (100) without using templates and for the production of high efficiency optoelectronic thin-film devices (100).

A method for forming a chemical guiding structure for self-assembling organic nano-objects by chemo-epitaxy, the method including forming on a substrate sacrificial patterns having a critical dimension in a plane parallel to the substrate; forming on the substrate, between the sacrificial patterns, a first pattern made of a first polymer material, the first polymer material having a first chemical affinity with respect to the organic nano-objects; partially etching the sacrificial patterns so as to reduce the critical dimension of the sacrificial patterns, the sacrificial patterns being etched selectively with respect to said first pattern using a first wet etching method; forming on the substrate, in areas created by the partial etching of the sacrificial patterns, second patterns made of a second polymer material, the second polymer material having a second chemical affinity with respect to the organic nano-objects, different from the first chemical affinity; and removing the sacrificial patterns.

Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.