An apparatus for treating exhaust gas of a thermal power plant according to the present invention includes: a diffusion module part controlling an exhaust gas flow between a duct disposed at a rear end of a gas turbine of the thermal power plant and the gas turbine to guide the exhaust gas flow toward an inner wall of the duct; a plurality of injection nozzles installed in a flow section in the duct in which the exhaust gas guided toward the inner wall of the duct from the diffusion module part flows, and protruding from the inner wall of the duct; a fluid supply pipe connected to the injection nozzles and extending outside the duct; a fluid supply part supplying a pollutant treatment fluid in liquid phase to the injection nozzles through the fluid supply pipe; and a catalyst module disposed at rear ends of the injection nozzles.

Devices, systems, and their methods of use, for generating droplets are provided. One or more geometric parameters of a microfluidic channel can be selected to generate droplets of a desired and predictable droplet size.

Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include a mixing manifold coupled between the remote plasma unit and the processing chamber. The mixing manifold may be characterized by a first end and a second end opposite the first end, and may be coupled with the processing chamber at the second end. The mixing manifold may define a central channel through the mixing manifold, and may define a port along an exterior of the mixing manifold. The port may be fluidly coupled with a first trench defined within the first end of the mixing manifold. The first trench may be characterized by an inner radius at a first inner sidewall and an outer radius, and the first trench may provide fluid access to the central channel through the first inner sidewall.

Devices, systems, and their methods of use, for generating droplets are provided. One or more geometric parameters of a microfluidic channel can be selected to generate droplets of a desired and predictable droplet size.

Devices, systems, and their methods of use, for generating droplets are provided. One or more geometric parameters of a microfluidic channel can be selected to generate droplets of a desired and predictable droplet size.

Devices, systems, and their methods of use, for generating droplets are provided. One or more geometric parameters of a microfluidic channel can be selected to generate droplets of a desired and predictable droplet size.

An aerator for aerating a liquid as the liquid is being poured from a container includes an aerator body configured to be at least partially inserted into the container. The body includes an inlet, an outlet, and a flow control chamber disposed between the inlet and the outlet. A flow control element is movably disposed in the flow control chamber between a first position where the flow control element is spaced away from a stop and a second position where the flow control element engages the stop. The flow control chamber communicates with the outlet when the flow control element is in the second position allowing liquid to be poured from the container and allowing air to be introduced into the flow control chamber for mixing with the liquid being poured from the container to aerate the liquid being poured from the container.

Devices, systems, and their methods of use, for generating droplets are provided. One or more geometric parameters of a microfluidic channel can be selected to generate droplets of a desired and predictable droplet size.

The invention provides an injector device for a water treatment apparatus, and a method of use. The injector device comprises a first coupling for fluid connection to a source of liquid to be treated; and a second coupling for fluid connection to at least one liquid treatment vessel arranged to expose liquid in the vessel to ultraviolet radiation in an advanced oxidation process reaction. The device comprises at least one injection port for injecting at least one gas into a liquid flowing through the injector device. The injector device is at least partially formed from a material that is transmissive to ultraviolet radiation. In another aspect, a water treatment apparatus defines a plurality of parallel flow streams between the inlet of the apparatus and the at least one liquid treatment vessel. The injector device comprises an injection port for each of the plurality of parallel flow streams.

Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include a mixing manifold coupled between the remote plasma unit and the processing chamber. The mixing manifold may be characterized by a first end and a second end opposite the first end, and may be coupled with the processing chamber at the second end. The mixing manifold may define a central channel through the mixing manifold, and may define a port along an exterior of the mixing manifold. The port may be fluidly coupled with a first trench defined within the first end of the mixing manifold. The first trench may be characterized by an inner radius at a first inner sidewall and an outer radius, and the first trench may provide fluid access to the central channel through the first inner sidewall.