A semiconductor package including a package substrate; an intermediate substrate on the package substrate; an optical engine unit on the intermediate substrate; a logic device adjacent to the optical engine unit and on the intermediate substrate; and a memory device adjacent to the logic device and on the intermediate substrate, wherein the optical engine unit includes a first redistribution substrate, a photonic integrated circuit (PIC) chip on the first redistribution substrate, an electronic integrated circuit (EIC) chip on the PIC chip, a multi-insulating layer surrounding the PIC chip and the EIC chip, and a transparent support layer on the EIC chip and the multi-insulating layer.

A semiconductor package has a first semiconductor package which includes a first redistribution structure, a first semiconductor chip on a lower surface of the first redistribution structure, a first encapsulant on at least a portion of the first semiconductor chip, a second redistribution structure on the first encapsulant, and a conductive post electrically connecting the first redistribution structure and the second redistribution structure through the first encapsulant; and a second semiconductor package which is on an upper surface of the first redistribution structure and comprises a third redistribution structure, a second semiconductor chip on the third redistribution structure, and a second encapsulant on at least a portion of the second semiconductor chip, wherein the first encapsulant integrally covers each of a lower surface and a side surface of the first semiconductor chip.

A semiconductor package structure includes a redistribution structure layer, at least one chip, an encapsulant, and multiple solder balls. The redistribution structure layer includes multiple first connectors located on a first side. Each first connector includes a connecting pad, a soldering pad, and multiple conductive blind holes located between the connecting pad and the soldering pad. The conductive blind holes are disposed separately from each other and connect the connecting pad and the soldering pad. The chip is disposed on a second side of the redistribution structure layer and electrically connected to the redistribution structure layer. The encapsulant is disposed on the second side and at least covers the chip and the second side. The solder balls are disposed on the first side of the redistribution structure layer and electrically connected to the redistribution structure layer. The solder balls are respectively connected to the connecting pad of each first connector.

A reconstituted wafer is formed, which includes a two-dimensional array of interposer dies that are interconnected to one another and a two-dimensional array of semiconductor die sets. The two-dimensional array of interposer dies includes distal redistribution dielectric layers that are composed of dielectric negative photoresist materials and embed distal redistribution wiring interconnects. A lithographic exposure process sequentially lithographically exposes areas of the dielectric negative photoresist materials. Each illumination area includes an entirety of a laterally-sealed area enclosed by a respective edge seal ring structure, and further includes a respective adjacent kerf area such that a double-exposed area is formed between each neighboring pair of interposer dies.

A package structure and a formation method are provided. The method includes forming multiple patterned material elements over a carrier substrate, and the patterned material elements are more thermal conductive than copper. The method also includes forming a protective layer laterally surrounding each of the patterned material elements. The method further includes bonding a chip-containing structure to a first patterned material element of the patterned material elements through dielectric-to-dielectric bonding and metal-to-metal bonding.

A semiconductor package includes a redistribution structure including redistribution patterns, first and second chip structures on the redistribution structure and electrically connected to the redistribution patterns, a first mold covering at least a portion of each of the first and second chip structures, an interconnection chip including interconnection patterns electrically connected to the redistribution patterns and a plurality of insulating layers having third surfaces in which respective ones of the interconnection patterns are embedded, through-vias electrically connected to the redistribution patterns, a second mold covering at least a portion of each of the through-vias and the interconnection chip. Each third surface includes a first region, and a second region between the first region and an upper surface of the respective interconnection pattern embedded in the third surface. The second region defines a step between the first region and the upper surface of the interconnection pattern embedded in the third surface.

A semiconductor package includes a redistribution structure, a first semiconductor chip above the redistribution structure, a second semiconductor chip on, and offset relative to, the first semiconductor chip, a plurality of first conductive posts extending from a bottom surface of the second semiconductor chip to a top surface of the redistribution structure, a third semiconductor chip on the second semiconductor chip, a plurality of second conductive posts extending from a bottom surface of the third semiconductor chip to the top surface of the redistribution structure, and a molding layer between the top surface of the redistribution structure and the bottom surface of the third semiconductor chip.

A semiconductor package may include an interposer substrate having first and second surfaces, a through electrode extending through the interposer substrate, an RDL on the first surface of the interposer substrate and an upper surface of the through electrode and including a redistribution wiring structure, first and second semiconductor chips electrically connected to the redistribution wiring structure on the RDL, a first molding member on the RDL and covering sidewalls of the first and second semiconductor chips, a conductive post on the second surface of the interposer substrate and contacting the through electrode, and a second molding member on the second surface of the interposer substrate and covering a sidewall of the conductive post. A maximum width of the through electrode is equal to or greater than that of the conductive post. A length of the through electrode is equal to or less than that of the conductive post.

A semiconductor package may include a first substrate, semiconductor dies stacked on the first substrate in a direction perpendicular to a top surface of the first substrate to have a stepwise structure, a mold layer disposed on the first substrate to cover the semiconductor dies, a second substrate disposed on the mold layer, and vertical conductive lines electrically connecting the semiconductor dies to the second substrate. The first substrate may include a first region and a second region. The first region may have a first thermal expansion coefficient, and the second region may have a second thermal expansion coefficient. The first thermal expansion coefficient may be different from the second thermal expansion coefficient.

A semiconductor package includes: a substrate; four semiconductor chips spaced apart from each other on the substrate, each of the four semiconductor chips including an active surface that is perpendicular to an upper surface of the substrate; wires extending from the active surface of each of the four semiconductor chips, respectively, and electrically connecting the four semiconductor chips and the substrate; and an encapsulant on the substrate and surrounding the four semiconductor chips, wherein upper surfaces and first side surfaces of each of the four semiconductor chips are exposed from the encapsulant.