A reconstituted wafer is formed, which includes a two-dimensional array of interposer dies that are interconnected to one another and a two-dimensional array of semiconductor die sets. The two-dimensional array of interposer dies includes distal redistribution dielectric layers that are composed of dielectric negative photoresist materials and embed distal redistribution wiring interconnects. A lithographic exposure process sequentially lithographically exposes areas of the dielectric negative photoresist materials. Each illumination area includes an entirety of a laterally-sealed area enclosed by a respective edge seal ring structure, and further includes a respective adjacent kerf area such that a double-exposed area is formed between each neighboring pair of interposer dies.

A semiconductor package includes a redistribution structure including redistribution patterns, first and second chip structures on the redistribution structure and electrically connected to the redistribution patterns, a first mold covering at least a portion of each of the first and second chip structures, an interconnection chip including interconnection patterns electrically connected to the redistribution patterns and a plurality of insulating layers having third surfaces in which respective ones of the interconnection patterns are embedded, through-vias electrically connected to the redistribution patterns, a second mold covering at least a portion of each of the through-vias and the interconnection chip. Each third surface includes a first region, and a second region between the first region and an upper surface of the respective interconnection pattern embedded in the third surface. The second region defines a step between the first region and the upper surface of the interconnection pattern embedded in the third surface.

A semiconductor package may include an interposer substrate having first and second surfaces, a through electrode extending through the interposer substrate, an RDL on the first surface of the interposer substrate and an upper surface of the through electrode and including a redistribution wiring structure, first and second semiconductor chips electrically connected to the redistribution wiring structure on the RDL, a first molding member on the RDL and covering sidewalls of the first and second semiconductor chips, a conductive post on the second surface of the interposer substrate and contacting the through electrode, and a second molding member on the second surface of the interposer substrate and covering a sidewall of the conductive post. A maximum width of the through electrode is equal to or greater than that of the conductive post. A length of the through electrode is equal to or less than that of the conductive post.

A semiconductor package may include a first substrate, semiconductor dies stacked on the first substrate in a direction perpendicular to a top surface of the first substrate to have a stepwise structure, a mold layer disposed on the first substrate to cover the semiconductor dies, a second substrate disposed on the mold layer, and vertical conductive lines electrically connecting the semiconductor dies to the second substrate. The first substrate may include a first region and a second region. The first region may have a first thermal expansion coefficient, and the second region may have a second thermal expansion coefficient. The first thermal expansion coefficient may be different from the second thermal expansion coefficient.

A structure includes a first core substrate; an adhesive layer on the first core substrate; a second core substrate on the adhesive layer, wherein the second core substrate includes a first cavity; a first semiconductor device within the first cavity; a first insulating film extending over the second core substrate, over a top surface of the first semiconductor device, and within the first cavity; a through via extending through the first insulating film, the first core substrate, and the second core substrate; a first routing structure on the first core substrate and electrically connected to the through via; and a second routing structure on the first insulating film and electrically connected to the through via and the first semiconductor device.

A method includes forming a package substrate comprising forming through-openings in a glass substrate, filling the through-openings to form through-vias in the glass substrate, forming a first interconnect structure underlying the glass substrate, and forming a second interconnect structure overlying the glass substrate. The method further includes forming an interposer over the package substrate, and bonding package components over and electrically connected to the package substrate through the interposer.

A semiconductor structure includes: a substrate; a package attached to a first surface of the substrate, where the package includes: an interposer, where a first side of the interposer is bonded to the first surface of the substrate through first conductive bumps; dies attached to a second side of the interposer opposing the first side; and a molding material on the second side of the interposer around the dies; a plurality of thermal interface material (TIM) films on a first surface of the package distal from the substrate, where each of the TIM films is disposed directly over at least one respective die of the dies; and a heat-dissipation lid attached to the first surface of the substrate, where the package and the plurality of TIM films are disposed in an enclosed space between the heat-dissipation lid and the substrate, where the heat-dissipation lid contacts the plurality of TIM films.

An electronic package is provided, in which an electronic module and at least one support member are disposed on a substrate structure having a circuit layer, such that the stress on the substrate structure is dispersed through the at least one support member to eliminate the problem of stress concentration and prevent the substrate structure from warping.

A semiconductor device includes a plurality of semiconductor modules. Each of the plurality of semiconductor modules includes: a base plate having a first surface and a second surface, the first surface being exposed to the outside of the semiconductor module, the second surface being on a side opposite to the first surface; an insulated substrate with a circuit pattern provided thereon; a semiconductor chip bonded to the circuit pattern; a sealer that seals the insulated substrate and the semiconductor chip; and a first main electrode and a second main electrode drawn out of the sealer in a direction opposite to a direction from the sealer toward the base plate. The semiconductor module has a planar shape with four corners, and has a rotationally symmetric shape.

A semiconductor package includes a connection substrate on a package substrate and has an opening that penetrates therethrough. A chip stack is on the package substrate and in the opening. A redistribution layer is on the connection substrate and the chip stack. An upper semiconductor chip is on first redistribution pads of the redistribution layer. External terminals are on a bottom surface of the package substrate. The chip stack includes a first semiconductor chip on substrate pads of the package substrate, and a second semiconductor chip on the first semiconductor chip and second redistribution pads of the redistribution layer. The redistribution layer includes a first region that overlaps the upper semiconductor chip and a second region beside the upper semiconductor chip. The first redistribution pads are on the first region. The second redistribution pads are on the second region.