A semiconductor structure includes a first back-end-of-line region coupled to a first side of a front-end-of-line region, a second back-end-of-line region coupled to a second side of the front-end-of-line region, and a thermally conducting region at least partially surrounding a perimeter of the front-end-of-line region, the first back-end-of-line region and the second back-end-of-line region.

A chip package and a method of manufacturing the same are provided. The chip package includes at least one insulating protective layer disposed on a periphery of a surface of a seed layer correspondingly. A plurality of insulating protective layers is arranged at the seed layer of a plurality of rectangular chips of a wafer and located corresponding to a plurality of dicing streets. Thereby cutting tools only cut the insulating protective layer, without cutting a thick metal layer during cutting process. The insulating protective layer is formed on a periphery of the thick metal layer of the chip package after the cutting process.

A semiconductor device includes a semiconductor layer that includes a semiconductor substrate having a first thickness and has a main surface, a main surface electrode that is arranged at the main surface and has a second thickness less than the first thickness, and a pad electrode that is arranged on the main surface electrode and has a third thickness exceeding the first thickness.

A package is provided. The package includes an electronic chip and at least one magnesium hydroxide layer (Mg(OH).sub.2) over the electronic chip. A method of forming the package is also described.

Some example embodiments are directed to a semiconductor device including a substrate including a chip region and a peripheral region, a circuit wiring layer on the chip region of the substrate, an interlayer insulating layer on the chip region of the substrate covering the circuit wiring layer, and extending on the peripheral region of the substrate, a chip pad on the interlayer insulating layer on the chip region, and connected to the circuit wiring layer, and a test pad on the interlayer insulating layer on the peripheral region. A thickness of the test pad is less than a thickness of the chip pad in a direction vertical to an upper surface of the substrate.

An electronic device is provided. An example electronic device includes: a semiconductor body of Silicon Carbide, having a surface having a first portion of the surface that defines an active region of the electronic device and a second portion of the surface that is external to the active region; a metallization extending on the first portion of the surface of the semiconductor body; a passivation layer extending on part of the metallization; and an adhesion layer, based on one or more carbon allotropes, extending on the passivation layer.

Provided are a power device and a method of manufacturing the same. The power device may include a channel layer; a source and a drain at respective sides of the channel layer; a gate on the channel layer between the source and the drain; a passivation layer covering the source, the drain, and the gate; and a plurality of field plates in the passivation layer. The plurality of field plates may have different thicknesses. The plurality of field plates may have different widths, different pattern shapes, or both different widths and different pattern shapes.

A semiconductor package includes a lower interconnect structure. The lower interconnect structure includes a lower insulating layer and lower interconnect patterns. A first encapsulation layer is disposed on the lower interconnect structure. A pillar electrode penetrating the first encapsulation layer and connected to the lower interconnect patterns is provided. An upper interconnect structure disposed within the first encapsulation layer and having an upper insulating layer and upper interconnect patterns is provided. A distance between an upper surface of the lower interconnect structure and an uppermost end of the first encapsulation layer is larger than a distance between the upper surface of the lower interconnect structure and an uppermost end of the upper interconnect structure. A second encapsulation layer is disposed on the first encapsulation layer. A semiconductor chip disposed within the second encapsulation layer and connected to the pillar electrode and upper interconnect patterns is provided.

A semiconductor die stack includes a first semiconductor die having a first lattice direction, and a second semiconductor die bonded to the first semiconductor die and having a second lattice direction different than the first lattice direction.

A high electron mobility transistor (HEMT) and method for forming the same are disclosed. The high electron mobility transistor has a GaN epi-layer, a source ohmic contact, a drain ohmic contact, a gate structure, a first metal electrode contact and a first passivation layer. The source ohmic contact and the drain ohmic contact are disposed on the epi-layer. The gate structure is disposed on the epi-layer and between the source ohmic contact and the drain ohmic contact. The first metal electrode contact is disposed above the gate structure. The first passivation layer is sandwiched between the first metal electrode contact and the gate structure.