A semiconductor package has a first semiconductor package which includes a first redistribution structure, a first semiconductor chip on a lower surface of the first redistribution structure, a first encapsulant on at least a portion of the first semiconductor chip, a second redistribution structure on the first encapsulant, and a conductive post electrically connecting the first redistribution structure and the second redistribution structure through the first encapsulant; and a second semiconductor package which is on an upper surface of the first redistribution structure and comprises a third redistribution structure, a second semiconductor chip on the third redistribution structure, and a second encapsulant on at least a portion of the second semiconductor chip, wherein the first encapsulant integrally covers each of a lower surface and a side surface of the first semiconductor chip.

A semiconductor package structure includes a redistribution structure layer, at least one chip, an encapsulant, and multiple solder balls. The redistribution structure layer includes multiple first connectors located on a first side. Each first connector includes a connecting pad, a soldering pad, and multiple conductive blind holes located between the connecting pad and the soldering pad. The conductive blind holes are disposed separately from each other and connect the connecting pad and the soldering pad. The chip is disposed on a second side of the redistribution structure layer and electrically connected to the redistribution structure layer. The encapsulant is disposed on the second side and at least covers the chip and the second side. The solder balls are disposed on the first side of the redistribution structure layer and electrically connected to the redistribution structure layer. The solder balls are respectively connected to the connecting pad of each first connector.

A method of manufacturing a semiconductor package may include disposing, in a lower mold, a substrate strip in which a plurality of semiconductor chips are arranged in a horizontal direction, providing, in an upper mold, a release film to which a first encapsulant is attached, allowing the upper mold and the lower mold to be proximate to each other such that a first encapsulant is adjacent to an upper surface of each of the plurality of semiconductor chips, injecting a second encapsulant into a space between the upper mold and the lower mold, heating the first encapsulant and the second encapsulant to form a molded structure including a first encapsulating layer and a second encapsulating layer, allowing the upper mold and the lower mold to be spaced from each other such that the molded structure is separated from the release film, and cutting the molded structure.

A reconstituted wafer is formed, which includes a two-dimensional array of interposer dies that are interconnected to one another and a two-dimensional array of semiconductor die sets. The two-dimensional array of interposer dies includes distal redistribution dielectric layers that are composed of dielectric negative photoresist materials and embed distal redistribution wiring interconnects. A lithographic exposure process sequentially lithographically exposes areas of the dielectric negative photoresist materials. Each illumination area includes an entirety of a laterally-sealed area enclosed by a respective edge seal ring structure, and further includes a respective adjacent kerf area such that a double-exposed area is formed between each neighboring pair of interposer dies.

A semiconductor package includes a redistribution structure including redistribution patterns, first and second chip structures on the redistribution structure and electrically connected to the redistribution patterns, a first mold covering at least a portion of each of the first and second chip structures, an interconnection chip including interconnection patterns electrically connected to the redistribution patterns and a plurality of insulating layers having third surfaces in which respective ones of the interconnection patterns are embedded, through-vias electrically connected to the redistribution patterns, a second mold covering at least a portion of each of the through-vias and the interconnection chip. Each third surface includes a first region, and a second region between the first region and an upper surface of the respective interconnection pattern embedded in the third surface. The second region defines a step between the first region and the upper surface of the interconnection pattern embedded in the third surface.

A semiconductor package includes a redistribution structure, a first semiconductor chip above the redistribution structure, a second semiconductor chip on, and offset relative to, the first semiconductor chip, a plurality of first conductive posts extending from a bottom surface of the second semiconductor chip to a top surface of the redistribution structure, a third semiconductor chip on the second semiconductor chip, a plurality of second conductive posts extending from a bottom surface of the third semiconductor chip to the top surface of the redistribution structure, and a molding layer between the top surface of the redistribution structure and the bottom surface of the third semiconductor chip.

A semiconductor package may include an interposer substrate having first and second surfaces, a through electrode extending through the interposer substrate, an RDL on the first surface of the interposer substrate and an upper surface of the through electrode and including a redistribution wiring structure, first and second semiconductor chips electrically connected to the redistribution wiring structure on the RDL, a first molding member on the RDL and covering sidewalls of the first and second semiconductor chips, a conductive post on the second surface of the interposer substrate and contacting the through electrode, and a second molding member on the second surface of the interposer substrate and covering a sidewall of the conductive post. A maximum width of the through electrode is equal to or greater than that of the conductive post. A length of the through electrode is equal to or less than that of the conductive post.

A semiconductor package includes: a substrate; four semiconductor chips spaced apart from each other on the substrate, each of the four semiconductor chips including an active surface that is perpendicular to an upper surface of the substrate; wires extending from the active surface of each of the four semiconductor chips, respectively, and electrically connecting the four semiconductor chips and the substrate; and an encapsulant on the substrate and surrounding the four semiconductor chips, wherein upper surfaces and first side surfaces of each of the four semiconductor chips are exposed from the encapsulant.

A structure includes a first core substrate; an adhesive layer on the first core substrate; a second core substrate on the adhesive layer, wherein the second core substrate includes a first cavity; a first semiconductor device within the first cavity; a first insulating film extending over the second core substrate, over a top surface of the first semiconductor device, and within the first cavity; a through via extending through the first insulating film, the first core substrate, and the second core substrate; a first routing structure on the first core substrate and electrically connected to the through via; and a second routing structure on the first insulating film and electrically connected to the through via and the first semiconductor device.

A method of making an interconnect substrate, comprising disposing an embedded component and at least one tracking identifier in a substrate core, and planarizing the substrate core to form a planar surface, forming a conductive layer over a frontside planar surface, disposing a layer of dielectric over the frontside planar surface, the embedded component, and the conductive layer, rotating the substrate core such that a back surface of the substrate core is configured for processing, and forming a conductive layer over the back surface of the substrate core.