Patent classifications
H10W72/352
Semiconductor device and method for diagnosing deterioration of semiconductor device
Provided is a technique for enhancing the accuracy of deterioration diagnosis in a semiconductor device. The semiconductor device relating to the technique disclosed in the present specification is provided with a case, a semiconductor chip inside the case, a metal wire bonded to an upper surface of the semiconductor chip, at least one test piece inside the case, and a pair of terminals provided outside the case and connected to the test piece. The test piece is separated from the metal wire inside the case.
SEMICONDUCTOR MODULE HAVING AT LEAST A FIRST SEMICONDUCTOR ASSEMBLY, A SECOND SEMICONDUCTOR ASSEMBLY AND A COMMON HEAT SINK
A semiconductor module includes a heat sink configured to conduct a cooling fluid in a cooling-fluid flow direction. A first semiconductor assembly is arranged on a surface of the heat sink. The first semiconductor assembly includes a first substrate having a first dielectric material layer, and a first semiconductor element connected to the first substrate. A second semiconductor assembly is arranged on the surface of the heat sink and closest to a downstream end of the heat sink. The second semiconductor assembly includes a second substrate having a second dielectric material layer, and a second semiconductor element connected to the second substrate. The second dielectric material layer has a thermal conductivity which is higher than a thermal conductivity of the first dielectric material layer.
SEMICONDUCTOR DEVICE AND METHOD OF MAKING SEMICONDUCTOR DEVICE
A semiconductor device includes a substrate having a first main surface and a second main surface opposite to the first main surface, and a first conductive layer including a first metal layer and a second metal layer, the first metal layer covering the second main surface, the second metal layer covering the first metal layer and including dendrites, wherein a via hole extending through the substrate and having an inner wall surface is formed in the substrate, and wherein the first metal layer, which is covered with the second metal layer, covers the inner wall surface.
HEAT DISSIPATION STRUCTURE FOR INTEGRATED CIRCUIT PACKAGES
A package substrate according to the present disclosure includes a package substrate, a package component bonded to the package substrate and including a plurality of dies, a lid disposed over the package component and the package substrate, and a thermal interface material (TIM) layer sandwiched between the package component and the lid. The lid includes a plurality of heat spreader patterns that extend from a bottom surface of the lid into the TIM layer.
ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME
An electronic device includes: a first substrate; an element layer disposed on the first substrate and including an active area and a peripheral area surrounding the active area; a first bonding pad disposed on the peripheral area of the element layer; a second substrate disposed opposite to the first substrate; a second bonding pad disposed on the second substrate and including a first part and a second part surrounding the first part; and a bonding material disposed between the first part of the second bonding pad and the first bonding pad and between the second part of the second bonding pad and the first bonding pad.
WIRE BOND OBSTRUCTION MITIGATION USING WIRE BOND STUD BUMPS
Aspects of the disclosure advantageously provide one or more methods of improving microelectronic production by mitigating obstructions via strategic placement of wire bond stud bumps. A microelectronic assembly and a method of producing the same are provided. The method includes placing a set of stud bumps on a substrate defining a boundary of a location for placement of a component, wherein the set of stud bumps comprises a first stud bump and a second stud bump, the first stud bump comprising a greater amount of wire bonding material than the second stud bump; placing the component at the location on the substrate via a layer of a binding material; and forming a wire bond between the component and the first stud bump. In one or more embodiments, a microelectronic assembly is produced in accordance with the method described above.
Semiconductor package, method of forming the package and electronic device
Embodiments of the present disclosure relate to a semiconductor package, a method of forming the package and an electronic device. For example, the semiconductor package may comprise a first substrate assembly comprising a first surface and a second surface opposite the first surface. The semiconductor package may also comprise one or more chips connected or coupled to the first surface of the first substrate assembly by a first thermally and electrically conductive connecting material. In addition, the semiconductor package further comprises a second substrate assembly comprising a third surface and a fourth surface opposite the third surface, the third surface and the first surface being arranged to face each other, and the third surface being connected to one or more chips by a second thermally and electrically conductive connecting material. At least one of the first surface and the third surface is shaped to have a stepped pattern to match a surface of the one or more chips. Embodiments of the present disclosure may at least simplify the double-sided heat dissipation structure and improve the heat dissipation effect of the chip.
Semiconductor device and method for manufacturing semiconductor device
A semiconductor device according to one aspect includes a pad portion, an insulating layer that supports the pad portion, a first wiring layer that is formed in a layer below the pad portion and extends in a first direction below the pad portion, and a conductive member that is joined to a front surface of the pad portion and extends in a direction forming an angle of 30 to 30 with respect to the first direction. A semiconductor device according to another aspect includes a pad portion, an insulating layer that supports the pad portion, a first wiring layer that is formed in a layer below the pad portion and extends in a first direction below the pad portion, and a conductive member that is joined to a front surface of the pad portion and has a joint portion that is long in one direction in plan view and an angle of a long direction of the joint portion with respect to the first direction is 30 to 30.
Copper paste for joining, method for manufacturing joined body, and joined body
A copper paste for joining contains metal particles and a dispersion medium, in which the copper paste for joining contains copper particles as the metal particles, and the copper paste for joining contains dihydroterpineol as the dispersion medium. A method for manufacturing a joined body is a method for manufacturing a joined body which includes a first member, a second member, and a joining portion that joins the first member and the second member, the method including: a first step of printing the above-described copper paste for joining to at least one joining surface of the first member and the second member to prepare a laminate having a laminate structure in which the first member, the copper paste for joining, and the second member are laminated in this order; and a second step of sintering the copper paste for joining of the laminate.
Semiconductor device with x-shaped die pad to reduce thermal stress and ion migration from bonding layer
A semiconductor device includes: a supporting member having a wiring including a die-pad; a semiconductor element bonded to the die-pad; a wire bonded to the wiring and the semiconductor element; and a bonding layer that has a conductivity and bonds the die-pad and the semiconductor element. When viewed in a thickness direction of the semiconductor element, the die-pad includes a first region included inside a peripheral edge of the semiconductor element and a second region that is connected to the first region and extends farther then the peripheral edge of the semiconductor element. When viewed in the thickness direction, the wire is separated from the second region.