A package structure includes a circuit substrate, a semiconductor package, a first ring structure and a second ring structure. The semiconductor package is disposed on and electrically connected to the circuit substrate. The first ring structure is attached to the circuit substrate and surrounding the semiconductor package, wherein the first ring structure includes a central opening and a plurality of corner openings extending out from corners of the central opening, the semiconductor package is located in the central opening, and the plurality of corner openings is surrounding corners of the semiconductor package.

A semiconductor device includes a substrate, a first cell having a first functionality, and a second cell having a second functionality. The first cell includes a first portion on a first side of the substrate, wherein the first portion includes a first conductive element; a second portion on a second side of the substrate, wherein the second portion includes a second conductive element; and a first conductive via extending through the substrate and electrically connecting the first conductive element to the second conductive element. The second cell includes a third portion on the first side of the substrate, wherein the third portion includes a third conductive element; a fourth portion on the second side of the substrate, wherein the fourth portion includes a fourth conductive element; and a second conductive via extending through the substrate and electrically connecting the third conductive element to the fourth conductive element.

IC devices including semiconductor devices isolated by BSRs are disclosed. An example IC device includes a first and a second semiconductor devices, a support structure, and a BSR. The BSR defines boundaries of a first and second section in the support structure. At least a portion of the first semiconductor device is in the first section, and at least a portion of the second semiconductor device is in the second section. The first semiconductor device is isolated from the second semiconductor device by the BSR. Signals from the first semiconductor device would not be transmitted to the second semiconductor device through the support structure. The BSR may be connected to a TSV or be biased. The IC device may include additional BSRs to isolate the first and second semiconductor devices. An BSR may be a power rail used for delivering power.

Methods, systems, and devices for techniques for concurrently-formed cavities in three-dimensional memory arrays are described. As part of forming a memory die, a plurality of cavities may be formed by a set of one or more material removal operations, and different subsets of the plurality of cavities may be used to form different features of the memory die. In some examples, a sacrificial region may be formed in accordance with one or more material addition or removal operations, and such a sacrificial region may include openings that support the formation of various structures of a memory device. After the formation of such structures, the sacrificial region may be isolated from an active region by merging a subset of the previously-formed plurality of cavities.

A power electronics assembly includes a printed circuit board including a plurality of substrate layers. The plurality of substrate layers include a first core layer and a second core layer stacked vertically below the first core layer, wherein the first core layer comprises a first electrical component embedded therein and the second core layer comprises a second electrical component embedded therein. The first electrical component and the second electrical component are arranged in a vertical column.

A semiconductor package includes a first chip structure on a first substrate and a first molding layer surrounding the first chip structure on the first substrate, wherein the first chip structure includes a first chip including a PIC on the first substrate, a second chip including an EIC on the first chip, a transparent layer horizontally spaced from the second chip on the first chip, a microlens layer on the transparent layer; and a second molding layer surrounding the second chip, the transparent layer, and the microlens layer on the first chip, the semiconductor package further includes a first insulating layer on an upper surface of the first chip and a second insulating layer on a lower surface of the transparent layer, and the first and second 10 insulating layers are in contact with each other, and the first and second insulating layers are integrally formed of the same material.

A package structure and a formation method are provided. The method includes forming multiple patterned material elements over a carrier substrate, and the patterned material elements are more thermal conductive than copper. The method also includes forming a protective layer laterally surrounding each of the patterned material elements. The method further includes bonding a chip-containing structure to a first patterned material element of the patterned material elements through dielectric-to-dielectric bonding and metal-to-metal bonding.

Embodiments of present invention provide a semiconductor structure. The semiconductor structure includes a first and a second transistor; a power rail via between the first and the second transistor; and a backside via below the power rail via and below the first and the second transistor, where the backside via has a first portion directly contacting the power rail via and a second portion around the first portion, and a top surface of the first portion is above a top surface of the second portion. A method of forming the same is also provided.

Disclosed is a semiconductor structure including a substrate, a capacitor structure, an interlayer dielectric, a contact, a protective layer, and a conductive hole. The capacitor structure is disposed in the substrate. The interlayer dielectric is disposed on the substrate, and exposes a portion of the capacitor structure. The contact is disposed in the interlayer dielectric, and is electrically connected to the capacitor structure. The protective layer is disposed on the interlayer dielectric, and covers the contact. The conductive hole penetrates the protective layer and the interlayer dielectric. A top surface of the conductive hole is higher than a top surface of the contact. A manufacturing method of a semiconductor structure is also provided.

Landing metal layers with improved adhesion to semiconductor substrates are described, along with semiconductor structures including the landing metal layers and components using the landing metal layers. An example semiconductor device includes a substrate with top and bottom surfaces, a landing metal layer over the top surface of the substrate, a via that extends through the substrate, and a bottom side metal layer. The bottom side metal layer extends over sidewalls of the via and electrically contacts an underside of the landing metal layer. For improved adhesion, the landing metal layer is diffused at least in part into the top surface of the substrate. The landing metal layer is diffused into the top surface of the substrate by an annealing or alloying process, and the techniques described herein help to avoid the delamination of the landing metal layer from the top surface of the substrate.