Problem: To provide a technology that enables easy and highly-accurate determination on a pool that has occurred at a bottom end of a nozzle.

Solution: Provided is a nozzle bottom pool detection method in a liquid material discharge device, the method including: a first process of moving a nozzle 103 to a sensing position above a sensing surface; a second process of moving the nozzle 103 downward until an interval between a bottom end of the nozzle 103 and the sensing surface 107a becomes equal to a predetermined sensing distance L and moving the nozzle 103 upward upon the interval reaching the predetermined sensing distance L; and a third process of detecting a pool at the bottom end of the nozzle 103 by a sensing device 104 sensing whether a liquid material adheres to the sensing surface 107a. Also provided is a detection device that executes the same method.

A method is provided. The method includes: receiving a storage tank that holds a liquid chemical therein; attaching an inlet nozzle to the storage tank, the inlet nozzle including: a first opening defined therein, the first opening in fluid communication with an interior of the storage tank; a second opening defined therein, the second opening in gas communication with the interior of the storage tank; a third opening defined therein; and a first O-ring in contact with the third opening; and performing a semiconductor process via the liquid chemical.