H10W72/884

Wire bonded semiconductor device package
12519054 · 2026-01-06 · ·

In a described example, an apparatus includes: a metal leadframe including a dielectric die support formed in a central portion of the leadframe, and having metal leads extending from the central portion, portions of the metal leads extending into the central portion contacted by the dielectric die support; die attach material over the dielectric die support; a semiconductor die mounted to the dielectric die support by the die attach material, the semiconductor die having bond pads on a device side surface facing away from the dielectric die support; electrical connections extending from the bond pads to metal leads of the leadframe; and mold compound covering the semiconductor die, the electrical connections, the dielectric die support, and portions of the metal leads, the mold compound forming a package body.

Method of manufacturing a semiconductor package and semiconductor package manufactured by the same
12519082 · 2026-01-06 · ·

A method of manufacturing a semiconductor package of stacked semiconductor chips includes forming a reverse wire bond by bonding one end of a reverse wire to a chip pad of the second-highest semiconductor chip of the stacked semiconductor chips and connecting the other end of the reverse wire to a conductive bump on a chip pad of the uppermost semiconductor chip of the stacked semiconductor chips. The method also includes molding the stacked semiconductor chips with the reverse wire bond using a mold layer. The method further includes processing the mold layer to expose the conductive bump and the other end of the reverse wire in the reverse wire bond through an upper surface of the mold layer.

Semiconductor chip and semiconductor device

According to one embodiment, a semiconductor chip includes a first electrode, a semiconductor layer, a second electrode, a third electrode, and a metallic layer. The semiconductor layer includes a first portion, a second portion, and a third portion that is located between the first portion and the second portion. The semiconductor layer is provided on a first side of the first electrode in a first direction. The second electrode is over the first portion in the first direction. The third electrode is over the second portion in the first direction. The metallic layer is provided on a second side of the first electrode and is under the third portion in the first direction.

Package substrate and semiconductor package including the same
12519025 · 2026-01-06 · ·

A package substrate and a semiconductor package including the same are provided. The semiconductor package includes a package substrate including a base having a front side and a back side, rear pads below the back side of the base, lower connection patterns below the rear pads and in contact with the rear pads, first and second front pads on the front side of the base, a first support pattern on the front side of the base having a thickness greater than a thickness of each of the first and second front pads, and a protective insulating layer on the front side of the base and having openings exposing the first and second front pads respectively, and on an upper surface and a side surface of the first support pattern; a lower semiconductor chip on the protective insulating layer of the package substrate, spaced apart from the first support pattern in a horizontal direction; and a first upper semiconductor chip on the package substrate vertically overlapping the lower semiconductor chip and the first support pattern.

Semiconductor package with blast shielding
12519069 · 2026-01-06 · ·

A semiconductor package includes a metallic pad and leads, a semiconductor die including a semiconductor substrate attached to the metallic pad, and a conductor including a sacrificial fuse element above the semiconductor substrate, the sacrificial fuse element being electrically coupled between one of the leads and at least one terminal of the semiconductor die, a shock-absorbing material over a profile of the sacrificial fuse element, and mold compound covering the semiconductor die, the conductor, and the shock-absorbing material, and partially covering the metallic pad and leads, with the metallic pad and the leads exposed on an outer surface of the semiconductor package. Either a glass transition temperature of the shock-absorbing material or a melting point of the shock-absorbing material is lower than a melting point of the conductor.

SEMICONDUCTOR PACKAGE STRUCTURE
20260011678 · 2026-01-08 ·

A semiconductor package structure is provided. The semiconductor package structure includes a semiconductor die, a package substrate, and at least one bonding wire. The package substrate includes a dam structure to define a space where the semiconductor die is placed. The bonding wire is electrically connected between the semiconductor die and the package substrate.

METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR PACKAGE

A method of manufacturing a semiconductor package may include disposing, in a lower mold, a substrate strip in which a plurality of semiconductor chips are arranged in a horizontal direction, providing, in an upper mold, a release film to which a first encapsulant is attached, allowing the upper mold and the lower mold to be proximate to each other such that a first encapsulant is adjacent to an upper surface of each of the plurality of semiconductor chips, injecting a second encapsulant into a space between the upper mold and the lower mold, heating the first encapsulant and the second encapsulant to form a molded structure including a first encapsulating layer and a second encapsulating layer, allowing the upper mold and the lower mold to be spaced from each other such that the molded structure is separated from the release film, and cutting the molded structure.

SEMICONDUCTOR DEVICE HAVING STACKED CHIPS
20260011692 · 2026-01-08 · ·

A semiconductor device includes first, second and third stacked chips with a first, second and third substrate, respectively, at least three first, second and third logical circuits, respectively, and at least two first, second and third vias, respectively, and a fourth chip stacked on the third chip having a fourth substrate, and at least three fourth logical circuits. First and second ones of the first to third logical circuits of the first to fourth chips are each configured to perform a first and second logical operation, respectively, on a first and second address input signal, respectively, received at the respective chip to thereby output a first and second address output signal, respectively. Third ones are each configured to activate the respective chip based on at least the second address output signal transmitted within the respective chip.

SEMICONDUCTOR DEVICE
20260011625 · 2026-01-08 · ·

A semiconductor device includes an insulated circuit board having a lower surface, a heat dissipation base plate having a front surface that includes an arrangement region in which the lower surface of the insulated circuit board is arranged via solder and a solder region in which the solder spreads over the arrangement region, a plating film formed on the front surface of the heat dissipation base plate except for the solder region, and an alloy layer disposed between the solder and the heat dissipation base plate in the arrangement region. The alloy layer contains a solder component that is contained in the solder. In particular, in the semiconductor device, the plating film is formed on an entire surface of the heat dissipation base plate except for an opening region surrounding an outer periphery of the arrangement region where the insulated circuit board is arranged via the solder.

Pop structure of three-dimensional fan-out memory and packaging method thereof

The package-on-package (POP) structure includes a first package unit of three-dimensional fan-out memory chips and a SiP package unit of the two-dimensional fan-out peripheral circuit chip. The first package unit includes: memory chips laminated in a stepped configuration; a molded substrate; wire bonding structures; a first rewiring layer; a first encapsulating layer; and first metal bumps, formed on the first rewiring layer. The SiP package unit includes: a second rewiring layer; a peripheral circuit chip; a third rewiring layer, bonded to the circuit chip; first metal connection pillars; a second encapsulating layer for the circuit chip and the first metal connection pillars; and second metal bumps on the second rewiring layer. The first metal bumps are bonded to the third rewiring layer. Integrating the two package units into the POP is enabled by three rewiring layers and the molded substrate which supports the first package unit during wire bonding process.