A display panel comprising a display substrate having a display area and a pad area disposed around the display area. A connection wire is disposed on the pad area of the display substrate. A signal wire is disposed on the connection wire. A supporter is disposed between the display substrate and the connection wire. The connection wire directly contacts the supporter.

A three-dimensional (3D) integrated circuit (IC) (3DIC) package with a bottom die layer employing an interposer substrate, and related fabrication methods. To facilitate the ability to fabricate the 3DIC package using a top die-to-bottom wafer process, a bottom die layer of the 3DIC package includes an interposer substrate. This interposer substrate provides support for a bottom die(s) of the 3DIC package. The interposer substrate is extended in length to be longer in length than the top die. The interposer substrate provides additional die area in the bottom die layer in which a larger length, top die can be bonded. In this manner, the bottom die layer, with its extended interposer substrate, can be formed in a bottom wafer in which the top die can be bonded in a top die-to-bottom wafer fabrication process.

The semiconductor stacked package including a semiconductor die. The semiconductor die includes a substrate, a transistor, and a through-silicon-via (TSV) structure. The transistor is over the substrate. The TSV structure penetrates the substrate and comprises a first conductive layer, a second conductive layer, and a dielectric layer. The dielectric layer is between the first conductive layer and the second conductive layer. The method of manufacturing the same includes the following steps: forming a via hole in a substrate; forming a first conductive layer in the via hole; forming a dielectric layer in the via hole and over the first conductive layer; forming a second conductive layer in the via hole and over the dielectric layer; and forming a transistor over the substrate. The first conductive layer, the dielectric layer, and the second conductive layer collectively form a through-silicon-via (TSV) structure.

A semiconductor chip may include: a semiconductor substrate; a through silicon via that vertically penetrates the semiconductor substrate; an integrated device layer on a first surface of the semiconductor substrate and including integrated devices; a multi-wiring layer on the integrated device layer and including layers of wires; an upper metal layer on the multi-wiring layer and connected to the wires; and a lower metal layer on a second surface of the semiconductor substrate. The semiconductor substrate may include a lower bump area on the second surface of the semiconductor substrate, the lower bump area including bump pads thereon, and the lower metal layer may be on a periphery of the lower bump area.

An example apparatus includes a semiconductor substrate having a front surface on which an internal circuit is formed and a back surface opposite to the front surface, a first TSV penetrating the semiconductor substrate, and a first back side pad on the back surface of the semiconductor substrate and coupled to the first TSV The internal circuit includes an internal test node. The first back side pad is coupled to the internal test node of the internal circuit via the first TSV.

Various aspects of the present disclosure generally relate to integrated circuit devices, and to a conductive structure with multiple support pillars. A device includes a die including a contact pad. The device also includes a conductive structure. The conductive structure includes multiple support pillars coupled to the die, a bridge coupled to each of the multiple support pillars, and a cap pillar coupled to the bridge opposite the multiple support pillars. The device further includes a solder cap coupled to the cap pillar. The solder cap is electrically connected to the contact pad via the cap pillar, the bridge, and at least one of the multiple support pillars.

An apparatus is provided which comprises: a first die having a first surface and a second surface, the first die comprising: a first layer formed on the first surface of the first die, and a second layer formed on the second surface of the first die; a second die coupled to the first layer; and a plurality of structures to couple the apparatus to an external component, wherein the plurality of structures is coupled to the second layer.

An offset interposer includes a land side including land-side ball-grid array (BGA) and a package-on-package (POP) side including a POP-side BGA. The land-side BGA includes two adjacent, spaced-apart land-side pads, and the POP-side BGA includes two adjacent, spaced-apart POP-side pads that are coupled to the respective two land-side BGA pads through the offset interposer. The land-side BGA is configured to interface with a first-level interconnect. The POP-side BGA is configured to interface with a POP substrate. Each of the two land-side pads has a different footprint than the respective two POP-side pads.

A memory subsystem includes an I/O die, a host device, and a stacked memory structure. The I/O die includes a first surface and a second surface. The host device is stacked on the first surface of the I/O die to be at least partially bonded thereto. The stacked memory structure is stacked on the first surface of the I/O die to be at least partially bonded thereto. The I/O die includes a plurality of conductive pads arranged on the first surface. The stacked memory structure includes a plurality of memory dies stacked in a shingled manner so that a plurality of bonding pads is exposed, and a plurality of vertical wires respectively connecting the bonding pads of the plurality of memory dies to the plurality of conductive pads. The host device and the stacked memory structure is configured to interface with each other through the I/O die.

Provided is a semiconductor package including a substrate, a first chip on the substrate and including a photonic integrated circuit (PIC), a second chip on the first chip and including an electronic integrated circuit (EIC), a support block spaced apart from the second chip and bonded to an upper surface of the first chip, a molding layer on the first chip and at least partially surrounding the second chip and the support block, with an upper surface of the support block free of the molding layer, a micro-lens layer on the molding layer, the first chip, and the support block, and a first transparent adhesive layer between a lower surface of the micro-lens layer and an upper surface of the molding layer, and between the lower surface of the micro-lens layer and the upper surface of the support block.