A semiconductor device has a semiconductor wafer. A trench is formed through an active surface of the semiconductor wafer between a first semiconductor die and a second semiconductor die. An encapsulant is deposited in the trench. A back surface of the semiconductor wafer opposite the active surface is backgrinded using a rough grinder to expose the encapsulant. The back surface of the semiconductor wafer is backgrinded using a fine grinder. The fine grinder removes approximately 20 m of thickness from the semiconductor wafer. Back-end manufacturing is performed on the wafer after depositing the encapsulant and before backgrinding using the rough grinder.

A semiconductor package includes a package substrate including an upper pad on an upper surface of the package substrate, a first chip structure including a plurality of first chips offset-stacked in a first direction, a controller chip on the package substrate and apart from the first chip structure in a horizontal direction, a chip connection bump between the package substrate and the controller chip, and an underfill material layer covering the chip connection bump, wherein a side surface of the underfill material layer is perpendicular to the package substrate.

A semiconductor package may include a first semiconductor chip, second semiconductor chips stacked on the first semiconductor chip in a vertical direction, adhesive layers interposed between the first semiconductor chip and one of the second semiconductor chips and between the second semiconductor chips, and a molding member on the first semiconductor chip. Edges of the adhesive layers may be positioned inward from sidewalls of the second semiconductor chips. The molding member may cover at least sidewalls of the second semiconductor chips and sidewalls of the adhesive layers. The molding member may fill edge gaps defined by the sidewalls of the adhesive layers and edges of upper surfaces and lower surfaces of the second semiconductor chips.

A method of forming a semiconductor package includes forming, on a first semiconductor chip, a plurality of inner connection terminals and a preliminary underfill covering the plurality of inner connection terminals, stacking the first semiconductor chip on a lower structure such that the preliminary underfill is bonded between the first semiconductor chip and the lower structure, and curing the preliminary underfill using a laser bonding process, thereby forming a first underfill, and reflowing the plurality of inner connection terminals during a formation of the first underfill through the curing of the preliminary underfill.

Structures for a photonic chip and associated methods. The structure comprises a photonic chip including a bond pad and forming an electrical interconnection that includes a pillar positioned on the bond pad. The pillar includes a first lobed section, a second lobed section spaced from the first lobed section by a gap, and a connecting section extending across a portion of the gap to connect the first lobed section to the second lobed section.

Provided is a semiconductor package including a first semiconductor device, an encapsulant surrounding the first semiconductor device, an upper redistribution structure provided on the encapsulant, and a heat dissipation block provided on the upper redistribution structure. The heat dissipation block includes a first block surface facing a top surface of the upper redistribution structure, the heat dissipation block includes a first protrusion on the first block surface, a first concave portion corresponding to the first protrusion is provided on the top surface of the upper redistribution structure, the first protrusion is located in the first concave portion, and a heat transfer layer is provided between the heat dissipation block and the top surface of the upper redistribution structure.

An electronic module includes at least one electronic component including a first principal surface, first and second electrodes on the first principal surface, a wiring board including a second principal surface, third and fourth electrodes on the second principal surface, and a conductive resin portion. The conductive resin portion includes at least one first conductive resin portion joining the first and third electrodes, and at least one second conductive resin portion joining the second and fourth electrodes. The electronic module further includes at least one reinforcing resin portion that is disposed between at least one first and at least one second conductive resin portions and joins the first principal surface of the electronic component with the second principal surface of the wiring board.

A method of making an assembly can include juxtaposing a top surface of a first electrically conductive element at a first surface of a first substrate with a top surface of a second electrically conductive element at a major surface of a second substrate. One of: the top surface of the first conductive element can be recessed below the first surface, or the top surface of the second conductive element can be recessed below the major surface. Electrically conductive nanoparticles can be disposed between the top surfaces of the first and second conductive elements. The conductive nanoparticles can have long dimensions smaller than 100 nanometers. The method can also include elevating a temperature at least at interfaces of the juxtaposed first and second conductive elements to a joining temperature at which the conductive nanoparticles can cause metallurgical joints to form between the juxtaposed first and second conductive elements.

A package structure is provided, which includes a redistribution structure, an interposer substrate disposed over the redistribution structure, a first semiconductor die disposed between the redistribution structure and the interposer substrate, a second semiconductor die partially overlapping the first semiconductor die in a direction perpendicular to a surface of the redistribution structure, and a first protective layer surrounding the first semiconductor die.

A package structure includes a first dielectric layer disposed on a first patterned circuit layer, a first conductive via in the first dielectric layer and electrically connected to the first patterned circuit layer, a circuit layer on the first dielectric layer, a second dielectric layer on the first dielectric layer and covering the circuit layer, a second patterned circuit layer on the second dielectric layer and including conductive features, a chip on the conductive features, and a molding layer disposed on the second dielectric layer and encapsulating the chip. The circuit layer includes a plurality of portions separated from each other and including a first portion and a second portion. The number of pads corresponding to the first portion is different from that of pads corresponding to the second portion. An orthographic projection of each portion overlaps orthographic projections of at least two of the conductive features.