A method of forming a semiconductor device includes: forming a conductive pad over and electrically coupled to an interconnect structure, where the interconnect structure is disposed over a substrate and electrically coupled to electrical components formed on the substrate; forming a passivation layer over the conductive pad and the interconnect structure; and forming a sacrificial test structure over the passivation layer and electrically coupled to the conductive pad, where the sacrificial test structure includes a sacrificial pad extending along an upper surface of the passivation layer distal from the substrate, and includes a sacrificial via extending into the passivation layer and contacting the conductive pad.

An electronic network device includes a package substrate, an Integrated Circuit (IC) mounted on the package substrate, and a plurality of interconnection terminals disposed on a surface of the package substrate. The interconnection terminals include multiple pairs of signal terminals and multiple ground terminals. The interconnection terminals are arranged in a hexagonal grid in which (i) a given interconnection terminal is surrounded by six other interconnection terminals, and (ii) propagation paths between signal terminals that do not belong to a same pair are at least partially blocked by the ground terminals.

A semiconductor device assembly includes a first semiconductor device having a first plurality of electrical contacts with a first average pitch, a second semiconductor device over the first semiconductor device and having a second plurality of electrical contacts with a second average pitch, and a signal routing structure between the first and second semiconductor devices and including a first plurality of conductive structures, each in contact with one of the first plurality of electrical contacts, a second plurality of conductive structures, each in contact with one of the second plurality of electrical contacts, and a pattern of parallel conductive lines between the first and second pluralities of conductive structures. The pattern of parallel conductive lines has a third average pitch less than the first and second average pitches, and pairs of conductive structures from the first and second pluralities are electrically coupled by different ones of the parallel conductive lines.

A possible benefit of the present disclosure is to further improve a heat dissipation property of an electronic component. A high-frequency module includes a mounting substrate, a filter (for example, a transmission filter), a resin layer, a shielding layer, and a metal member. The resin layer covers at least a portion of an outer peripheral surface (for example, an outer peripheral surface) of the filter. The shielding layer covers at least a portion of the resin layer. The metal member is disposed at a first principal surface of the mounting substrate. The metal member is connected to a surface of the filter on the opposite side from the mounting substrate, the shielding layer, and the first principal surface of the mounting substrate.

A package structure and method for forming the same are provided. The package structure includes a substrate having a front surface and a back surface, and a die formed on the back surface of the substrate. The package structure includes a first through via structure formed in the substrate, a conductive structure formed in a passivation layer) over the front surface of the substrate. The conductive structure includes a via portion in direct contact with the substrate. The package structure includes a connector (formed over the via portion, wherein the connector includes an extending portion directly on a recessed top surface of the via portion.

A semiconductor package includes a first semiconductor chip including a first semiconductor substrate having a first active surface and a first inactive surface opposite to each other, a plurality of through electrodes penetrating the first semiconductor substrate, and a rear cover layer covering the first inactive surface, a second semiconductor chip stacked on the first semiconductor chip and including a second semiconductor substrate having a second active surface and a second inactive surface opposite to each other, and a front cover layer covering the second active surface, a plurality of signal pad structures penetrating the rear cover layer and the front cover layer to be electrically connected to the plurality of through electrodes, and a plurality of dummy pad structures apart from the plurality of signal pad structures in a horizontal direction, and penetrating the rear cover layer and the front cover layer.

This application is directed to packaging technology for providing an electronic device (e.g., a memory device). A memory device includes a stack of memory chips, a device substrate, and a conductive wire. The stack of memory chips includes a first memory chip having a chip pad that is formed on a surface of the first memory chip. The device substrate includes a plurality of substrate pads formed on a front surface of the device substrate. The front surface has a front opening, and the device substrate receives the stack of memory chips via the front opening of the front surface. The conductive wire is coupled to the front surface and the stack of memory chips, and is configure to couple the chip pad and one of the substrate pads electrically. In some embodiments, the device substrate includes a cutout opening that goes through an entire thickness of the device substrate.

A high bandwidth memory according to an example embodiment may include a base die, and a semiconductor stack on the base die. The semiconductor stack may include a plurality of semiconductor dies, which may be stacked in a vertical direction. Each of the plurality of semiconductor dies may include a plurality of memory dies arranged in a horizontal direction.

An electronic package is provided, in which a conductive structure and a reinforced insulation portion are bonded to a dielectric layer, and the reinforced insulation portion is in contact with and abuts against the conductive structure, such that the reinforced insulation portion can support the conductive structure to prevent the conductive structure from cracking when an electronic structure is disposed on the dielectric layer and electrically connected to the conductive structure.

A glass substrate for semiconductors includes a first principal surface and a second principal surface disposed to face opposite the first principal surface, in which a wiring layer is to be formed on at least one of the first principal surface and the second principal surface. The glass substrate for semiconductors has a hole formed in at least one of the first principal surface and the second principal surface, and the glass substrate for semiconductors has an identification mark for identifying the glass substrate between the first principal surface and second principal surface. The minimum value of a shortest distance and a shortest distance is equal to or greater than 100 m. A ratio (d1 ave/d2 ave) is 0.03-33. A ratio (d3 ave/d ave) is 0.01-0.50.