An inductor structure, a package substrate, an integrated circuit device, an integrated circuit device assembly and a method of fabricating the inductor structure. The inductor structure includes: an electrically conductive body; and a magnetic structure including a non-electrically-conductive magnetic material, wherein: one of the magnetic structure or the electrically conductive body wraps around another one of the magnetic structure or the electrically conductive body to form the inductor structure therewith; and at least one of the electrically conductive body or the magnetic structure has a granular microstructure including randomly distributed particles presenting substantially non-linear particle-to-particle boundaries with one another.

An electronic device includes a multilevel package substrate with a horizontal substrate integrated waveguide (SIW) with a channel, a vertical SIW with an opening, a grounded coplanar waveguide (GCPW), a first transition between the horizontal SIW and the GCPW, and a second transition between the horizontal and vertical SIWs, as well as a semiconductor die having conductive structures coupled to a signal trace and a ground trace of the GCPW, and a package structure that encloses the semiconductor die and a portion of the multilevel package substrate.

Three-dimensional (3D) devices that include at least two electrically isolated planes of electrically conductive traces and methods of making the same. The 3D device includes an upper level, a lower level electrically isolated from the upper level, and one or more pedestal portions joining the upper level and the lower level. The pedestal portions comprise an undercut. The undercut defines an upper level overhang that is configured to define a mask region to prevent conductive material from being deposited below the undercut.

The present invention provides a packaging structure and a manufacturing method thereof. The packaging structure includes a first substrate, a first chip, a second chip, a first heat conductor and a second heat conductor, wherein the first substrate includes a cavity; the first chip is embedded in the cavity and includes a first connecting surface and a first heat-conducting surface that face away from each other; the second chip is disposed on a side of the first connecting surface and electrically connected to the first chip, a side of the second chip distal from the first chip includes a second heat-conducting surface on a side; and the first heat conductor is connected to the first heat-conducting surface, and the second heat conductor is connected to the second heat-conducting surface. The first substrate includes a third connecting surface that is flush with the first connecting surface.

A method of forming a wafer-level package includes singulating a wafer into a plurality of reconstituted integrated circuit dies, affixing a carrier to a front side of the plurality of integrated circuit dies, and forming a laser direct structuring (LDS) activatable resin over a back side of the plurality of integrated circuit dies, over side edges of the plurality of integrated circuit die, and over adjacent portions of the carrier. Desired areas of the LDS activatable resin are activated to form conductive areas within the LDS activatable resin, at least one of the conductive areas associated with each integrated circuit die being formed to contact a respective pad of that integrated circuit die and to run alongside to and in contact with a side of the LDS activatable resin in contact with a side edge of that integrated circuit die.

A method of fabricating a carrier chip for distributing signals among circuit elements of a quantum computing device, includes: providing a multilayer wiring stack, the multilayer wiring stack comprising alternating layers of dielectric material and wiring; bonding a capping layer to the multilayer wiring stack, in which the capping layer includes a single crystal silicon dielectric layer; forming a via hole within the capping layer, in which the via hole extends to a first wiring layer of the multilayer wiring stack; forming an electrically conductive via within the via hole and electrically coupled to the first wiring layer; and forming a circuit element on a surface of the capping layer, in which the circuit element is directly electrically coupled to the electrically conductive via.

A method includes forming a first photoresist layer on a dielectric layer; performing a first light-exposure process on the first photoresist layer using a first photolithography mask, wherein during the first light-exposure process, a first region the first photoresist layer is blocked from being exposed, a second region of the first photoresist layer is exposed, and a third region of the first photoresist layer is exposed, wherein the second region encircles the first region and the third region encircles the second region; performing a second light-exposure process on the first photoresist layer using a second photolithography mask, wherein during the second light-exposure process, the first region of the first photoresist layer is exposed, the second region of the first photoresist layer is exposed, and the third region of the first photoresist layer is blocked from being exposed; and developing the first photoresist layer.

A structure includes a first core substrate; an adhesive layer on the first core substrate; a second core substrate on the adhesive layer, wherein the second core substrate includes a first cavity; a first semiconductor device within the first cavity; a first insulating film extending over the second core substrate, over a top surface of the first semiconductor device, and within the first cavity; a through via extending through the first insulating film, the first core substrate, and the second core substrate; a first routing structure on the first core substrate and electrically connected to the through via; and a second routing structure on the first insulating film and electrically connected to the through via and the first semiconductor device.

A method includes forming a package substrate comprising forming through-openings in a glass substrate, filling the through-openings to form through-vias in the glass substrate, forming a first interconnect structure underlying the glass substrate, and forming a second interconnect structure overlying the glass substrate. The method further includes forming an interposer over the package substrate, and bonding package components over and electrically connected to the package substrate through the interposer.

A method of making an interconnect substrate, comprising disposing an embedded component and at least one tracking identifier in a substrate core, and planarizing the substrate core to form a planar surface, forming a conductive layer over a frontside planar surface, disposing a layer of dielectric over the frontside planar surface, the embedded component, and the conductive layer, rotating the substrate core such that a back surface of the substrate core is configured for processing, and forming a conductive layer over the back surface of the substrate core.