A method of increasing a volume and a height of a solder bump present on a contact pad of a substrate is provided, including the steps: a) placing a solder ball having a predetermined volume in a capillary which is placed over the solder bump, b) liquefying the solder ball by applying laser energy from the laser source to the solder ball through the capillary, c) ejecting the liquefied solder ball from the capillary onto the solder bump by applying pressurized gas to the liquefied solder ball through the capillary, and d) melting the solder bump by transferring thermal and kinetic energy to the solder bump from the ejected liquefied solder ball and merging the liquefied solder ball with the melted solder bump.

Embodiments disclosed herein include electronic packages and methods of forming such electronic packages. In an embodiment, an electronic package comprises a plurality of stacked layers. In an embodiment, a first trace is on a first layer, wherein the first trace has a first thickness. In an embodiment, a second trace is on the first layer, wherein the second trace has a second thickness that is greater than the first thickness. In an embodiment, a second layer is over the first trace and the second trace.

A semiconductor device structure is provided. The semiconductor device structure includes an interconnection structure over a semiconductor substrate and a conductive pillar over the interconnection structure. The conductive pillar has a protruding portion extending towards the semiconductor substrate from a lower surface of the conductive pillar. The semiconductor device structure also includes an upper conductive via between the conductive pillar and the interconnection structure and a lower conductive via between the upper conductive via and the interconnection structure. The lower conductive via is electrically connected to the conductive pillar through the upper conductive via. The conductive pillar extends across opposite sidewalls of the upper conductive via and opposite sidewalls of the lower conductive via. A top view of an entirety of the second conductive via is separated from a top view of an entirety of the protruding portion.

Semiconductor devices including the use of solder materials and methods of manufacturing are provided. In embodiments the solder materials utilize a first tensile raising material, a second tensile raising material, and a eutectic modifier material. By utilizing the materials a solder material can be formed and used with a reduced presence of needles that may otherwise form during the placement and use of the solder material.

A semiconductor device has a semiconductor substrate and first insulating layer formed over the surface of the semiconductor substrate. A dummy via is formed through the first insulating layer. A second insulating layer is formed over the first insulating layer to fill the dummy via. A first conductive layer is formed over the second insulating layer. A bump is formed over the first conductive layer adjacent to the dummy via filled with the second insulating layer. A second conductive layer is formed over a surface of the semiconductor substrate. The dummy via filled with the second insulating layer relieves stress on the second conductive layer. A plurality of dummy vias filled with the second insulating layer can be formed within a designated via formation area. A plurality of dummy vias filled with the second insulating layer can be formed in a pattern.

A method includes forming a seed layer on a substrate. The seed layer includes a first metal. The method also includes forming a first metal layer over the seed layer. The first metal layer includes a second metal. The method further includes forming a second metal layer over the first metal layer. The second metal layer includes the first metal. The method includes converting at least a portion of the first metal layer into an alloy of the first metal and the second metal. The seed layer is then etched.

One example includes a method for fabricating an integrated circuit (IC) device. The method includes fabricating a semiconductor die comprising a metal top (METTOP) structure and forming a barrier layer over the METTOP structure to cover approximately the entirety of the METTOP structure. The method also includes forming a polyimide (PI) layer over the semiconductor die and over a portion of the barrier layer to form a gap that exposes the barrier layer through the PI layer. The method further includes forming a conductive post in the gap over the barrier layer.

A method includes: providing a support substrate covered by a separation layer, a seed layer, a resin layer having openings; forming, through the openings, interconnection elements by depositing a solder layer, a copper pillar, and optionally a gold layer; removing the resin, and etching the non-covered portion of the seed layer; assembling the interconnection elements to an assembly comprising a substrate in which are formed first chips and second chips assembled to the first chips; wherein the interconnection elements are assembled by thermocompression onto conductive landing areas positioned on the substrate coupled to the first chips; and removing the temporary support and the separation layer.

A system-in-package includes an interposer substrate having a first side and a second side opposite the first side, and a redistribution layer disposed on the first side. The redistribution layer includes a plurality of contact pads and a plurality of interconnections disposed on the first side. The plurality of interconnections is electrically connected to a plurality of terminals disposed on the second side opposite the first side. A first semiconductor die is disposed on the first side and electrically coupled to a first of the plurality of contact pads and a first of the plurality of interconnections disposed on the first side of the interposer substrate. A second semiconductor die is disposed on the first side. The second semiconductor die is electrically coupled to a second of the plurality of contact pads and a second of the plurality of interconnections disposed on the first side of the interposer substrate.

Disclosed are semiconductor packages and their fabrication methods. The semiconductor package comprises a first substrate having first pads on a first surface of the first substrate, a second substrate on the first substrate and having a plurality of second pads on a second surface of the second substrate, and connection terminals between the first substrate and the second substrate and correspondingly coupling the first pad to the second pads. Each of the connection terminals has a first major axis and a first minor axis that are parallel to the first surface of the first substrate and are orthogonal to each other. When viewed in a plan view, the first minor axis of each of the connection terminals is directed toward a center of the first substrate.