A method for fabricating semiconductor device includes the steps of first providing a first substrate having a high-voltage (HV) region and a medium voltage (MV) region and a second substrate having a low-voltage (LV) region and a static random access memory (SRAM) region, in which the HV region includes a HV device, the MV region includes a MV device, the LV region includes a fin field-effect transistor (FinFET), and the SRAM region includes a SRAM device. Next, a bonding process is conducted by using hybrid bonding, through-silicon interposer (TSI) or redistribution layer (RDL) for bonding the first substrate and the second substrate.

Embodiments of the present disclosure provide power to backend memory of an IC device from the back side of the device. An example IC device with back-side power delivery for backend memory includes a frontend layer with a plurality of frontend components such as frontend transistors, a backend layer (that may include a plurality of layers) with backend memory (e.g., with one or more eDRAM arrays), and a back-side power delivery structure with a plurality of back-side interconnects electrically coupled to the backend memory, where the frontend layer is between the back-side power delivery structure and the backend layer.

The semiconductor stacked package including a semiconductor die. The semiconductor die includes a substrate, a transistor, and a through-silicon-via (TSV) structure. The transistor is over the substrate. The TSV structure penetrates the substrate and comprises a first conductive layer, a second conductive layer, and a dielectric layer. The dielectric layer is between the first conductive layer and the second conductive layer. The method of manufacturing the same includes the following steps: forming a via hole in a substrate; forming a first conductive layer in the via hole; forming a dielectric layer in the via hole and over the first conductive layer; forming a second conductive layer in the via hole and over the dielectric layer; and forming a transistor over the substrate. The first conductive layer, the dielectric layer, and the second conductive layer collectively form a through-silicon-via (TSV) structure.

Provided is a semiconductor package including a first semiconductor chip; a plurality of lower first conductive posts on the first semiconductor chip; a second semiconductor chip offset-stacked on the first semiconductor chip; a plurality of lower second conductive posts on the second semiconductor chip; a first molding layer around the first semiconductor chip, and the second semiconductor chip; a third adhesive layer on an upper surface of the first molding layer; a plurality of upper first conductive posts on the plurality of lower first conductive posts; a plurality of upper second conductive posts on the plurality of lower second conductive posts; a third semiconductor chip on the third adhesive layer; a plurality of third conductive posts on the third semiconductor chip; a second molding layer on the third adhesive layer; and a redistribution structure on the second molding layer.

Provided is a semiconductor package including a package substrate having a first upper connection pad and a second upper connection pad provided on a top surface of the package substrate, a semiconductor chip disposed on the package substrate, a second semiconductor chip provided on the first semiconductor chip, a plurality of first chip pads and a plurality of second chip pads provided on top surfaces of the first semiconductor chip and the second semiconductor chip, respectively, a plurality of first conductive patterns, a plurality of second conductive patterns, and a cross conductive pattern of which both ends are connected to the first conductive pattern, wherein the cross conductive pattern is provided on a top surface of the first semiconductor chip and the second conductive pattern, and the cross conductive pattern crosses the second cross conductive pattern.

A semiconductor structure includes a plurality of first wafers and a through-substrate via (TSV). The plurality of first wafers include a plurality of conductive connection lines. Each of the conductive connection lines is located in the corresponding first wafer. The through-substrate via passes through the plurality of first wafers and a plurality of end portions of the plurality of conductive connection lines. The plurality of end portions are embedded in the through-substrate via.

A semiconductor package includes a redistribution substrate, a chip stack structure disposed on the redistribution substrate and including a plurality of semiconductor chips disposed in a stack, a vertical wiring portion connecting the chip stack structure to the redistribution substrate and including a plurality of vertical wires that extend in a direction perpendicular to an upper surface of the redistribution substrate, a sealing member configured to seal at least a portion the chip stack structure and the vertical wiring portion, and a heat dissipation metal member disposed on side surfaces and an upper surface of the sealing member.

A semiconductor package includes a package substrate having an upper surface, a lower surface opposite to the upper surface, and a receiving groove that extends from the upper surface, toward the lower surface, by a predetermined depth; a first semiconductor chip in the receiving groove and protruding from the upper surface of the package substrate to have a predetermined height from the upper surface of the package substrate; an underfill member in the receiving groove and between the first semiconductor chip and an inner surface of the receiving groove; a plurality of second semiconductor chips sequentially stacked on the first semiconductor chip; and a molding member on the package substrate and covering the first semiconductor chip and the plurality of second semiconductor chips.

An example semiconductor package includes a package substrate including a first upper connection pad and a second upper connection pad on a top surface of the package substrate, a first semiconductor chip stack including a plurality of first semiconductor chips and a first chip pad, a second semiconductor chip stack including a second chip pad and a plurality of second semiconductor chips stacked in a step-like shape on the first semiconductor chip stack, a first conductive pattern extending on the first semiconductor chip and the package substrate, a first cover insulation layer covering at least a portion of the first conductive pattern, a first encapsulation member surrounding the first semiconductor chip stack and the first conductive pattern, and a second conductive pattern extending along the second semiconductor chip, the first encapsulation member, and the package substrate.

An offset interposer includes a land side including land-side ball-grid array (BGA) and a package-on-package (POP) side including a POP-side BGA. The land-side BGA includes two adjacent, spaced-apart land-side pads, and the POP-side BGA includes two adjacent, spaced-apart POP-side pads that are coupled to the respective two land-side BGA pads through the offset interposer. The land-side BGA is configured to interface with a first-level interconnect. The POP-side BGA is configured to interface with a POP substrate. Each of the two land-side pads has a different footprint than the respective two POP-side pads.