Methods, systems, and devices for pass-through power delivery for logic-on-top semiconductor systems are described. A semiconductor system may be configured with a two-dimensional pattern of power delivery conductors that pass through semiconductor components of a stack (e.g., through one or more memory stacks), providing a more-distributed delivery of power to a logic component bonded with the stack. The power delivery conductors may include through-substrate vias that bypass circuitry of the stack, and thus may be allocated for providing power to the logic component. Such techniques may be combined with a redistribution component, such as a package substrate or interposer (e.g., opposite the logic component in the heterogeneous stack), which may include redistribution conductors that convert from relatively fewer interconnections at a surface of the semiconductor system (e.g., for solder interconnection) to relatively more interconnections at a surface bonded with the stack (e.g., for hybrid bonding interconnection).

Methods, systems, and devices for power and signal distribution in stacked semiconductor systems are described. A semiconductor system may include a distribution component configured to communicate power, signals, or both with a logic component and memory component(s) of the semiconductor system. The distribution component may include power delivery circuitry to provide separate power to the memory component(s) and the logic component, data serialization/deserialization circuitry to communicate data signals with the logic component, or both. The distribution component may convey power, data signals, or both to the logic component using conductive vias that pass through the memory components and bypass interface circuitry of the memory component(s). The distribution component may include clock circuitry that receives, generates, or both, one or more clock signals and provides the one or more clock signals for I/O functionality of the distribution component, the logic component, the interface circuitry, or any combination thereof.

In certain aspects, a three-dimensional (3D) memory device includes a first semiconductor structure and a second semiconductor structure bonded with the first semiconductor structure. The first semiconductor structure includes an array of NAND memory strings, a semiconductor layer in contact with source ends of the array of NAND memory strings, a non-conductive layer aligned with the semiconductor layer, and a contact structure in the non-conductive layer. The non-conductive layer electrically insulates the contact structure from the semiconductor layer. The second semiconductor structure includes a transistor.

A semiconductor device includes a first stacked body and a second stacked body bonded to the first stacked body. The first stacked body includes a first pad provided on a first bonding surface to which the first stacked body and the second stacked body are bonded. The second stacked body includes a second pad bonded to the first pad on the first bonding surface. When a direction from the first stacked body to the second stacked body is defined as a first direction, a direction intersecting with the first direction is defined as a second direction, a direction intersecting with the first direction and the second direction is defined as a third direction, dimensions of the first pad and the second pad in the third direction are defined as PX1 and PX2, respectively, and dimensions of the first pad and the second pad in the second direction are defined as PY1 and PY2, respectively, the dimensions of the first pad and the second pad satisfy at least one of Equations (1) and (2) below.

[00001]$\begin{array}{cc}\mathrm{PX}1>\mathrm{PY}1& \left(1\right)\end{array}$$\begin{array}{cc}\mathrm{PY}2>\mathrm{PX}2& \left(2\right)\end{array}$

A memory device includes a memory die bonded to a logic die. A logic die that is bonded to a memory die via a wafer-on-wafer bonding process can receive signals indicative of input data from a global data bus of the memory die and through a bond of the logic die and memory die. The logic die can also receive signals indicative of kernel data from local input/output (LIO) lines of the memory die and through the bond. The logic die can perform a plurality of operations at a plurality of vector-vector (VV) units utilizing the signals indicative of input data and the signals indicative of kernel data.

Methods for substrate processing include attaching a plurality of dies to a first carrier, wherein each die has a first side and a second side opposite the first side, wherein the first side is attached to the first carrier and wherein the plurality of dies are spaced horizontally from one another on the first carrier; filling spaces between the plurality of dies and covering the second sides of the plurality of dies with a dielectric or metal; grinding or polishing the dielectric or metal covering the second sides and grinding or polishing the second sides until the second sides are exposed and the plurality of dies have a substantially uniform thickness; and after grinding or polishing, dishing die faces of the plurality of dies to a desired dishing profile.

A semiconductor package includes a first semiconductor chip including a first semiconductor layer, a first through-electrode that penetrates through the first semiconductor layer, a first bonding pad connected to the first through-electrode, and a first insulating bonding layer, and a second semiconductor chip on the first semiconductor chip and including a second semiconductor layer, a second bonding pad bonded to the first bonding pad, and a second insulating bonding layer bonded to the first insulating bonding layer, wherein the first insulating bonding layer includes a first insulating material, the second insulating bonding layer includes a first insulating layer that forms a bonding interface with the first insulating bonding layer and a second insulating layer on the first insulating layer, the first insulating layer includes a second insulating material, different from the first insulating material, and the second insulating layer includes a third insulating material, different from the second insulating material.

A method of manufacturing a semiconductor package may include: preparing a semiconductor wafer including rear pads and a rear insulating layer surrounding the rear pads, the rear insulating layer including first recesses spaced apart from the rear pads in a first lateral direction; preparing second semiconductor chips including front pads and a front insulating layer surrounding the front pads, the front insulating layer including second recesses spaced apart from the front pads in the first lateral direction; forming an air gap between the first recesses and the second recesses in a vertical direction by disposing the second semiconductor chips on the semiconductor wafer, the rear pads contacting the front pads; and bonding the rear insulating layer and the front insulating layer to each other and bonding the rear pads and the front pads to each other by performing a thermal compression process.

A semiconductor device includes a first substrate structure including a substrate, circuit elements, and first bonding metal layers, and a second substrate structure connected to the first substrate structure. The second substrate structure includes a plate layer, gate electrodes stacked in a first direction below the plate layer, separation regions penetrating through the gate electrodes and extending in a second direction and spaced apart from each other in the second direction, an insulating region extending from an upper surface of the plate layer and penetrating through the plate layer and at least one of the gate electrodes between the separation regions, and second bonding metal layers connected to the first bonding metal layers. The insulating region has inclined side surfaces such that a width of the insulating region decreases in a direction toward the first substrate structure.

A semiconductor device assembly can include a first semiconductor device comprising CMOS circuitry at a first active surface and a second semiconductor device having a footprint smaller than that of the first semiconductor device and including memory array circuitry at a second active surface hybrid-bonded to the first active surface. The assembly can further include a gapfill material directly contacting the first active surface of the first semiconductor device and having an upper surface coplanar with a back surface of the second semiconductor device, and a metallization layer disposed over the second semiconductor device and the gapfill material. The metallization layer can include conductive structures operably coupled to the second semiconductor device through back-side contacts of the second semiconductor device. The assembly can further include a plurality of bond pads disposed at an upper surface of the metallization layer and coupled to the conductive structures of the metallization layer.