A method for forming a semiconductor structure for wafer level bonding includes the steps of forming a bonding dielectric layer on a substrate, forming an opening in the bonding dielectric layer, wherein an bottom angle between a sidewall and a bottom surface of the opening is smaller than 90 degrees, forming a conductive material layer on the bonding dielectric layer and filling the opening, and performing a chemical mechanical polishing process to remove the conductive material layer outside the opening, thereby forming a bonding pad in the opening.

Methods, systems, and devices for bypass interconnections for stacked semiconductor systems are described. An interface between a logic component and a system substrate of a semiconductor system may extend beyond an active area of a memory stack and couple between the logic component and the system substrate via one or more bypass regions. In some examples, through-silicon vias may be formed through portions of a memory stack, such as a semiconductor extension at edges of each memory die, which may be used for transfer of high-speed or high-energy signals. Additionally, or alternatively, a logic component may be placed on top of a stack of memory dies with separate bypass components along one or more sides adjacent to a memory stack, through which bypass interconnects may be formed, allowing for different configurations and avoiding the use of memory component silicon being allocated for such interconnections.

The present technology relates to hybrid bonding of semiconductor memory wafer and semiconductor CMOS wafer using one or more debondable carriers. In one embodiment, a semiconductor device assembly is disclosed. The semiconductor device assembly includes a first semiconductor wafer having complementary metal-oxide-semiconductor (CMOS) transistor devices, the first semiconductor wafer having a first frontside surface and a first backside surface, and a second semiconductor wafer having one or more memory arrays, the second semiconductor wafer having a second frontside surface and a second backside surface, wherein a bonding interface is formed between the first backside surface of the first semiconductor wafer and the second frontside surface of the second semiconductor wafer, and wherein the first semiconductor wafer has a first dielectric layer disposed on its first frontside surface.

A semiconductor structure including a first structure of a first wafer including a first substrate layer, a first device layer disposed on the first substrate layer, a first bonding layer disposed on the first device layer including a first portion of an alignment mark, and a second structure of a second wafer including a second substrate layer, a second device layer disposed on the second substate layer, a second bonding layer disposed on the second device layer including a second portion of the alignment mark, wherein the first portion of the alignment mark and the second portion of the alignment mark forms the alignment mark configured to provide an alignment for bonding cross the first bonding layer and the second bonding layer. The first device layer or the second device layer may include a three-dimensional NAND flash memory circuit as a part of a storage media with high-performance and high-capacity.

According to some embodiments, a semiconductor package may include a first semiconductor chip; a second semiconductor chip disposed on a first semiconductor chip; a wall structure disposed on the first semiconductor chip and spaced apart from the second semiconductor chip in a first direction; and a mold layer covering the first and second semiconductor chips, wherein the first semiconductor chip includes a transceiver disposed thereon and spaced apart from the second semiconductor chip, the mold layer has an opening exposing the transceiver, the wall structure is disposed in the opening and is in contact with an inner wall of the mold layer exposed to the opening, the mold layer has a first height, and the wall structure has a second height smaller than the first height.

Methods, systems, and devices for pass-through power delivery for logic-on-top semiconductor systems are described. A semiconductor system may be configured with a two-dimensional pattern of power delivery conductors that pass through semiconductor components of a stack (e.g., through one or more memory stacks), providing a more-distributed delivery of power to a logic component bonded with the stack. The power delivery conductors may include through-substrate vias that bypass circuitry of the stack, and thus may be allocated for providing power to the logic component. Such techniques may be combined with a redistribution component, such as a package substrate or interposer (e.g., opposite the logic component in the heterogeneous stack), which may include redistribution conductors that convert from relatively fewer interconnections at a surface of the semiconductor system (e.g., for solder interconnection) to relatively more interconnections at a surface bonded with the stack (e.g., for hybrid bonding interconnection).

Methods, systems, and devices for power and signal distribution in stacked semiconductor systems are described. A semiconductor system may include a distribution component configured to communicate power, signals, or both with a logic component and memory component(s) of the semiconductor system. The distribution component may include power delivery circuitry to provide separate power to the memory component(s) and the logic component, data serialization/deserialization circuitry to communicate data signals with the logic component, or both. The distribution component may convey power, data signals, or both to the logic component using conductive vias that pass through the memory components and bypass interface circuitry of the memory component(s). The distribution component may include clock circuitry that receives, generates, or both, one or more clock signals and provides the one or more clock signals for I/O functionality of the distribution component, the logic component, the interface circuitry, or any combination thereof.

Resistive RAM (RRAM) devices having increased reliability and related manufacturing methods are described in combination with stacked technology with CMOS ASIC wafters. Greater reliability of RRAM cells over time can be achieved by avoiding direct contact of metal electrodes with the device switching layer. Stacking technology can be used to address incompatibility of ReRAM processing and CMOS ASICs processing.

In certain aspects, a three-dimensional (3D) memory device includes a first semiconductor structure and a second semiconductor structure bonded with the first semiconductor structure. The first semiconductor structure includes an array of NAND memory strings, a semiconductor layer in contact with source ends of the array of NAND memory strings, a non-conductive layer aligned with the semiconductor layer, and a contact structure in the non-conductive layer. The non-conductive layer electrically insulates the contact structure from the semiconductor layer. The second semiconductor structure includes a transistor.

A semiconductor device includes a first stacked body and a second stacked body bonded to the first stacked body. The first stacked body includes a first pad provided on a first bonding surface to which the first stacked body and the second stacked body are bonded. The second stacked body includes a second pad bonded to the first pad on the first bonding surface. When a direction from the first stacked body to the second stacked body is defined as a first direction, a direction intersecting with the first direction is defined as a second direction, a direction intersecting with the first direction and the second direction is defined as a third direction, dimensions of the first pad and the second pad in the third direction are defined as PX1 and PX2, respectively, and dimensions of the first pad and the second pad in the second direction are defined as PY1 and PY2, respectively, the dimensions of the first pad and the second pad satisfy at least one of Equations (1) and (2) below.

[00001]$\begin{array}{cc}\mathrm{PX}1>\mathrm{PY}1& \left(1\right)\end{array}$$\begin{array}{cc}\mathrm{PY}2>\mathrm{PX}2& \left(2\right)\end{array}$