Provided is an industrial magazine rack in which a biasing mechanism for biasing a stopper member to a closed position or an open position is prevented from coming into contact with a board-shaped member housed in a rack main body. The industrial magazine rack includes a base fixed to a lower surface of a top plate or an upper surface of a bottom plate, a pivot bracket for supporting the stopper member, which is supported by the base so as to be pivotable on a pivot axis extending in a vertical direction on an outside of a side plate, and a torsion coil spring having a first end portion mounted to the base on an outside of a pivot center of the pivot bracket in a left and right direction and a second end portion mounted to the pivot bracket between the pivot center of the pivot bracket and the first end portion in the left and right direction, and the torsion coil spring is formed to bias the stopper member toward the closed position when the second end portion is on one side of an imaginary line connecting the pivot center of the pivot bracket and the first end portion, and bias the stopper member toward the open position when the second end portion is on another side of the imaginary line.

Systems for transporting a plurality of semiconductor structures, wafer boats for holding the plurality of semiconductor structures and methods for heating a set of semiconductor wafers. In some embodiments, the wafer boat frame is made of a metal and the combs are made of quartz. The wafer boats may include one or more combs that are able to float within a comb holder during heating of the wafer boat.

Systems for transporting a plurality of semiconductor structures, wafer boats for holding the plurality of semiconductor structures and methods for heating a set of semiconductor wafers. In some embodiments, the wafer boat frame is made of a metal and the combs are made of quartz. The wafer boats may include one or more combs that are able to float within a comb holder during heating of the wafer boat.

A wafer boat system comprises a carrier and a plurality of holder rings configured to support a wafer in the carrier. Each of the holder rings has an annular body and ring projections projecting from said annular body for contact with the wafer. At the ring projections, a local surface area of the annular body is small compared to a circumferential average or median of the local surface area of the annular body, in particular so as to at least partly compensate for a surface area of the respective ring projection, thereby promoting evenness of vapor deposition on wafers supported on the holder rings in the carrier. The reduced local surface area is preferably realized by a relatively large inner radius of the annular body at the ring projection. The carrier may provide a reference structure for automated wafer positioning.