An integration process including an etch stop layer for high density memory and logic applications and methods of fabrication are described. While various examples are described with reference to FeRAM, capacitive structures formed herein can be used for any application where a capacitor is desired. For instance, the capacitive structure can be used for fabricating ferroelectric based or paraelectric based majority gate, minority gate, and/or threshold gate.

Memory devices and systems with post-packaging master die selection, and associated methods, are disclosed herein. In one embodiment, a memory device includes a plurality of memory dies. Each memory die of the plurality includes a command/address decoder. The command/address decoders are configured to receive command and address signals from external contacts of the memory device. The command/address decoders are also configured, when enabled, to decode the command and address signals and transmit the decoded command and address signals to every other memory die of the plurality. Each memory die further includes circuitry configured to enable, or disable, or both individual command/address decoders of the plurality of memory dies. In some embodiments, the circuitry can enable a command/address decoder of a memory die of the plurality after the plurality of memory dies are packaged into a memory device.

A semiconductor package may include a first semiconductor chip and a second semiconductor chip on a top surface thereof. The first semiconductor chip may include a first bonding pad on a top surface of a first semiconductor substrate and a first penetration via on a bottom surface of the first bonding pad and penetrating the first semiconductor substrate. The second semiconductor chip may include a second interconnection pattern on a bottom surface of a second semiconductor substrate and a second bonding pad on a bottom surface of the second interconnection pattern and coupled to the second interconnection pattern. The second bonding pad may be directly bonded to the first bonding pad. A width of the first penetration via may be smaller than that of the first bonding pad, and a width of the second interconnection pattern may be larger than that of the second bonding pad.

A three-dimensional (3D) integrated circuit (IC) (3DIC) package with a bottom die layer employing an interposer substrate, and related fabrication methods. To facilitate the ability to fabricate the 3DIC package using a top die-to-bottom wafer process, a bottom die layer of the 3DIC package includes an interposer substrate. This interposer substrate provides support for a bottom die(s) of the 3DIC package. The interposer substrate is extended in length to be longer in length than the top die. The interposer substrate provides additional die area in the bottom die layer in which a larger length, top die can be bonded. In this manner, the bottom die layer, with its extended interposer substrate, can be formed in a bottom wafer in which the top die can be bonded in a top die-to-bottom wafer fabrication process.

A semiconductor device may include a gate structure including alternately stacked insulating layers and conductive layers, a slit structure extending through the gate structure, a channel layer extending through the gate structure, a first data storage layer surrounding the channel layer, second data storage patterns respectively positioned between the conductive layers and the first data storage layer, first blocking patterns respectively positioned between the conductive layers and the second data storage patterns, and buffer patterns positioned between the insulating layers and the first data storage layer.

A semiconductor chip may include: a semiconductor substrate; a through silicon via that vertically penetrates the semiconductor substrate; an integrated device layer on a first surface of the semiconductor substrate and including integrated devices; a multi-wiring layer on the integrated device layer and including layers of wires; an upper metal layer on the multi-wiring layer and connected to the wires; and a lower metal layer on a second surface of the semiconductor substrate. The semiconductor substrate may include a lower bump area on the second surface of the semiconductor substrate, the lower bump area including bump pads thereon, and the lower metal layer may be on a periphery of the lower bump area.

A semiconductor structure includes a plurality of first wafers and a through-substrate via (TSV). The plurality of first wafers include a plurality of conductive connection lines. Each of the conductive connection lines is located in the corresponding first wafer. The through-substrate via passes through the plurality of first wafers and a plurality of end portions of the plurality of conductive connection lines. The plurality of end portions are embedded in the through-substrate via.

An example apparatus includes a semiconductor substrate having a front surface on which an internal circuit is formed and a back surface opposite to the front surface, a first TSV penetrating the semiconductor substrate, and a first back side pad on the back surface of the semiconductor substrate and coupled to the first TSV The internal circuit includes an internal test node. The first back side pad is coupled to the internal test node of the internal circuit via the first TSV.

System-in-packages (SiPs) having vertically integrated processing units and combined high-bandwidth memory (HBM) devices, and associated devices and methods, are disclosed herein. In some embodiments, the SiP includes a processing unit and a HBM device carried by the processing unit. Further, the combined HBM device can include one or more volatile memory dies and one or more non-volatile memory dies. The SiP can also include a shared through silicon via (TSV) bus that electrically couples combined HBM device can also include a shared bus that is electrically coupled to each of the processing unit, the one or more volatile memory dies, and the one or more non-volatile memory dies to establish communication paths therebetween.

Aspects of the disclosure provide a semiconductor device and a method to fabricate the semiconductor device. The semiconductor device includes a first die comprising a first contact structure formed on a face side of the first die. The semiconductor device includes a first semiconductor structure and a first pad structure that are disposed on a back side of the first die. The first semiconductor structure is conductively connected with the first contact structure from the back side of the first die and the first pad structure is conductively coupled with the first semiconductor structure. An end of the first contact structure protrudes into the first semiconductor structure without connecting to the first pad structure. The first die and a second die can be bonded face-to-face.