A semiconductor device has a substrate. An electrical component is disposed over a first surface of the substrate. A solder paste is disposed over the first surface of the substrate. A conductive pillar is disposed on the solder paste. An encapsulant is deposited over the first surface of the substrate, the electrical component, and the conductive pillar. A solder bump is formed over the conductive pillar.

An apparatus including a substrate having a first surface, and a silicon interposer including a first surface and a second surface, wherein the first surface is connected to the first surface of the substrate. The apparatus also includes at least one stack including an artificial intelligence (AI) chiplet and a plurality of static random-access memories (SRAMs) stacked below the AI chiplet, wherein the at least one stack includes a top surface, a bottom surface, a first side surface and a second side surface, and the at least one stack is orthogonally attached by the first side surface to the second surface of the silicon interposer. The apparatus additionally includes a heat spreader surrounding the top surface, the bottom surface and the second side surface of the at least one stack.

According to one aspect of the present disclosure, a memory apparatus is provided. The memory apparatus may include a first memory die and a die group stacked in a first direction. The die group may include M second memory dies stacked in the first direction. Each of the second memory dies may be connected to a third memory die and configured to perform data exchange at a bandwidth of (N*X) bits with the third memory die through N data channels. The first memory die may be connected to the third memory die. The first memory die may be configured to perform data exchange at a bandwidth of (N*X) bits with the third memory die through N data channels. The first memory die may be configured to replace a first data channel of the die group when a storage portion corresponding to the first data channel fails.

The present application discloses a double-sided SiP packaging structure and a manufacturing method thereof, wherein the double-sided SiP packaging structure comprises a substrate, a first packaging structure arranged on the substrate, and a second packaging structure arranged below the substrate; the second packaging structure comprises a chip, a interposer and a molding material; a conductive structure array is arranged on an upper surface of the interposer; the interposer is arranged below the substrate through the conductive structure array; a space region among a lower surface of the substrate, the chip and the interposer is filled with the molding material; a conductive bonding pad array is arranged on the lower surface of the interposer; and a groove is formed in a part of region between the conductive bonding pad and an edge contour of the interposer.

A microelectronic assembly is provided, comprising: an interposer having a first side and a second side opposite to the first side; a plurality of integrated circuit (IC) dies in a plurality of layers on the first side of the interposer, the plurality of IC dies being encased by a dielectric material; a package substrate on the second side of the interposer; a plurality of conductive vias through the plurality of layers; and redistribution layers adjacent to the layers in the plurality of layers, at least some of the redistribution layers comprising conductive traces coupling the conductive vias to the IC dies.

A semiconductor package may include: a first double-chip structure including a first semiconductor chip, a second semiconductor chip, a first scribe lane region dividing the first semiconductor chip and the second semiconductor chip, and a first through hole in the first scribe lane region; a second double-chip structure on the first double-chip structure, the second double-chip structure including a third semiconductor chip, a fourth semiconductor chip, a second scribe lane region dividing the third semiconductor chip and the fourth semiconductor chip, and a second through hole in the second scribe lane region; first conductive connection members between the first and second double-chip structures and configured to electrically connect the first and third semiconductor chips and the second and fourth semiconductor chips; and a molding member on the first double-chip structure and the second double-chip structure and in the first through hole and the second through hole.