A semiconductor package comprises a first die having a central region and a peripheral region that surrounds the central region; a plurality of through electrodes that penetrate the first die; a plurality of first pads at a top surface of the first die and coupled to the through electrodes; a second die on the first die; a plurality of second pads at a bottom surface of the second die, the bottom surface of the second die facing the top surface of the first die; a plurality of connection terminals that connect the first pads to the second pads; and a dielectric layer that fills a space between the first die and the second die and surrounds the connection terminals. A first width of each of the first pads in the central region may be greater than a second width of each of the first pads in the peripheral region.

A method includes bonding a first plurality of device dies onto a wafer, wherein the wafer includes a second plurality of device dies, with each of the first plurality of device dies bonded to one of the second plurality of device dies. The wafer is then sawed to form a die stack, wherein the die stack includes a first device die from the first plurality of device dies and a second device die from the second plurality of device dies. The method further includes bonding the die stack over a package substrate.

A method includes removing an oxide layer from select areas of a surface of a metal structure of a lead frame to create openings that extend through the oxide layer to expose portions of the surface of the metal structure. The method further includes attaching a semiconductor die to the lead frame, performing an electrical connection process that electrically couples an exposed portion of the surface of the metal structure to a conductive feature of the semiconductor die, enclosing the semiconductor die in a package structure, and separating the electronic device from the lead frame. In one example, the openings are created by a laser ablation process. In another example, the openings are created by a chemical etch process using a mask. In another example, the openings are created by a plasma process.

A package structure is provided, which includes a redistribution structure, an interposer substrate disposed over the redistribution structure, a first semiconductor die disposed between the redistribution structure and the interposer substrate, a second semiconductor die partially overlapping the first semiconductor die in a direction perpendicular to a surface of the redistribution structure, and a first protective layer surrounding the first semiconductor die.

A semiconductor package includes a redistribution layer including, a first insulating layer including a first trench, a first conductive layer including a first conductive region extending along a top surface of the first insulating layer and a second conductive region disposed inside the first trench, a second insulating layer on the first conductive layer and the first insulating layer, the second insulating layer including a second trench at least partially overlapping the first trench, the second trench exposing a part of the first conductive region and a second conductive layer including a third conductive region extending along a top surface of the second insulating layer and a fourth conductive region disposed on the second conductive region inside a via trench including sidewalls of the first trench and the second trench, and wherein the second and fourth conductive regions have a width in a range of 20 m to 600 m.

A radio frequency (RF) bridge that may include a body having an interfacing surface and a bonding surface extending from the interfacing surface. RF bridge may also include an interconnect operably engaged with the body. The interconnect may have at least one electrical connection positioned at the interfacing surface and at least another electrical connection positioned at the interfacing surface adjacent with the at least one electrical connection. The interconnect extends curvilinearly between the at least one electrical connection and the at least another electrical connection creating a curvilinear signal path.

Examples of the present technology provide heterogeneous (i.e., multi-chip) ASIC-memristor integrations that enable high voltage-dependent precision memristor programming while preserving optimal ASIC performance/capabilities. Examples achieve these advantages by de-coupling memristor hardware from ASIC chip. Accordingly, a heterogeneous ASIC-memristor integration of the present technology may comprise an ASIC chip packaged onto a functional memristor-interposer chip. The memristor interposer may serve both a functional and structural purpose. Namely, memristors of the memristor interposer can be leveraged in conjunction with the ASIC for processing/computation functionswhile connections within the memristor interposer route signals between ASIC and computing system (e.g., between the ASIC and a printed circuit board).

The present disclosure relates to a double-sided integrated circuit (IC) module, which includes an exposed semiconductor die on a bottom side. A double-sided IC module includes a module substrate with a top side and a bottom side. Electronic components are mounted to each of the top side and the bottom side. Generally, the electronic components are encapsulated by a mold compound. In an exemplary aspect, a portion of the mold compound on the bottom side of the module substrate is removed, exposing a semiconductor die surface of at least one of the electronic components.

A package structure is provided. The package structure includes a first electronic component and a second electronic component, and a data access structure. The data access structure is disposed partially in a gap between the first electronic component and the second electronic component. The data access structure includes a logic portion and a storage portion. One of the logic portion and the storage portion is in the gap, and the other one of the logic portion and the storage portion is outside of the gap.

An electronic device, includes: (i) a processing chiplet configured to process data and having a first side and a second side, (ii) one or more first static random-access memory (SRAM) chiplets disposed on the first side of the processing chiplet and configured to store a first portion of the data, (iii) one or more second SRAM chiplets disposed on the second side of the processing chiplet and configured to store a second portion of the data, (iv) one or more first electrical terminals disposed on the first side of the processing chiplet and configured to electrically connect between the first side of the processing chiplet and the first SRAM chiplets, and (v) one or more second electrical terminals disposed on the second side of the processing chiplet and configured to electrically connect between the second side of the processing chiplet and the second SRAM chiplets.