A first transfer device and a second transfer device are configured to transfer a first substrate and a second substrate in a normal pressure atmosphere. A third transfer device is configured to transfer the first substrate and the second substrate in a decompressed atmosphere. A load lock chamber has accommodation sections allowed to accommodate therein the first substrate and the second substrate, and is allowed to switch an inside of the accommodation sections between the normal pressure atmosphere and the decompressed atmosphere. Multiple gates are respectively disposed on three different sides of the load lock chamber, and allowed to open or close the load lock chamber. The first transfer device, the second transfer device, and the third transfer device carry the first substrate and the second substrate into/out of the load lock chamber through different gates among the multiple gates.

A process station includes: a housing; a membrane disposed in the housing, the membrane isolating a first region within the housing from a second region within the housing; a first magnetic levitation actuator assembly disposed in the first region, the first magnetic levitation assembly including: a plurality of stators configured to levitate and drive a carrier within the second region; a plurality of sensor assemblies, each sensor assembly including: a first sensor configured to detect a first distance between the membrane and a first portion of a first upper surface of a first sinusoidal element of the carrier, the first upper surface defining a sinusoidal profile; and a second sensor configured to detect a second distance between the membrane and a second portion of the first upper surface of the first sinusoidal element, and wherein the second sensor is spaced apart from the first sensor by a spacing distance.

There is a substrate transfer apparatus comprising: a circular tube having a tube axis extending in a lateral direction and having a transfer region for a substrate in the circular tube; a magnetic field generating portion having a magnetic field generating surface facing the transfer region and configured to generate a magnetic field on the magnetic field generating surface; and a transfer body configured to transfer the substrate while moving in a plane direction of the magnetic field generating surface in a state that the transfer body is distant from the magnetic field generating surface by the magnetic field.

There is a substrate transfer apparatus comprising: a circular tube having a tube axis extending in a lateral direction and having a transfer region for a substrate in the circular tube; a magnetic field generating portion having a magnetic field generating surface facing the transfer region and configured to generate a magnetic field on the magnetic field generating surface; and a transfer body configured to transfer the substrate while moving in a plane direction of the magnetic field generating surface in a state that the transfer body is distant from the magnetic field generating surface by the magnetic field.

A method includes receiving, by a processing device, first data generated by a first sensor of a substrate processing system. The first data is generated responsive to the first sensor receiving electromagnetic radiation from a substrate held by a robot arm of a transfer chamber in the substrate processing system. The method further includes processing the first data to obtain second data. The second data includes a first indication of performance of the substrate processing system. The method further includes causing, in view of the second data, performance of a corrective actions associated with the substrate processing system.

A transport vehicle cleaning device that cleans a transport vehicle incudes a housing including a cleaning space accommodating the transport vehicle for cleaning, a plurality of fans disposed at an upper part of the housing and generating a downward airflow in the cleaning space, a cleaning gas injector disposed at a ceiling of the housing and injecting a cleaning gas towards the transport vehicle in the cleaning space of the housing, an exhaust unit provided at a lower part of the housing and exhausting the cleaning gas supplied to the cleaning space and a foreign matter removed from the transport vehicle from the cleaning space, and a frame cover disposed in the housing and configured to completely cover opposite openings of the frame in the housing to form a closed internal space of the frame separated from the cleaning space.

A first guide body includes a pair of first guide surfaces and corrects the position in a second direction of a gripping body section relative to a first grip section by at least one of the pair of first guide surfaces coming into contact with the first grip section during a lowering operation for gripping. A second guide body includes a pair of second guide surfaces and corrects the position in the second direction of the gripping body section relative to a target grip section by at least one of the pair of second guide surfaces coming into contact with the target grip section during the lowering operation for gripping. The first guide body and the second guide body are spaced apart from each other in at least either a first direction or the second direction.