This document discloses techniques, apparatuses, and systems for semiconductor device interconnects formed through volumetric expansion. A semiconductor assembly is described that includes two semiconductor dies. The first semiconductor die and the second semiconductor die are bonded at a dielectric layer of the first semiconductor die and a dielectric layer of the second semiconductor die to create one or more interconnect openings. The first semiconductor die includes a reservoir of conductive material located adjacent to the one or more interconnect openings and having a width greater than a width of the one or more interconnect openings. The reservoir of conductive material is heated to volumetrically expand the reservoir of conductive material through the one or more interconnect openings to form one or more interconnects electrically coupling the first semiconductor die and the second semiconductor die. In this way, a connected semiconductor device may be assembled.

Microelectronic devices and method of forming a plurality of microelectronic devices on a semiconductor workpiece are disclosed herein. One such method includes placing a plurality of first interconnect elements on a side of a semiconductor workpiece, forming a layer on the side of the workpiece, reshaping the first interconnect elements by heating the first interconnect elements, and coupling a first portion of a plurality of individual second interconnect elements to corresponding first interconnect elements with a second portion of the individual second interconnect elements exposed.

Provided is a bonding structure including a first dielectric layer, a first non-twinned metal layer, a first twinned metal layer, and a first transition layer. The first dielectric layer has a first inner sidewall defining a first via hole and a first trench on the first via hole. The first non-twinned metal layer is filled in the first via hole. The first twinned metal layer is disposed over the first non-twinned metal layer and within the first trench. The first transition layer is sandwiched between the first non-twinned metal layer and the first twinned metal layer.

A chip structure provided herein includes a bridge structure including an interconnect bridge, a dielectric layer laterally surrounding the interconnect bridge and through dielectric vias extending from a top of the dielectric layer to a bottom of the dielectric layer, wherein a thickness of the interconnect bridge is identical to a height of each of the through dielectric vias; semiconductor dies disposed on the bridge structure, wherein each of the semiconductor dies overlaps both the interconnect bridge and the dielectric layer and is electrically connected to the interconnect bridge and at least one of the through dielectric vias; and a die support, the semiconductor dies being disposed between the die support and the bridge structure, wherein a sidewall of the die support is coplanar with a sidewall of the bridge structure.

Exothermic reactive bonding for semiconductor die assemblies, and associated systems and methods are disclosed. In an embodiment, a semiconductor die includes a dielectric layer having a conductive pad, where at least a portion of a surface of the dielectric layer includes a first epoxy compound. When another semiconductor die including a second epoxy compound (and another conductive pad) is brought in contact with the semiconductor die such that the first and second epoxy compounds can exothermically react, the thermal energy emanating from the exothermic reaction can facilitate bonding between the conductive pads to form interconnects between the two semiconductor dies. In some cases, the thermal energy is sufficient to form the interconnects. In other cases, the thermal energy assists the post bond annealing process to form the interconnects such that the annealing can be carried out at a lower temperature.

The current invention offers a method for preparing an electronic integrated circuit (EIC) for the assembly of an optical engine. The method involves stacking a CMOS-based EIC wafer onto a short loop/interposer wafer through face-to-back bonding. This stacked configuration serves as a carrier for the thin CMOS wafers. Subsequently, the stacked wafers are thinned down to the desired height and undergo a via last process. In this process, the thick metal layer from the short loop/interposer wafer acts as an etch stop. The stacked EIC wafers can then be diced and attached to a photonic integrated circuit (PIC) wafer, resulting in the formation of an optical engine.

A method includes providing a first bonding surface on a first substrate, the first bonding surface including a bonding layer that is thermally curable or photocurable. The method includes providing a second bonding surface on a second substrate. The method includes bonding the first substrate to the second substrate by making physical contact between the first bonding surface and second bonding surface. The method further includes applying thermal energy or light to the bonding layer.

An integrated detector device for direct detection of X-ray photons includes a CMOS body including a substrate portion and a dielectric portion arranged on a main surface of the substrate portion, an integrated circuit in the CMOS body having implants at or above the main surface for forming charge collectors, and a metal structure in the dielectric portion that extends from the charge collectors to a contact surface of the dielectric portion facing away from the substrate portion. The device further includes an absorber portion arranged on the contact surface of the dielectric portion, the absorber portion including an absorber element that is in electrical contact with the metal structure, and an electrode structure that is in direct contact with the absorber element forming an electrical contact. The absorber element is configured to absorb X-ray photons and generate electrical charges based on the absorbed X-ray photons.

A device package includes a first die comprising a semiconductor substrate; an isolation layer on the semiconductor substrate, wherein the isolation layer is a first dielectric material; a first dummy via penetrating through the isolation layer and into the semiconductor substrate; a bonding layer on the isolation layer, wherein the bonding layer is a second dielectric material that has a smaller thermal conductivity than the first dielectric material; a first dummy pad within the bonding layer and on the first dummy via; a dummy die directly bonded to the bonding layer; a second die directly bonded to the bonding layer and to the first dummy pad; and a metal gap-fill material between the dummy die and the second die.

A semiconductor package includes a first semiconductor chip including a first substrate having a front surface and a rear surface, a first insulating layer on the rear surface, a recess portion extending into the first substrate through the first insulating layer, a protective insulating layer extending along an inner side surface and a bottom surface of the recess portion, a through electrode extending from the front surface through the bottom surface of the recess portion and the protective insulating layer, and a first connection pad contacting the through electrode in the recess portion, and surrounded by the protective insulating layer, the first semiconductor chip having a flat upper surface defined by upper surfaces of the first insulating layer, the protective insulating layer, the first connection pad; and a second semiconductor chip disposed on the upper surface of the first semiconductor chip.