A method includes bonding an integrated circuit die to a carrier substrate, forming a gap-filling dielectric around the integrated circuit die and along the edge of the carrier substrate, performing a bevel clean process to remove portions of the gap-filling dielectric from the edge of the carrier substrate, after performing the bevel clean process, depositing a first bonding layer on the gap-filling dielectric and the integrated circuit die, forming a first dielectric layer on an outer sidewall of the first bonding layer, an outer sidewall of the gap-filling dielectric, and the first outer sidewall of the carrier substrate; and bonding a wafer to the first dielectric layer and the first bonding layer, wherein the wafer comprises a semiconductor substrate and a second dielectric layer on an outer sidewall of the semiconductor substrate.

A method of making an assembly can include juxtaposing a top surface of a first electrically conductive element at a first surface of a first substrate with a top surface of a second electrically conductive element at a major surface of a second substrate. One of: the top surface of the first conductive element can be recessed below the first surface, or the top surface of the second conductive element can be recessed below the major surface. Electrically conductive nanoparticles can be disposed between the top surfaces of the first and second conductive elements. The conductive nanoparticles can have long dimensions smaller than 100 nanometers. The method can also include elevating a temperature at least at interfaces of the juxtaposed first and second conductive elements to a joining temperature at which the conductive nanoparticles can cause metallurgical joints to form between the juxtaposed first and second conductive elements.

A display module includes: a substrate including a mounting surface on which a plurality of inorganic light-emitting devices are mounted, a side surface, and a rear surface being opposite to the mounting surface; a front cover bonded with the mounting surface and covering the mounting surface; a metal plate bonded with the rear surface; a side cover surrounding the side surface; and a side end member covering at least one portion of a side end of the side cover, and including a first portion being in contact with and grounded to the metal plate and a second portion connected to the first portion and positioned on the side end of the side cover.

A method of manufacturing a semiconductor package includes: forming through-vias extending from a front side of a semiconductor substrate into the substrate; forming, on the front side of the semiconductor substrate, a circuit structure including a wiring structure electrically connected to the through-vias; removing a portion of the semiconductor substrate so that at least a portion of each of the through-vias protrudes to a rear side of the semiconductor substrate; forming a passivation layer covering the protruding portion of each of the through-vias; forming trenches recessed along a periphery of a corresponding one of the through-vias; removing a portion of the passivation layer so that one end of each of the through-vias is exposed to the upper surface of the passivation layer; and forming backside pads including a dam structure in each of the trenches, the dam structure being spaced apart from the corresponding one of the through-vias.

A display device includes a base layer, a color filter layer on the base layer and including a color filter located at an emission area, a light emitting element layer on the color filter layer and including a light emitting element located at the emission area, a first electrode on a first end of the light emitting element, and a second electrode on a second end of the light emitting element, a circuit layer on the light emitting element layer and including circuit elements and lines connected to the first electrode and the second electrode, and pads on the circuit layer and connected to the lines, and the first electrode and the second electrode may include a reflective conductive material.

Methods for forming semiconductor structures are provided. The method for forming a semiconductor structure includes forming a metal pad over a first substrate and forming a polymer layer over the metal pad. The method for forming a semiconductor structure further includes forming a seed layer over the metal pad and extending over the polymer layer and forming a conductive pillar over the seed layer. The method for forming a semiconductor structure further includes wet etching the seed layer using an etchant comprising H2O2. In addition, the step of wet etching the seed layer is configured to form an extending portion having a slope sidewall.

An image sensor includes a stack structure including an active pixel region of pixels, and a pad region. The stack structure further includes a first substrate including a photoelectric conversion region and a floating diffusion region, a first semiconductor substrate, a first front structure arranged on a first surface of the first semiconductor substrate, a second substrate attached to the first front structure and including pixel gates, a second semiconductor substrate, and a second front structure, a third substrate attached to the second substrate and including a logic transistor for driving the pixels, and a pad arranged in the pad region. A side surface and a bottom surface of the pad are surrounded by the second front structure, and at least a portion of a top surface of the pad is exposed through a pad opening penetrating the first substrate and extending into the second substrate.

A semiconductor device includes a substrate having a first main surface and a second main surface opposite to the first main surface, and a first conductive layer including a first metal layer and a second metal layer, the first metal layer covering the second main surface, the second metal layer covering the first metal layer and including dendrites, wherein a via hole extending through the substrate and having an inner wall surface is formed in the substrate, and wherein the first metal layer, which is covered with the second metal layer, covers the inner wall surface.

A semiconductor structure including a semiconductor substrate, an interconnect structure and a bonding structure is provided. The interconnect structure is disposed on the semiconductor substrate. The interconnect structure includes an interconnect wiring distributed on a top surface of the interconnect structure. The bonding structure is disposed on and electrically connected to the interconnect structure. The bonding structure includes a bonding dielectric structure and a bonding conductor. The bonding dielectric structure is disposed on the top surface of the interconnect structure and covers the interconnect wiring. The bonding conductor is embedded in the bonding dielectric structure, wherein the bonding conductor lands on the top surface of the interconnect wiring and a first sidewall of the interconnect wiring.

Methods for fabricating flexible interposers for providing electrical connection between devices mounted at different vertical positions with respect to a substrate or a planar interposer. A bonded structure may comprise a bent flexible interposer extending from a first interposer portion between a main device on the substrate or the planar interposer and a second interposer portion above the main device and above or below a device positioned above the main device and electrically connected to the main device via a bent portion of the flexible interposer.