A method of forming a semiconductor device comprises the following steps. A dielectric layer is formed over a substrate. Source/drain contact layers are formed in the dielectric layer. A 2D material layer is formed over the dielectric layer and the source/drain contact layers. An annealing process is performed to the 2D material layer. After performing the annealing process, a tellurization process is performed to the 2D material layer. A gate structure is formed over the 2D material layer.

Semiconductor packages, and methods for manufacturing semiconductor packages are provided. In one aspect, a method of manufacturing a semiconductor package includes stacking a plurality of semiconductor chips including a first semiconductor chip and a second semiconductor chip, the first semiconductor ship being offset from the second semiconductor ship to expose upper connection pads; forming a multilayered photoresist film to cover the plurality of semiconductor chips; forming a plurality of openings by exposing and developing the multilayered photoresist film; forming a plurality of conductive posts by filling the plurality of openings with a conductive material; removing the multilayered photoresist film; forming a molding encapsulant to surround the plurality of semiconductor chips and the plurality of conductive posts; and forming a wiring structure electrically connected to the plurality of conductive posts. The multilayered photoresist film comprises at least two layers having different chemical resistances and resolutions.

A method of forming an electrode in accordance with an exemplary embodiment includes a process of forming a mask pattern on one surface of a base to expose a partial area of the one surface of the base by using a mask material that is polymer including an end tail having at least one bonding structure of covalent bond and double bond, a process of loading the base on which the mask pattern is formed into a chamber, and a process of forming a conductive layer containing copper on the exposed one surface of the base by using an atomic layer deposition method that alternately injects a source material containing copper and a reactive material that reacts with the source material into the chamber. Thus, according to the method of forming an electrode in accordance with an exemplary embodiment, a thin-film caused by a material for forming an electrode is not formed on a surface of the mask pattern. Therefore, a residue is not remained when the mask pattern is removed to prevent a defect caused by the residue from being generated.

An excellent method of manufacturing a patterned substrate which is capable of easily patterning an insulation layer to provide a patterned substrate even when a difficult-to-etch material is used for the insulation layer, a patterned substrate obtained thereby, and a patterned substrate intermediate thereof are provided. The method of manufacturing a patterned substrate with the insulation layer and an electrode layer stacked in this order on a substrate comprising: forming an organic resist material layer; irradiating the organic resist material layer with radiation or an electromagnetic wave of a wavelength of 10 to 780 nm and developing the organic resist material layer to form a first patterning layer; and removing the first patterning layer.

A resist underlayer film forming composition which has high storage stability, has a low film curing start temperature, can cause the generation of a sublimated product in a reduced amount, and enables the formation of a film that is rarely eluted into a photoresist solvent; a method for forming a resist pattern using the resist underlayer film forming composition; and a method for manufacturing a semiconductor device. The resist underlayer film forming composition includes a crosslinkable resin, a crosslinking agent, a crosslinking catalyst represented by formula (I) and a solvent. (A-SO.sub.3).sup.(BH).sup.+[wherein A represents a linear, branched or cyclic saturated or unsaturated aliphatic hydrocarbon group which may be substituted, an aryl group which may be substituted by a group other than a hydroxy group, or a heteroaryl group which may be substituted; and B represents a base having a pKa value of 6.5 to 9.5.]