Systems including voltage regulator circuits are disclosed. In one embodiment, an apparatus includes a voltage regulator controller integrated circuit (IC) die including one or more portions of a voltage regulator circuit. The apparatus further includes a capacitor die, an inductor die, and an interconnect layer arranged over the voltage regulator controller IC die, the capacitor die and the inductor die. The interconnect provides electrical connections between the voltage regulator controller IC die, the capacitor die and the inductor die to form the voltage regulator circuit. In a further embodiment, the voltage regulator controller IC die, the capacitor die and the inductor die are arranged in a planar fashion within a voltage regulator module. In still another embodiment, a system IC is coupled to the voltage regulator module and includes one or more functional circuit blocks coupled to receive a regulated supply voltage generated by the voltage regulator circuit.

Provided is a semiconductor package including a first wiring structure including a first wiring and a first wiring insulating layer on the first wiring, a first semiconductor chip on the first wiring structure, and a molding member on the first semiconductor chip, wherein the first wiring includes a first wiring via and a first wiring line, wherein the first wiring structure includes a first layer and a second layer, wherein the first wiring via is in each of the first layer and the second layer, the first wiring via in the first layer and the first wiring via in the second layer contact each other in a vertical direction, and wherein a size of the first wiring via in the first layer is less than a size of the first wiring via in the second layer.

A package comprising a first substrate, a first integrated device coupled to the first substrate, a second substrate coupled to the first substrate through a first plurality of solder interconnects such that the first integrated device is located between the first substrate and the second substrate, wherein the second substrate includes a first surface and a second surface, an electrical device coupled to a second surface of the second substrate such that the electrical device is located between the first substrate and the second substrate, and an encapsulation layer coupled to the first substrate and the second substrate. The encapsulation layer is located between the first substrate and the second substrate. The encapsulation layer encapsulates the first integrated device and the electrical device.

The present disclosure provides semiconductor packages and methods of fabricating the same. In some embodiments, a semiconductor package includes a substrate including first and second regions, a first pad on the first region, a second pad on the second region, a first dielectric layer on the first region and including a first opening exposing the first pad, a second dielectric layer on the second region and including a second opening exposing the second pad, a first bump structure on the first pad and in the first opening, and a second bump structure on the second pad and in the second opening. A thickness of the first dielectric layer is greater than a thickness of the second dielectric layer. A distance between the substrate and an uppermost end of the first bump structure is longer than a distance between the substrate and an uppermost end of the second bump structure.

A semiconductor package includes a flexible circuit board and a chip which includes a first bump group and a second bump group. First bumps of the first bump group and second bumps of the second bump group are provided to be bonded to leads on the flexible circuit board. The second bumps are designed to be longer than the first bumps in length so as to increase bonding strength of the second bumps to the leads, prevent the leads from being shifted and separated from the first and second bumps and prevent lead bonding misalignment.

A semiconductor device includes a substrate comprising a logic cell region and a peripheral region extending around the logic cell region, a logic device in the logic cell region and comprising a plurality of source/drain patterns, an upper active contact on and electrically connected to one of the source/drain patterns, a lower active contact below and electrically connected to another of the source/drain patterns, a conductive structure that penetrates the peripheral region of the substrate, a plurality of peripheral upper wiring lines in the peripheral region and connected to the conductive structure, and a plurality of peripheral lower wiring lines in the peripheral region and connected to the conductive structure opposite the peripheral upper wiring lines. A bottom surface of the conductive structure is lower than a bottom surface of the lower active contact, relative to a bottom surface of the substrate.

According to an example aspect of the present invention, there is provided a bonding structure for forming at least one electrical connection between an optoelectronic component and a photonic substrate. The bonding structure comprises a pillar structure between the optoelectronic component and the photonic substrate, and a bonding layer comprising bonding material on the pillar structure. The pillar structure for at least one individual electrical connection comprises at least two portions and at least one gap between the portions for receiving extra bonding material of the bonding layer.

A method of fabricating integrated passive device dies includes forming a first plurality of integrated passive devices on a substrate, forming a plurality of micro-bumps on the first plurality of integrated passive devices such that the plurality of micro-bumps act as electrical connections to the integrated passive devices, and dicing the substrate to form an integrated passive device die including a second plurality of integrated passive devices. The micro-bumps may be formed in an array or staggered configuration and may have a pitch that is in a range from 20 microns to 100 microns. The integrated passive devices may each include a seal ring and the integrated passive device die may have an area that is a multiple of an integrated passive device area. The method may further include dicing the substrate in various ways to generate integrated passive device dies having different sizes and numbers of integrated passive devices.

A semiconductor package and a manufacturing method thereof are provided. The semiconductor package includes a first device die; a second device die, stacked on the first device die; and first electrical connectors and second electrical connectors, disposed in between the first and second device dies. A first pitch between the first electrical connectors is greater than a second pitch between the second electrical connectors. The first and second electrical connectors respectively comprise a solder joint and first metallic layers lying at opposite sides of the solder joint and formed of a first metallic material. Each of the second electrical connectors further comprises at least one second metallic layer formed of a second metallic material.

Microelectronic die package structures formed according to some embodiments may include a substrate and a die having a first side and a second side. The first side of the die is coupled to the substrate, and a die backside layer is on the second side of the die. The die backside layer includes a plurality of unfilled grooves in the die backside layer. Each of the unfilled grooves has an opening at a surface of the die backside layer, opposite the second side of the die, and extends at least partially through the die backside layer.