A first integrated circuit (IC) die and a second IC die are bonded together in a stacked arrangement in a device package. The second IC die includes at least one bonding structure that is bonded to the first IC die. A barrier layer on sidewalls of a top portion of the bonding structure is removed and replaced with a dielectric liner that is formed on the sidewalls after the bonding structure is formed. The dielectric liner has a material removal rate (e.g., for processes such as CMP, grinding, and/or chemical-based surface cleaning) that is closer to the material removal rate of the bonding structure than the material removal rate of the barrier liner. This reduces the likelihood of the formation of voids in the bond between the first IC die and the second IC die that might otherwise occur due to excessive material removal from the bonding structure.

A semiconductor package comprises: a first substrate; a first pad on a top surface of the first substrate; a first conductive pattern on a bottom surface of the first pad; and a semiconductor chip on the top surface of the first substrate, wherein the semiconductor chip comprises: a semiconductor substrate; an interconnection layer on a bottom surface of the semiconductor substrate, the interconnection layer comprising an interconnection pattern; and a bonding pad on a bottom surface of the interconnection pattern, wherein the bonding pad is directly bonded to the first pad, wherein a width of the interconnection pattern is larger than a width of the bonding pad, wherein a width of the first conductive pattern is smaller than a width of the first pad, and wherein the interconnection pattern and the bonding pad comprise different materials.

The semiconductor device may include a substrate, a first insulating layer on a bottom surface of the substrate, an interconnection structure in the first insulating layer, a second insulating layer on a bottom surface of the first insulating layer, and a plurality of lower pads provided in the second insulating layer. Each lower pad may be provided such that a width of a top surface thereof is smaller than a width of a bottom surface thereof. The lower pads may include first, second, and third lower pads. In a plan view, the first and third lower pads may be adjacent to center and edge portions of the substrate, respectively, and the second lower pad may be disposed therebetween. A width of a bottom surface of the second lower pad may be smaller than that of the first lower pad and may be larger than that of the third lower pad.