Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die, having a first surface and an opposing second surface with conductive contacts, in a first layer; a first material surrounding the first die and extending along a thickness of the first die from the second surface, and wherein the first material includes first particles having an average diameter between 200 and 500 nanometers; a second material surrounding the first die and extending along the thickness of the first die from the first surface, and wherein the second material includes second particles having an average diameter between 0.5 and 12 microns; an interface portion, between the first and second materials, including the first and second particles; and a second die, in a second layer on the first layer, electrically coupled to the conductive contacts on the first die.

An encapsulated integrated circuit includes an integrated circuit (IC) die. An encapsulation material encapsulates the IC die. Within the encapsulation material, a phononic bandgap structure is configured to have a phononic bandgap with a frequency range approximately equal to a range of frequencies of thermal phonons produced by the IC die when the IC die is operating.

A transistor device includes a semiconductor structure, a multi-layer passivation stack on the semiconductor structure, source and drain contacts on the semiconductor structure, and a gate on the semiconductor structure between the source and drain contacts. The multi-layer passivation stack includes a plurality of passivation layers having different electrical properties, and at least one opening extending through the passivation layers. The at least one opening exposes a surface of the semiconductor structure between the gate and the source or drain contact.

The present invention relates to a semiconductor device including: a semiconductor substrate having: an active region through which a main current flows; and a termination region around the active region; a polyimide film disposed in the active region and the termination region; and a passivation film disposed as a film underlying the polyimide film, wherein the termination region includes, in order from a side of the active region, a breakdown voltage holding region and an outermost peripheral region, the polyimide film is disposed except for a dicing remaining portion of the outermost peripheral region, and the passivation film is disposed, as the underlying film, at least in a region where the polyimide film is disposed.

A power chip package structure includes a power chip, a first transmission member, and at least two second transmission members, an encapsulant, and a diamond-like carbon (DLC) layer. The first transmission member and the at least two second transmission members are connected to the power chip. The power chip, the first transmission member, and the at least two second transmission members are embedded in the encapsulant. The encapsulant has a layout surface that is coplanar with a first end surface of the first transmission member and a second end surface of each of the at least two second transmission members. The DLC layer is formed on the layout surface with terminals. The DLC layer surrounds the first end surface to jointly form a first solder-receiving slot, and the DLC layer surrounds each of the two second end surfaces to jointly form a second solder-receiving slot.

A semiconductor device that can be embedded in a living body is provided. The semiconductor device being embeddable in a living body includes a communication portion, a control portion, a memory portion, an arithmetic portion, and a sensor portion. The control portion has a function of controlling the communication portion, the arithmetic portion, and the memory portion. The memory portion has a function of retaining identification information. The arithmetic portion has a function of using first information and second information supplied from the sensor portion to generate third information. The control portion has a function of making the arithmetic portion perform arithmetic processing in response to a signal input through the communication portion. The control portion has a function of outputting, through the communication portion to the outside, one or both of the identification information and the third information, in response to a signal input through the communication portion. The arithmetic portion preferably includes a transistor including an oxide semiconductor in a channel formation region. The semiconductor device is preferably covered with a coating material.

A method of producing a power semiconductor device includes: providing a semiconductor body with a front side having a substantially horizontal area above both an active region and an edge termination region of the semiconductor body; forming, at the front side, a first insulation layer above both the active region and the edge termination region; forming, at the first insulation layer, a first mask layer that covers the edge termination region at least partially and exposes the active region; removing a portion of the first insulation layer covering the active region; and while the first mask layer or a modified first mask layer or another mask layer covers the edge termination region, subjecting the edge termination region to a first implantation processing step to form, in the edge termination region, one or more doped semiconductor regions.

A method to form a first diamond composite wafer, a second diamond composite wafer or a third diamond composite wafer with a predetermined diameter includes the following steps: preparing a plurality of diamond blocks, wherein each diamond block has a dimension smaller than the predetermined diameter; attaching the plurality of diamond blocks to a first semiconductor substrate with the predetermined diameter to form a first temporary composite wafer, wherein a thermal conductivity of the first semiconductor substrate is smaller than that of the diamond block; and filling gaps among the plurality of diamond blocks of the first temporary composite wafer to form the first diamond composite wafer; or attaching the first diamond composite wafer to a second semiconductor substrate with the predetermined diameter to form the second diamond composite wafer, or removing the first semiconductor substrate from the first diamond composite wafer to form the third diamond composite wafer.

A method of forming a semiconductor structure is provided, and includes trimming a first substrate to form a recess on a sidewall of the first substrate. A conductive structure is formed in the first substrate. The method includes bonding the first substrate to a carrier. The method includes thinning down the first substrate. The method also includes forming a dielectric material in the recess and over a top surface of the thinned first substrate. The method further includes performing a planarization process to remove the dielectric material and expose the conductive structure over the top surface. In addition, the method includes removing the carrier from the first substrate.