Patent classifications
H10P72/3404
Cleaning module, storage system, and cleaning method for storage apparatus
Disclosed is a cleaning module for cleaning a storage apparatus. The cleaning module includes a housing that defines an inner space, a suction mechanism that is installed in the inner space and that forms an air flow introduced into the inner space, and an exhaust part that discharges the air flow introduced into the inner space by the suction mechanism to the outside of the housing.
CARRIER STORAGE APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND CARRIER TRANSFER METHOD
A carrier storage apparatus includes: a transfer mechanism; a first storage shelf group provided closer to a negative side of a first horizontal axis than the transfer mechanism, and including first storage shelves; a second storage shelf group provided closer to a positive side of the first horizontal axis than the transfer mechanism, and including second storage shelves; and a third storage shelf group provided closer to a positive or negative side of a second horizontal axis than the transfer mechanism, and including third storage shelves, wherein the second storage shelves are arranged in two or more columns along the second horizontal axis and in two or more stages along a vertical axis, wherein the third storage shelves are arranged in two or more stages along the vertical axis, and wherein the transfer mechanism is configured to transfer a carrier to the first to third storage shelves.
Article storage equipment in semiconductor fabrication facility and logistics system including same
Proposed are article storage equipment in a semiconductor fabrication facility, the article storage equipment being capable of power supply with a more simplified configuration, and a logistics system of a semiconductor fabrication facility including the same. Article storage equipment in a semiconductor fabrication facility according to one aspect includes a storage unit installed around a rail that provides a travel route of a transport vehicle and configured to store a transport container in which a wafer is accommodated, a purge unit configured to supply an inert gas into the transport container, a control unit configured to identify the transport container stored in the storage unit and control the purge unit to supply the inert gas into the transport container, and a power supply unit configured to supply a current induced from a power supply cable installed along the rail to the control unit.
Payload transportation system
System and method for cross-fab wafer transportation are provided. A method includes providing a first FAB building and a second FAB building connected via a bridging area, the second FAB building comprising fabrication tools configured to perform fabrication processes different than fabrication processes performed by fabrication tools in the first FAB building, after performing fabrication processes in the first FAB building, configuring a first vehicle of the first FAB building to travel along a first OHT track and take the wafer to the bridging area, configuring a second vehicle of the second FAB building to travel along a second OHT track and arrive at the bridging area, where a portion of the first OHT track is in parallel with a portion of the second OHT track at the bridging area, when some predetermined conditions are met, configuring the first vehicle to transfer the wafer to the second vehicle.
Remote optimization of purge flow rates in a container
Optimizing purge flow parameters in a substrate container, includes streaming a purge working fluid into an interior of the substrate container, discharging the purge working fluid from the interior of the substrate container, and varying purge flow parameters of the purge working fluid for a predetermined period of time, detecting at least one environmental condition in the interior of the substrate container during the predetermined period of time, determining optimized purge flow parameters based on the varied purge flow parameters and the at least one detected environmental condition during the predetermined period of time, and adjusting the streaming and the discharging in accordance with the optimized purge flow parameters. The substrate container may include, for example, a front opening unified pod or a reticle pod.
Working system for semiconductor packaging process and operation method thereof
A working system for a semiconductor packaging process includes a machine equipment, a supply unit and a return device. The supply unit is correspondingly connected to the machine equipment and includes an input device and an output device. The return device is connected to the input device and the output device. As such, a magazine is transferred from the input device to the output device via the return device, thereby accelerating the operation speed of a production line.
AUTOMATIC CARRIER SLOT SCANNING APPARATUS FOR GLASS SUBSTRATE SEMICONDUCTOR PACKAGE
An embodiment relates to an automatic carrier slot scanning apparatus for glass substrate semiconductor packages for automation of a glass substrate semiconductor package factory, and more particularly, to an automatic carrier slot scanning apparatus for glass substrate semiconductor packages configured to automatically scan positions and the number of glass substrates for slots of a carrier, compare the scanned information with related information of a manufacturing execution system, and thereby achieve synchronization.