A memory subsystem includes an I/O die, a host device, and a stacked memory structure. The I/O die includes a first surface and a second surface. The host device is stacked on the first surface of the I/O die to be at least partially bonded thereto. The stacked memory structure is stacked on the first surface of the I/O die to be at least partially bonded thereto. The I/O die includes a plurality of conductive pads arranged on the first surface. The stacked memory structure includes a plurality of memory dies stacked in a shingled manner so that a plurality of bonding pads is exposed, and a plurality of vertical wires respectively connecting the bonding pads of the plurality of memory dies to the plurality of conductive pads. The host device and the stacked memory structure is configured to interface with each other through the I/O die.

A method of manufacturing an integrated circuit (IC) structure includes forming an opening in a first dielectric material between a first gate structure and a second gate structure by removing a portion of the first dielectric material overlying a fin structure; filling at least part of the opening with a second dielectric material; and forming a contact overlying the fin structure and the second dielectric material.

A semiconductor device includes an insulator on a substrate and having opposite first and second sides that each extend along a first direction, a first fin pattern extending from a third side of the insulator along the first direction, a second fin pattern extending from a fourth side of the insulator along the first direction, and a first gate structure extending from the first side of the insulator along a second direction transverse to the first direction. The device further includes a second gate structure extending from the second side of the insulator along the second direction, a third fin pattern overlapped by the first gate structure, spaced apart from the first side of the insulator, and extending along the first direction, and a fourth fin pattern which overlaps the second gate structure, is spaced apart from the second side, and extends in the direction in which the second side extends. An upper surface of the insulator is higher than an upper surface of the first fin pattern and an upper surface of the second fin pattern.

A semiconductor device and a data storage system including the same are provided. The semiconductor device includes: a lower structure having a memory cell array area and an outer peripheral area outside the memory cell array area; and an upper structure on the lower structure. The upper structure includes: a pad including a first lower conductive pattern provided on the outer peripheral area and an upper conductive pattern on the first lower conductive pattern; and an inductor portion extending from the upper conductive pattern and overlapping the memory cell array area, and defining a spiral coil shape at a level farther from the lower structure than the first lower conductive pattern.