A substrate processing method includes: transferring, by a first transfer arm, a wafer lot including a plurality of substrates to a processing bath in which the plurality of substrates in the wafer lot are immersed and processed collectively; receiving, by a second transfer arm, the wafer lot from the first transfer arm, and immersing the wafer lot in an immersion bath in which the plurality of substrates in the wafer lot are immersed collectively; and transferring, by a third transfer arm, the plurality of substrates in the wafer lot to a delivery table one by one. The immersion bath is disposed outside a movement range of the first transfer arm such that the first transfer arm is operated independently from the third transfer arm.

A batch processing oven includes a processing chamber, a magnet, and a rack. The processing chamber includes a gas inlet on a first side and a gas outlet on a second side opposite the first side, the gas inlet is configured to direct a hot gas into the processing chamber and the gas outlet is configured to exhaust the convective energy in parallel with the radiative energy from the walls. The magnet is arranged such that its north pole will be formed on the first side of the processing chamber and its south pole will be formed on the second side of the processing chamber. The rack is configured to be positioned between the first and second ends of the processing chamber and is configured to support a plurality of vertically spaced-apart substrates.

A system for holding and transporting one or more workpieces is disclosed. The system includes a cassette that is configured to support a carrier and a workpiece at two different elevations. In this way, as the carrier with the workpiece is placed on the cassette by a first robot, the carrier moves down further, as the workpiece is supported by taller support posts. The end effector of a second robot may then later remove only the workpiece from the cassette for processing. The processed workpiece is later placed back in the cassette by the second robot. This processed workpiece is then removed, along with the carrier, by the first robot. Carriers may be created to accommodate different sized workpieces such that the cassette remains unchanged.

A substrate processing apparatus that performs processing on a substrate which is accommodated in a cassette and is to be transferred, includes: at least one transfer block configured to transfer the substrate in an interior of the at least one transfer block; at least one substrate processing module configured to perform the processing on the substrate; and a cassette transfer mechanism configured to transfer the cassette between a delivery position set on an outer surface of the substrate processing apparatus and a loading/unloading position at which the cassette is loaded into and unloaded from an interior of the substrate processing apparatus. The cassette transfer mechanism includes a stage on which the cassette is placed, and a moving mechanism configured to move the cassette placed on the stage.

Discussed is a self-assembly apparatus that can include a chamber, at least one first supply part configured to supply a fluid to the chamber, a mounting part disposed on a first side of the chamber to mount a substrate to be inclined with respect to a horizontal plane of the chamber, the substrate having an assembly surface, and a magnet module disposed on an opposite surface of the substrate opposite to the assembly surface of the substrate, wherein the mounting part is configured to: insert the substrate into an upper side of the chamber, guide the inserted substrate from the upper side of the chamber toward a lower side of the chamber, and fix the guided substrate to the lower side of the chamber.

There is provided a substrate processing apparatus in which throughput is improved by increasing the number of disposed single wafer type chambers while suppressing the size of the apparatus. According to the present invention, the single wafer type chambers can be stacked in a vertical direction, it is possible to provide a substrate processing apparatus in which more single wafer type chambers are mounted even in the same floor area as that of a conventional apparatus. Further, when a mechanism for carrying a substrate W into a single wafer type chamber (drying chamber) and a mechanism for carrying the substrate W out of the drying chamber are provided independently, the substrate can be smoothly transferred around the drying chamber. According to the present invention, it is possible to provide a substrate processing apparatus 1 having a small size and a high throughput.