Disclosed herein is an electronic component that includes a mounting surface having a terminal formation area and a plurality of terminal electrodes arranged in an array in the terminal formation area. The center point of the terminal formation area is offset with respect to the center point of the mounting surface. Thus, at mounting of the electronic component on a mounting substrate, a solder paste is supplied to a land pattern, and then the mounting is performed such that the center point of a mounting area and the center point of the mounting surface coincide with each other, whereby a predetermined displacement occurs between the planar positions of the land pattern and terminal electrode. This allows a void inside the solder to be released outside without involving a layout change of the land pattern.

A wafer stacking method and a wafer stack structure are disclosed. In the wafer stacking method, first and second wafer structures are formed and then stacked and bonded. Prior to the stacking and bonding of the first and second wafer structures, metal pad is pre-formed on one side of the first wafer structure. In this way, it is unnecessary to form the metal pad after the first and second wafer structures are stacked and bonded, avoiding wafer warpage distortion, which may occur in high-temperature treatment involved in the formation of the metal pad. Thus, the risks of layer and/or film fracture and alarming of processing equipment in subsequent processes are reduced, and more wafers are allowed to be stacked by wafer-level stacking. The wafer stack structure is obtainable according to the wafer stacking method.

A method for manufacturing a semiconductor device includes a step of preparing a semiconductor substrate that has a first main surface on one side and a second main surface on the other side, the semiconductor substrate on which a plurality of device forming regions and an intended cutting line that demarcates the plurality of device forming regions are set, a step of forming a first electrode that covers the first main surface in each of the device forming regions, a step of forming a second electrode that covers the second main surface, a step of partially removing the second electrode along the intended cutting line such that the semiconductor substrate is exposed, and forming a removed portion that extends along the intended cutting line, and a step of cutting the semiconductor substrate along the removed portion.

A method includes forming a first sealing layer at a first edge region of a first wafer; and bonding the first wafer to a second wafer to form a wafer stack. At a time after the bonding, the first sealing layer is between the first edge region of the first wafer and a second edge region of the second wafer, with the first edge region and the second edge region comprising bevels. An edge trimming process is then performed on the wafer stack. After the edge trimming process, the second edge region of the second wafer is at least partially removed, and a portion of the first sealing layer is left as a part of the wafer stack. An interconnect structure is formed as a part of the second wafer. The interconnect structure includes redistribution lines electrically connected to integrated circuit devices in the second wafer.

A semiconductor device has a semiconductor substrate and first insulating layer formed over the surface of the semiconductor substrate. A dummy via is formed through the first insulating layer. A second insulating layer is formed over the first insulating layer to fill the dummy via. A first conductive layer is formed over the second insulating layer. A bump is formed over the first conductive layer adjacent to the dummy via filled with the second insulating layer. A second conductive layer is formed over a surface of the semiconductor substrate. The dummy via filled with the second insulating layer relieves stress on the second conductive layer. A plurality of dummy vias filled with the second insulating layer can be formed within a designated via formation area. A plurality of dummy vias filled with the second insulating layer can be formed in a pattern.

A manufacturing method for a semiconductor device includes: obtaining a pre-processed semiconductor structure, wherein the pre-processed semiconductor structure comprises a metal layer (103) having a first exposed surface (1032), and the first exposed surface (1032) of the metal layer has a protrusion portion (1031); arranging a protective layer (104) on the first exposed surface (1032) of the metal layer, wherein the protective layer (104) at least covers part of the metal layer (103) that excludes the protrusion portion (1031); removing the protrusion portion (1031) to form on the metal layer (103) a second exposed surface (1033) of the metal layer (103); and forming a dielectric layer (105) on an area where the first exposed surface (1032) is located, wherein the dielectric layer (105) completely covers the area where the first exposed surface (1032) is located.

A display device includes a substrate including a display area and a pad area; a first conductive layer including a first pad electrode in the pad area; and a second conductive layer the second conductive layer includes a second pad electrode on the first pad electrode in the pad area; the first pad electrode and the second pad electrode overlap in a first direction that is a thickness direction, and do not overlap in a second direction perpendicular to the first direction.

The present disclosure provides a photosensitive composition that satisfies following condition () and contains a binder resin (A) and a photosensitizer (C) and a radically polymerizable compound (B) and/or a crosslinking agent (F), wherein the binder resin (A) contains the following resin (A1) and/or resin (A2). resin (A1): a resin that contains, in the structural units in the resin main chain, at least one selected from the group consisting of the imide structure, amide structure, oxazole structure, and siloxane structure; resin (A2): a resin having a phenolic hydroxyl group in the structural units in the resin main chain; and () a content of at least one selected from the group consisting of sulfonic acids, phosphate esters, phosphonic acid, phosphonate esters, phosphite esters, phosphinic acid, hypophosphite esters, and carboxylic acids containing the element fluorine, wherein the total of the content of these organic acids is in a prescribed range.

Semiconductor devices including one or more interfacing segments patterned within an outer protective layer and associated systems and methods are disclosed herein. The one or more interfacing segments may provide attachment interfaces/surfaces for connection pads. The one or more interfacing segments or a portion thereof may remain uncovered or exposed and provide warpage control for the corresponding semiconductor device.

A method for manufacturing a semiconductor package includes forming a first semiconductor chip having a first bonding surface, the first semiconductor chip including a first outermost insulating layer providing the first bonding surface, a first internal insulating layer on the first outermost insulating layer, a first external marks within the first outermost insulating layer, and a first internal mark within the first internal insulating layer. The first external marks include a first pattern having a first center portion and a second pattern having a first ring portion surrounding the first center portion when viewed in a plan view, the first internal mark is disposed between the first center portion and the first ring portion when viewed in the plan view, and the first external marks and the first internal mark together form a first alignment structure.