A 3D semiconductor device including: a first level including a first single crystal layer and first transistors, which each include a single crystal channel; a first metal layer with an overlaying second metal layer; a second level including second transistors, overlaying the first level; a third level including third transistors, overlaying the second level; a fourth level including fourth transistors, overlaying the third level, where the second level includes first memory cells, where each of the first memory cells includes at least one of the second transistors, where the fourth level includes second memory cells, where each of the second memory cells includes at least one of the fourth transistors, where the first level includes memory control circuits, where second memory cells include at least four memory arrays, each of the four memory arrays are independently controlled, and at least one of the second transistors includes a metal gate.

Bonded die structures and methods of fabricating bonded die structures including improved positioning of the dies used to form the structures. Improved positioning may be achieved by providing non-linear alignment features around the periphery of the dies that may facilitate accurate positioning of the dies with respect to one or more alignment marks on the target structures on which the dies are placed. The non-linear alignment features may include features formed in the peripheral edges of the dies, such as indent portions extending inwardly from the peripheral edges of the dies and/or outward bulge portions extending outwardly from the peripheral edges of the dies. Alternatively, or in addition, the non-linear alignment features may be features formed in a seal ring structure of the dies. The non-linear alignment features may improve the accuracy of the positioning of the dies relative to alignment mark(s) on the target structures using optical detection systems.

In an embodiment, a method includes: placing a wafer on an implanter platen, the wafer including alignment marks; measuring a position of the wafer by measuring positions of the alignment marks with one or more cameras; determining an angular displacement between the position of the wafer and a reference position of the wafer; and rotating the implanter platen by the angular displacement.

A method for fabricating an integrated circuit structure is provided. The method includes forming an epitaxial stack over a semiconductor substrate, wherein the epitaxial stack comprises a plurality of first epitaxial layers and a plurality of second epitaxial layers alternately arranged over the semiconductor substrate; patterning the epitaxial stack into a first fin and a second fin, wherein from a top view the first fin extends along a first direction, and the second fin has a first fin line extending along the first direction and a second fin line extending along a second direction different from the first direction; forming a first gate structure over a first portion of the first fin; etching a recess in a second portion of the first fin adjacent the first portion of the first fin; and forming a source/drain feature in the recess.

Embodiments provide a semiconductor device and a fabrication method. The fabrication method includes: providing a substrate including an alignment region and a connection region; forming a first conductive layer on the substrate; forming a spacer material layer group on the first conductive layer; forming a protective layer on the spacer material layer group, the protective layer being positioned on the alignment region; etching the spacer material layer group and the protective layer, an etching rate of the protective layer being less than an etching rate of the spacer material layer group to remove the spacer material layer group on the connection region to form a spacer layer group, and forming an alignment groove on the spacer layer group in the alignment region; and forming a second conductive layer group on the spacer layer group and the first conductive layer, the second conductive layer group covering the alignment groove.

A wafer map generation device includes a dimension reducer and a map generator. The dimension reducer is configured to receive a plurality of polarization matrices associated with a plurality of target positions of a target wafer substrate and to generate a plurality of reduction result data through dimension reduction of one or more elements of each of the plurality of polarization matrices. The map generator is configured to generate a wafer map associated with the target wafer substrate based on the plurality of reduction result data.

A semiconductor device including: a first level including a plurality of first metal layers; a second level overlaying the first level, where the second level includes at least one single-crystal silicon layer and a plurality of transistors, where each of the plurality of transistors includes a single-crystal channel, where the second level includes a plurality of second metal layers which includes interconnections between the plurality of transistors, the second level is overlaid by an isolation layer; a connective path from the plurality of transistors to the plurality of first metal layers, where at least one of the plurality of transistors includes a second single-crystal channel overlaying a first single-crystal channel, where each of at least one of the plurality of transistors includes at least a two sided gate, where the first single-crystal channel is self-aligned to the second single-crystal channel being processed following a same lithography step.

A method to process a semiconductor device: processing the substrate forming a first level with a first single-crystal silicon-layer, first transistors, input-and-output (IO) circuits; forming a first metal-layer; forming a second metal-layer including a power-delivery network, where interconnection of the first transistors includes the first metal-layer and the second metal-layer; processing a second level including second transistors with metal gates and a first array of memory-cells; processing a third level including a plurality of third transistors with metal gates and a second array of memory-cells; third level disposed over the second level; forming a fourth metal-layer over a third metal-layer over the third-level; processing a fourth level including a second single-crystal silicon-layer, fourth level is disposed over the fourth metal-layer; forming a via disposed through the second and third levels, connections of the device to external devices includes the IO-circuits; the second level is disposed over the first level.