A vibration absorbing apparatus for semiconductor manufacturing apparatus including: a base plate configured to be secured to a semiconductor manufacturing apparatus; a first vibration absorber including a first elastic body fastened to the base plate and a first mass body fastened to the first elastic body; and a second vibration absorber including a second elastic body fastened to the base plate and a second mass body fastened to the second elastic body, wherein the second elastic body is adjacent to the first elastic body, wherein the first mass body and the second mass body are configured to reduce vibration at specific frequencies transmitted to the base plate by colliding with each other.

Provided is a system including a microwave source configured to generate microwaves, a branch apparatus including an input port connected to the microwave source, first and second chambers configured to process a wafer by using the microwaves, a first filter configured to transfer the microwaves to or cut off the microwaves from the first chamber, and connected to a first output port of the branch apparatus, and a second filter configured to transfer the microwaves to or cut off the microwaves from the second chamber, and connected to a second output port of the branch apparatus.

A wet-processing dark laboratory for scientific research includes a laboratory body, a wet-processing equipment, a transfer robot, a sample supplying and storing apparatus, a chemical supplying and storing apparatus, and a control apparatus. The laboratory body is configured to provide a clean space. The transfer robot includes a moving device, a mechanical arm device, at least one end effector, and an accompanying device. The accompanying device can move with the moving device and provide a temporary storage space. The mechanical arm device is mounted on the moving device. The at least one end effector is mounted on the mechanical arm device for grasping a semiconductor sample and/or a chemical tank. The above design enables 24/7 experiments conduction without the need for human presence, which forms a dark laboratory.

Exemplary substrate processing systems may include a plurality of processing regions. The systems may include a transfer region housing defining a transfer region fluidly coupled with the plurality of processing regions. The systems may include a plurality of substrate supports, and each substrate support of the plurality of substrate supports may be vertically translatable between the transfer region and an associated processing region of the plurality of processing regions. The systems may include a transfer apparatus including a rotatable shaft extending through the transfer region housing. The transfer apparatus may include an end effector coupled with the rotatable shaft. The end effector may include a central hub defining a central aperture fluidly coupled with a purge source. The end effector may also include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports.