Provided are an inkjet printing device, a method for aligning a bipolar element, and a method for manufacturing a display device. The inkjet printing device is for ejecting ink and includes a bipolar element extending in one direction. The inkjet printing device comprises: an electric field generation unit which includes a stage and a probe unit for generating an electric field on the stage; and an inkjet head which is positioned above the stage and includes a plurality of nozzles through which the ink is ejected, wherein the nozzles includes an inlet having a first diameter and an outlet connected to the inlet and having a second diameter smaller than the first diameter.

Provided are an inkjet printing device, a method for aligning a bipolar element, and a method for manufacturing a display device. The inkjet printing device is for ejecting ink and includes a bipolar element extending in one direction. The inkjet printing device comprises: an electric field generation unit which includes a stage and a probe unit for generating an electric field on the stage; and an inkjet head which is positioned above the stage and includes a plurality of nozzles through which the ink is ejected, wherein the nozzles includes an inlet having a first diameter and an outlet connected to the inlet and having a second diameter smaller than the first diameter.

An electrospray printing system that produces conformal films includes a printhead. A housing of the printhead includes a solution reservoir operable to receive a solution that includes a print material suspended in a solvent. An electrical potential is applied to the solution to produce an electrically charged solution that is emitted from the solution reservoir towards a target substrate. Electrostatic focusing is used to guide the print material to the target substrate.

An electrospray printing system that produces conformal films includes a printhead. A housing of the printhead includes a solution reservoir operable to receive a solution that includes a print material suspended in a solvent. An electrical potential is applied to the solution to produce an electrically charged solution that is emitted from the solution reservoir towards a target substrate. Electrostatic focusing is used to guide the print material to the target substrate.

Apparatuses, systems and methods are provided for electrohydrodynamic material deposition. An associated electro-hydrodynamic material deposition printer head may include a material delivery nozzle configured to deliver at least one material in a first direction relative to a substrate, and an electric field generator configured to control a direction of an electric field proximate the material being directed to redirect at least a portion of the at least one material in a second direction relative to the substrate, wherein the second direction is different that the first direction.

An element substrate, comprises: a plurality of printing elements configured to discharge liquid; a plurality of first driving elements disposed in correspondence with the plurality of printing elements and configured to drive the plurality of printing elements; a plurality of heating elements configured to heat the element substrate; a plurality of second driving elements disposed in correspondence with the plurality of heating elements and configured to drive the plurality of heating elements; and a delay unit that delays timing of driving the plurality of second driving elements to drive the plurality of second driving elements at a predetermined time difference when driving the plurality of second driving elements simultaneously.

An element substrate, comprises: a plurality of printing elements configured to discharge liquid; a plurality of first driving elements disposed in correspondence with the plurality of printing elements and configured to drive the plurality of printing elements; a plurality of heating elements configured to heat the element substrate; a plurality of second driving elements disposed in correspondence with the plurality of heating elements and configured to drive the plurality of heating elements; and a delay unit that delays timing of driving the plurality of second driving elements to drive the plurality of second driving elements at a predetermined time difference when driving the plurality of second driving elements simultaneously.

A processing target reforming apparatus includes: a conveying unit that conveys a processing target along a conveyance path; a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes; and a control unit that controls the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode.

A processing target reforming apparatus includes: a conveying unit that conveys a processing target along a conveyance path; a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes; and a control unit that controls the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode.

A system may include a controller configured to cause a capacitance probe to subject a material to a first electric signal having a first frequency and determine a first capacitance of the material at the first frequency. The controller is configured to cause the capacitance probe to subject the material to a second electric signal at a second frequency and determine a second capacitance of the material at the second frequency. The material includes at least a first constituent phase and a second constituent phase. The first constituent phase and the second constituent phase have substantially similar dielectric constants at the first frequency and substantially different dielectric constants at the second frequency. The controller is further configured to determine a porosity of the material based on the first capacitance and determine a relative phase composition of the first constituent phase and the second constituent phase based on the second capacitance.