Patent classifications
B41J2/14032
LIQUID EJECTION HEAD, LIQUID EJECTION APPARATUS, AND TEMPERATURE CONTROL METHOD FOR LIQUID EJECTION HEAD
In order to keep possible local temperature differences in a liquid ejection head small to allow stable liquid ejection performance to be achieved, temperatures in a plurality of heating areas in a liquid ejection head are discretely controlled using heating elements and temperature detection elements.
PRINT ELEMENT SUBSTRATE AND LIQUID EJECTION HEAD
Provided is an inkjet print head capable of favorably cleaning an ejection port surface and also of improving landing accuracy of ejected ink onto a print medium. For that purpose, a conductive layer formed of a conductive material is formed on a support substrate, flattening processing is executed, and a liquid ejection substrate is mounted on the support substrate with good positional accuracy without protrusion of a sealant for protecting an electric connection portion of the liquid ejection substrate from the ejection port surface.
Liquid ejection head unit, liquid ejection apparatus, and liquid ejection state determination method of liquid ejection apparatus
A liquid ejection head unit includes a first energy generating element that generates energy that applies pressure to a liquid in the first pressure chamber; a second energy generating element that generates energy that applies pressure to a liquid in the second pressure chamber; a nozzle flow path which communicates the first pressure chamber and the second pressure chamber and in which a nozzle that ejects a liquid is provided; a drive circuit that drives the first energy generating element and the second energy generating element by applying a drive pulse; a detection circuit that detects a parameter related to a physical property of a liquid in the second pressure chamber; wherein a controller drives the first energy generating element by the drive circuit, and performs a first detection operation of detecting the parameter in the second pressure chamber by the detection circuit.
WEAR RESISTANT COATING
A wear resistant coating may comprise an amorphous metal comprising at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and a metalloid. An amorphous metal may comprise at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and a metalloid. A coating may comprise at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and silicon. In some examples, the amorphous metal is TaWSi. In one example, the refractory metals may comprise Niobium, Molybdenum, Tantalum, Tungsten, Rhenium, or combinations thereof.
LIQUID JETTING APPARATUS AND METHOD OF PRODUCING LIQUID JETTING APPARATUS
There is provided a liquid jetting apparatus, including: a first pressure chamber and a second pressure chamber arranged in a first direction; a first insulating film covering the first and second pressure chambers; a first piezoelectric element arranged to face the first pressure chamber with the first insulating film being intervened therebetween; a second piezoelectric element arranged to face the second pressure chamber with the first insulating film being intervened therebetween; a trace arranged between the first and the second piezoelectric elements adjacent to each other in the first direction; and a second insulating film covering the trace. An end, in the first direction, of a part of the second insulating film covering the trace between the first piezoelectric element and the second piezoelectric element is positioned inside an end of a partition wall partitioning the first pressure chamber and the second pressure chamber.
LIQUID EJECTING HEAD AND LIQUID EJECTING APPARATUS
A flow path forming substrate has a pressure generation chamber communicating with a nozzle opening; and a communication plate having a supply path communicating with a manifold common to and communicating with the pressure generation chamber. A recess of the manifold opens opposite to the flow path forming substrate. The recess has a first recess, and a second recess deeper than the first recess. Supply paths are open on a bottom surface of the first recess, and are arranged in a first direction between the first and second recesses. An inclined surface inclined toward the bottom surface of the second recess from the bottom surface of the first recess is provided along the first direction. The inclined surface is configured as alternately repeated first and second inclined surfaces with different angles. A pitch of adjacent second inclined surfaces is smaller than a pitch of adjacent supply paths.
LIQUID EJECTING HEAD AND LIQUID EJECTING APPARATUS
A liquid ejecting apparatus may include a flow path forming substrate in which a pressure generation chamber which communicates with a nozzle opening that discharges liquid is formed and a communication plate which has a supply path that communicates with a manifold. A recess portion which configures at least a part of the manifold is open on a side opposite to the flow path forming substrate, on the communication plate. The supply path includes a discharge supply path which communicates with a discharge pressure generation chamber that discharges liquid from the nozzle opening, and a dummy supply path which communicates with a dummy pressure generation chamber that does not discharge liquid from the nozzle opening.
METHOD FOR PROCESSING SILICON SUBSTRATE AND METHOD FOR MANUFACTURING LIQUID EJECTION HEAD
A method for processing a silicon substrate includes forming a structure having a bottom surface and a depth of 200 μm or more or 300 μm or more from a first surface of a silicon substrate, forming a protective film on an inner wall of the structure, and performing plasma etching so as to selectively remove the protective film disposed on the bottom surface of the structure with respect to the protective film disposed on the substantially perpendicular side wall of the structure, wherein the plasma etching is performed under the condition in which plasma with a sheath length at least 10 times the depth when the depth is 200 μm or more, or at least 5 time the depth when the depth is 300 μm or more, is generated and a mean free path of ions generated in the plasma is longer than the sheath length.
Printhead dies molded with nozzle health sensor
In an implementation, a printhead includes a printhead die molded into a molding. The die has a front surface exposed outside the molding to dispense fluid drops through nozzles and an opposing back surface covered by the molding except at a channel in the molding through which fluid may pass directly to the back surface. The die also has a nozzle health sensor molded into the molding to detect defective nozzles in the printhead die.
Liquid Ejection Head
In a liquid ejection head, an ejection pressure is applied to a pressure chamber for liquid ejection from a nozzle. A descender extends in a first direction and includes a first end connected to the pressure chamber and a second end. A communication passage is connected to the second end, extends in a second direction crossing the first direction, and has a first dimension in the first direction. The nozzle is positioned at the communication passage such that a shortest distance between an outer periphery thereof and a center of the second end is greater than 0.5 times a second dimension of the second end in the second direction. When viewed in the first direction, the center of the second end and a center of a cross-section defined by the nozzle to be orthogonal to an extending direction of the nozzle intersect an axis of the communication passage.