An object of the present invention is to provide a deuterium recovery method and deuterium recovery equipment that can recover and reuse deuterium or deuterium compounds used in semiconductor manufacturing processes. The present invention provides a deuterium recovery method including: generating heavy water in an exhaust gas containing deuterium gas in a semiconductor manufacturing process.

The device is designed for production of light, highly pure water with a high content of light molecules .sup.1H.sub.2 .sup.16O.

The technical results are productivity increasIIITII of the device and a reduction in energy costs per unit of the finished product.

The device is equipped with a heat pump, the distillation column consists of two coaxial tubes of diameter D1 and D2 with a layer of random packing located in the gap between them, where (D1D2)/2<300 mm, and the liquid distributor at the top of the column has at least 800 irrigation points per square meter of the cross-sectional area of the packing part of the column.

The present invention relates to a method of altering the relative proportions of protons, deuterons and tritons in a sample using a membrane. The membrane comprises a 2D material and an ionomer. The invention also relates to a method of making said membranes.

A method of activating and dewatering sludge through application of acoustic pressure shock waves to wastewater.

A method of activating and dewatering sludge through application of acoustic pressure shock waves to wastewater.

An electrochemical hydrogen isotope recycling apparatus for recycling an isotope of hydrogen includes an electrochemical recycling unit, the unit comprising: an anode; a cathode; and an isotope-treated, proton exchange membrane operatively disposed between the anode and cathode, the isotope-treated, proton exchange membrane having heavy water containing the isotope of hydrogen therein, the device configured to receive a feedstream containing the isotope of hydrogen. A process by which high purity hydrogen isotope products are produced using an electrochemical membrane process in which all conventional water containing components are pre-processed using a heavy water containing the isotope of hydrogen.

An industrial apparatus 10 and/or method, such as an electrochemical hydrogen isotope recycling apparatus and/or method, includes an apparatus 49 and/or process by which gaseous D.sub.2 is recovered in a reactor 3 from a gas stream via a reaction in the reactor with another molecule to form a useful chemical compound containing D.

A method of treating fluids, including for recovery of water apart from impurities or undesired matter, utilizes application of shock waves to the fluids.

A system, apparatus and process for separating a tritiated heavy water stream into a tritium-lean heavy water stream and a tritium-enriched heavy water stream. Tritiated heavy water (DTO/D2O) is fed to a mid-point of an isotope exchange column. The column contains a hydrophobic solid catalyst to promote exchange of deuterium and tritium. DT/D2 gas flows out of an electrolysis cell and into the first end of the column, concentrating tritium content in the heavy water by counter current flow to produce a tritium-rich heavy water below the feed point and a tritium-lean deuterium gas above. Tritium-rich heavy water flows out the first end of the column and into the electrolysis cell, forming DT/D2 gas and a tritium-enriched heavy water stream. Tritium-lean deuterium gas flows out the second end of the column and into a tritium-lean heavy water unit. Either O2 gas or light water additionally flows into the tritium-lean heavy water unit to form a tritium-lean heavy water.

In one embodiment, a semiconductor manufacturing apparatus includes a substrate processor configured to process a substrate with a gas of a first substance and a gas of a second substance, and discharge a first gas including the first substance and/or the second substance. The apparatus further includes a disposer configured to discard the first gas discharged from the substrate processor. The apparatus further includes a recoverer configured to generate a second gas including the second substance by using the first substance in the first gas discharged from the substrate processor, and supply the second gas to the substrate processor.

In one embodiment, a semiconductor manufacturing apparatus includes a substrate processor configured to process a substrate with a gas of a first substance and a gas of a second substance, and discharge a first gas including the first substance and/or the second substance. The apparatus further includes a disposer configured to discard the first gas discharged from the substrate processor. The apparatus further includes a recoverer configured to generate a second gas including the second substance by using the first substance in the first gas discharged from the substrate processor, and supply the second gas to the substrate processor.