C01B15/01

Methods using ionic liquids for decomposing peroxides

The present invention relates to a method for generating oxygen, comprising providing at least one oxygen source, providing at least one ionic liquid, the ionic liquid comprising a cation and an anion, wherein the oxygen source is a hydrogen peroxide adduct compound which is at least partially soluble in the ionic liquid, the ionic liquid is in the liquid state at least in a temperature range from 10 C. to +50 C., and the anion is selected from metallate anions, and contacting the oxygen source and the ionic liquid.

Electrochemical reactor and process
10577698 · 2020-03-03 · ·

The electrochemical reactors disclosed herein provide novel oxidation and reduction chemistries and employ increased mass transport rates of materials to and from the surfaces of electrodes therein.

Electrochemical reactor and process
10577698 · 2020-03-03 · ·

The electrochemical reactors disclosed herein provide novel oxidation and reduction chemistries and employ increased mass transport rates of materials to and from the surfaces of electrodes therein.

PRODUCTION OF CHEMICAL PRODUCTS USING ELECTROCHEMICAL FLOW SYSTEMS AND MEDIATORS AND ASSOCIATED METHODS

Systems and methods for electrochemically producing chemical products are provided. In certain cases, the systems and methods described herein are capable of producing chemical products such as hydrogen peroxide in solutions with relatively low concentrations of electrolyte or other dissolved species at high efficiencies and/or low energetic cost. In some cases, redox mediators are used to spatially decouple direct electrochemical processes from the production of the chemical product.

Method for generating oxygen from compositions comprising ionic liquids

The present invention is directed to a method for generating oxygen comprising providing at least one oxygen source, providing at least one ionic liquid, providing at least one metal oxide compound, wherein the oxygen source is a peroxide compound, the ionic liquid is in the liquid state at least in the temperature range from 10 C. to +50 C., and the metal oxide compound is an oxide of one single metal or of two or more different metals, said metal(s) being selected from the metals of groups 2 to 14 of the periodic table of the elements, and contacting the oxygen source, the ionic liquid, and the metal oxide compound.

Method for generating oxygen from compositions comprising ionic liquids

The present invention is directed to a method for generating oxygen comprising providing at least one oxygen source, providing at least one ionic liquid, providing at least one metal oxide compound, wherein the oxygen source is a peroxide compound, the ionic liquid is in the liquid state at least in the temperature range from 10 C. to +50 C., and the metal oxide compound is an oxide of one single metal or of two or more different metals, said metal(s) being selected from the metals of groups 2 to 14 of the periodic table of the elements, and contacting the oxygen source, the ionic liquid, and the metal oxide compound.

PREVENTION OF DISEASES IN HONEYBEES AND REDUCTION OF PESTICIDE RESIDUES IN BEESWAX
20200000069 · 2020-01-02 ·

A beeswax and/or beehive or bee keeping equipment surface is treated with a composition containing at least one solvent, at least one surfactant and at least one oxidizing agent (e.g., peroxide), optionally also containing other components such as an oxidizing agent activator, a viscosifying agent, an enzyme and/or a pH control agent, to reduce the amount of pesticide residues on the beeswax surface and/or disinfect against any bacterial, viruses, and fungi infestation.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus includes a polisher configured to polish a substrate using a polishing liquid, a first cleaner configured to clean the substrate polished by the polisher using sulfuric acid and hydrogen peroxide water, a second cleaner configured to clean the substrate cleaned by the first cleaner using a basic chemical liquid and hydrogen peroxide water, and a drier configured to dry the substrate cleaned by the second cleaner.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus includes a polisher configured to polish a substrate using a polishing liquid, a first cleaner configured to clean the substrate polished by the polisher using sulfuric acid and hydrogen peroxide water, a second cleaner configured to clean the substrate cleaned by the first cleaner using a basic chemical liquid and hydrogen peroxide water, and a drier configured to dry the substrate cleaned by the second cleaner.