A method of manufacturing a diamond by a vapor phase synthesis method includes: preparing a substrate including a diamond seed crystal; forming a light absorbing layer lower in optical transparency than the substrate by performing ion implantation into the substrate, the light absorbing layer being formed at a predetermined depth from a main surface of the substrate; growing a diamond layer on the main surface of the substrate by the vapor phase synthesis method; and separating the diamond layer from the substrate by applying light from a main surface of at least one of the diamond layer and the substrate to allow the light absorbing layer to absorb the light and cause the light absorbing layer to be broken up.

A method of manufacturing a diamond by a vapor phase synthesis method includes: preparing a substrate including a diamond seed crystal; forming a light absorbing layer lower in optical transparency than the substrate by performing ion implantation into the substrate, the light absorbing layer being formed at a predetermined depth from a main surface of the substrate; growing a diamond layer on the main surface of the substrate by the vapor phase synthesis method; and separating the diamond layer from the substrate by applying light from a main surface of at least one of the diamond layer and the substrate to allow the light absorbing layer to absorb the light and cause the light absorbing layer to be broken up.

One variation of a method includes: ingesting an air sample captured during an air capture period at a target location for collection of a first mixture including carbon dioxide and a first concentration of impurities; conveying the first mixture through a liquefaction unit to generate a second mixture including carbon dioxide and a second concentration of impurities less than the first concentration of impurities; in a methanation reactor, mixing the second mixture with hydrogen to generate a first hydrocarbon mixture comprising a third concentration of impurities comprising nitrogen, carbon dioxide, and hydrogen; conveying the first hydrocarbon mixture through a separation unit configured to remove impurities from the first hydrocarbon mixture to generate a second hydrocarbon a fourth concentration of impurities less than the third concentration of impurities; and depositing the second hydrocarbon mixture in a diamond reactor containing a set of diamond seeds to generate a first set of diamonds.

One variation of a method includes: ingesting an air sample captured during an air capture period at a target location for collection of a first mixture including carbon dioxide and a first concentration of impurities; conveying the first mixture through a liquefaction unit to generate a second mixture including carbon dioxide and a second concentration of impurities less than the first concentration of impurities; in a methanation reactor, mixing the second mixture with hydrogen to generate a first hydrocarbon mixture comprising a third concentration of impurities comprising nitrogen, carbon dioxide, and hydrogen; conveying the first hydrocarbon mixture through a separation unit configured to remove impurities from the first hydrocarbon mixture to generate a second hydrocarbon a fourth concentration of impurities less than the third concentration of impurities; and depositing the second hydrocarbon mixture in a diamond reactor containing a set of diamond seeds to generate a first set of diamonds.

A method of manufacturing a diamond substrate includes: forming an ion implantation layer at a side of a main surface of a diamond seed substrate by implanting ions into the main surface of the diamond seed substrate; producing a diamond structure by growing a diamond growth layer by a vapor phase synthesis method on the main surface of the diamond seed substrate, after implanting the ions; and performing heat treatment on the diamond structure. The performed heat treatment causes the diamond structure to be separated along the ion implantation layer into a first structure including the diamond seed substrate and failing to include the diamond growth layer, and a diamond substrate including the diamond growth layer. Thus, the method of manufacturing a diamond substrate is provided that enables a diamond substrate with a large area to be manufactured in a short time and at a low cost.

A method of manufacturing a diamond substrate includes: forming an ion implantation layer at a side of a main surface of a diamond seed substrate by implanting ions into the main surface of the diamond seed substrate; producing a diamond structure by growing a diamond growth layer by a vapor phase synthesis method on the main surface of the diamond seed substrate, after implanting the ions; and performing heat treatment on the diamond structure. The performed heat treatment causes the diamond structure to be separated along the ion implantation layer into a first structure including the diamond seed substrate and failing to include the diamond growth layer, and a diamond substrate including the diamond growth layer. Thus, the method of manufacturing a diamond substrate is provided that enables a diamond substrate with a large area to be manufactured in a short time and at a low cost.

An electrode comprising synthetic high-pressure high-temperature diamond material, the diamond material comprising a substitutional boron concentration of between 1×10.sup.20 and 5×10.sup.21 atoms/cm.sup.3 and a nitrogen concentration of no more than 10.sup.19 atoms/cm.sup.3. The electrode has a ΔE.sub.3/4-1/4 as measured with respect to a saturated calomel reference electrode in an aqueous solution containing 0.1 M KNO.sub.3 and 1 mM of Ru(NH.sub.3).sub.6.sup.3+ selected any of less than 70 mV, less than 68 mV, less than 66 mV, and less than 64 mV, and/or a peak to peak separation ΔE.sub.p as measured with respect to a saturated calomel reference electrode in an aqueous solution containing 0.1 M KNO.sub.3 and 1 mM of Ru(NH.sub.3).sub.6.sup.3+ selected any of less than 70 mV, less than 68 mV, less than 66 mV, and less than 64 mV.

Nanostructured carbide chemical compound is used to convert carbide to carbon. A method comprising: providing at least one carbide chemical compound and reducing a metal cation with use of the carbide chemical compound to form elemental carbon, wherein the carbide chemical compound is nanostructured. The nanostructured carbide chemical compound can be in the form of a nanoparticle, a nanowire, a nanotube, a nanofilm, a nanoline. The reactant can be a metal salt. Electrochemical reaction, or reaction in the melt or in solution, can be used to form the carbon. The nanostructured carbide chemical compound can be an electrode.

Nanostructured carbide chemical compound is used to convert carbide to carbon. A method comprising: providing at least one carbide chemical compound and reducing a metal cation with use of the carbide chemical compound to form elemental carbon, wherein the carbide chemical compound is nanostructured. The nanostructured carbide chemical compound can be in the form of a nanoparticle, a nanowire, a nanotube, a nanofilm, a nanoline. The reactant can be a metal salt. Electrochemical reaction, or reaction in the melt or in solution, can be used to form the carbon. The nanostructured carbide chemical compound can be an electrode.

Apparatuses and methods to manufacture integrated circuits are described. A method of forming film on a substrate is described. The film is formed on a substrate by exposing a substrate to a diamond-like carbon precursor having an sp.sup.3 content of greater than 40 percent. Methods of etching a substrate are described. Electronic devices comprising a diamond-like carbon film are also described.