C01B33/04

METHOD FOR PRODUCING OLIGOSILANE

An object of the present invention is to provide an oligosilane production method with which a target oligosilane can be selectively produced. Oligosilanes can be efficiently produced at an improved selectivity for a target oligosilane by using, as a raw material, not only monosilane but also an oligosilane with a smaller number of silicon atoms than the target oligosilane or conversely an oligosilane with a larger number of silicon atoms than the target oligosilane.

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Column and process for disproportionation of chlorosilanes into monosilane and tetrachlorosilane and plant for production of monosilane

A column includes a column head, a column sump and a tube-shaped column shell disposed therebetween, two or more reaction zones lying above each other which each accommodate a catalyst bed, in which catalyst beds chlorosilanes disproportionate into low-boiling silanes, which form an ascending stream of gas, and also into high-boiling silanes which form a downwardly directed stream of liquid, within the column shell and along the column axis, two or more rectificative separation zones, the reaction zones and the separation zones alternate along the column axis, the separation zones are configured such that the stream of gas and the stream of liquid meet in the separation zones, and the reaction zones are configured such that the downwardly directed stream of liquid is led through the catalyst beds, whereas the upwardly directed stream of gas passes the catalyst beds in spatial separation from the stream of liquid.

Doped hydridosilane compositions, and method for producing same

The present invention relates to compositions comprising at least one hydridosilane of the generic formula Si.sub.nH.sub.m with n5 and m=(2n) and (2n+2) and at least one compound of the formula H.sub.nB (OR).sub.3n with R=C.sub.1-C.sub.10-alkyl, C.sub.6-C.sub.10-aryl, C.sub.7-C.sub.14-aralkyl, halogen, n=0, 1, 2, to processes for preparation thereof and use thereof.

Doped hydridosilane compositions, and method for producing same

The present invention relates to compositions comprising at least one hydridosilane of the generic formula Si.sub.nH.sub.m with n5 and m=(2n) and (2n+2) and at least one compound of the formula H.sub.nB (OR).sub.3n with R=C.sub.1-C.sub.10-alkyl, C.sub.6-C.sub.10-aryl, C.sub.7-C.sub.14-aralkyl, halogen, n=0, 1, 2, to processes for preparation thereof and use thereof.

HYDROGENATED SILANE COMPOSITION

At least one embodiment of the present disclosure provides a hydrogenated silane composition containing a cyclic hydrogenated silane having high storage stability.

The at least one embodiment of the present disclosure relates to a hydrogenated silane composition, wherein a content ratio of a linear hydrogenated silane having Si atoms of 5 or less to a cyclic hydrogenated silane having Si atoms of 5 to 7 is 0.009 or less, wherein the cyclic hydrogenated silane comprises at least cyclohexasilane, and further comprises at least one cyclic hydrogenated silane having a branched silyl group selected from silylcyclopentasilane and silylcyclohexasilane, and wherein a content ratio of a total of the silylcyclopentasilane and the silylcyclohexasilane to the cyclic hydrogenated silane having Si atoms of 5 to 7 is 10 ppb or more on a mass basis.

HYDROGENATED SILANE COMPOSITION

At least one embodiment of the present disclosure provides a hydrogenated silane composition containing a cyclic hydrogenated silane having high storage stability.

The at least one embodiment of the present disclosure relates to a hydrogenated silane composition, wherein a content ratio of a linear hydrogenated silane having Si atoms of 5 or less to a cyclic hydrogenated silane having Si atoms of 5 to 7 is 0.009 or less, wherein the cyclic hydrogenated silane comprises at least cyclohexasilane, and further comprises at least one cyclic hydrogenated silane having a branched silyl group selected from silylcyclopentasilane and silylcyclohexasilane, and wherein a content ratio of a total of the silylcyclopentasilane and the silylcyclohexasilane to the cyclic hydrogenated silane having Si atoms of 5 to 7 is 10 ppb or more on a mass basis.

HYDROGENATED SILANE COMPOSITION
20190135641 · 2019-05-09 · ·

At least one embodiment of the present disclosure provides a hydrogenated silane composition containing cyclohexasilane of a cyclic hydrogenated silane having high storage stability.

The at least one embodiment of the present disclosure relates to a hydrogenated silane composition, wherein a content ratio of normal hexasilane and silylcyclopentasilane to cyclohexasilane is 0.0020 or less on a mass basis.

HYDROGENATED SILANE COMPOSITION
20190135641 · 2019-05-09 · ·

At least one embodiment of the present disclosure provides a hydrogenated silane composition containing cyclohexasilane of a cyclic hydrogenated silane having high storage stability.

The at least one embodiment of the present disclosure relates to a hydrogenated silane composition, wherein a content ratio of normal hexasilane and silylcyclopentasilane to cyclohexasilane is 0.0020 or less on a mass basis.

TARGETED PRODUCTION OF 2,2,3,3-TETRASILYL TETRASILANE

The present invention provides the octasilane 2,2,3,3-tetrasilyltetrasilane 1, compositions comprising one or more additional constituents that are not 1 as well as 2,2,3,3-tetrasilyltetrasilane 1, processes for preparing 2,2,3,3-tetrasilyltetrasilane 1 and mixtures of higher hydridosilanes that include 1. The present invention further provides for the use of 1 and mixtures of higher hydridosilanes including 1 for deposition of silicon-containing material.

TARGETED PRODUCTION OF 2,2,3,3-TETRASILYL TETRASILANE

The present invention provides the octasilane 2,2,3,3-tetrasilyltetrasilane 1, compositions comprising one or more additional constituents that are not 1 as well as 2,2,3,3-tetrasilyltetrasilane 1, processes for preparing 2,2,3,3-tetrasilyltetrasilane 1 and mixtures of higher hydridosilanes that include 1. The present invention further provides for the use of 1 and mixtures of higher hydridosilanes including 1 for deposition of silicon-containing material.