A silicon ⋅ silicon oxide-carbon complex has a core-shell structure in which the core comprises silicon particles, a silicon oxide compound represented by SiOx (0<×2), and magnesium silicate, and the shell forms a carbon coating, and has a specific range of conductivity, whereby the use of the complex as a negative electrode active material for a secondary battery can provide the secondary battery with an improvement in capacity as well as cycle characteristics and initial efficiency.

Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.

A mixed oxide of Si and at least one metal M comprising inorganic groups —SO.sub.3H. The addition of the mixed oxide to fluorinated polymers containing sulfonic acid functional groups increases their stability towards radical degradation when used in fuel cell applications.

A mixed oxide of Si and at least one metal M comprising inorganic groups —SO.sub.3H. The addition of the mixed oxide to fluorinated polymers containing sulfonic acid functional groups increases their stability towards radical degradation when used in fuel cell applications.

A process for the preparation of nanofilament particles of SiO.sub.x in which x is between 0.8 and 1.2, the process comprising: a step consisting of a fusion reaction between silica (SiO.sub.2) and silicon (Si), at a temperature of at least about 1410° C., to produce gaseous silicon monoxide (SiO); and a step consisting of condensation of the gaseous SiO to produce the SiO.sub.x nanofilament particles. The process may also comprising using carbon.

A process for the preparation of nanofilament particles of SiO.sub.x in which x is between 0.8 and 1.2, the process comprising: a step consisting of a fusion reaction between silica (SiO.sub.2) and silicon (Si), at a temperature of at least about 1410° C., to produce gaseous silicon monoxide (SiO); and a step consisting of condensation of the gaseous SiO to produce the SiO.sub.x nanofilament particles. The process may also comprising using carbon.

One-pot synthetic methods are disclosed for synthesizing curable, antimicrobial silsesquioxane-silica hybrids by hydrolytically co-condensing a tetraalkoxysilane with two different trialkoxysilanes. Particles are also disclosed that are substantially spherical and have an ordered lamellar internal structure. In addition, polymers prepared front the curable, antimicrobial silsesquioxane-silica hybrids and co-monomers are disclosed.

One-pot synthetic methods are disclosed for synthesizing curable, antimicrobial silsesquioxane-silica hybrids by hydrolytically co-condensing a tetraalkoxysilane with two different trialkoxysilanes. Particles are also disclosed that are substantially spherical and have an ordered lamellar internal structure. In addition, polymers prepared front the curable, antimicrobial silsesquioxane-silica hybrids and co-monomers are disclosed.

According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.

According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.