Ligand-capped scattering nanoparticles, curable ink compositions containing the ligand-capped scattering nanoparticles, and methods of forming films from the ink compositions are provided. Also provided are cured films formed by curing the ink compositions and photonic devices incorporating the films. The ligands bound to the inorganic scattering nanoparticles include a head group and a tail group. The head group includes a polyamine chain and binds the ligands to the nanoparticle surface. The tail group includes a polyalkylene oxide chain.

Ligand-capped scattering nanoparticles, curable ink compositions containing the ligand-capped scattering nanoparticles, and methods of forming films from the ink compositions are provided. Also provided are cured films formed by curing the ink compositions and photonic devices incorporating the films. The ligands bound to the inorganic scattering nanoparticles include a head group and a tail group. The head group includes a polyamine chain and binds the ligands to the nanoparticle surface. The tail group includes a polyalkylene oxide chain.

An aqueous or organic solvent medium for additive manufacturing technologies comprising a nanocrystal comprising a functional group. The nanocrystal material is selected from a metal oxide, fluoride, metallic, carbon-based, semiconducting quantum dot or combinations thereof. The functional group comprises primary amine, carboxylic acid, lactam ring, polyamide polymer chain or group used to attach a similar functional group.

An aqueous or organic solvent medium for additive manufacturing technologies comprising a nanocrystal comprising a functional group. The nanocrystal material is selected from a metal oxide, fluoride, metallic, carbon-based, semiconducting quantum dot or combinations thereof. The functional group comprises primary amine, carboxylic acid, lactam ring, polyamide polymer chain or group used to attach a similar functional group.

A method for producing a particle, containing a step of heating a mixture containing TiH.sub.2 and TiO.sub.2 at 700 to 900° C., wherein a molar ratio of the TiH.sub.2 to the TiO.sub.2 contained in the mixture is 3.1 to 4.6. A particle having a crystal composition composed of Ti.sub.2O.sub.3 and γ-Ti.sub.3O.sub.5, wherein a molar ratio of the Ti.sub.2O.sub.3 to the γ-Ti.sub.3O.sub.5 is 0.1 or more.

An electromagnetic wave absorbing sheet includes a metallic base and an electromagnetic wave absorption film formed on the metallic base. The electromagnetic wave absorption film contains MTC-substituted ε—Fe.sub.2O.sub.3, black titanium oxide, a conductive filler, and a resin. The MTC-substituted ε—Fe.sub.2O.sub.3 is a crystal belonging to the same space group as an ε—Fe.sub.2O.sub.3 crystal and containing Ti, Co, Fe, and at least one element selected from the group consisting of Ga, In, Al, and Rh. The proportion of the conductive filler to the electromagnetic wave absorption film is equal to or greater than 0.1% by volume and equal to or less than 10% by volume.

A dielectric composition including a metal oxide particle including a diameter of 5 nanometers or less capped with an organic ligand at at least a 1:1 ratio. A method including synthesizing metal oxide particles including a diameter of 5 nanometers or less; and capping the metal oxide particles with an organic ligand at at least a 1:1 ratio. A method including forming an interconnect layer on a semiconductor substrate; forming a first hardmask material and a different second hardmask material on the interconnect layer, wherein at least one of the first hardmask material and the second hardmask material is formed over an area of interconnect layer target for a via landing and at least one of the first hardmask material and the second hardmask material include metal oxide nanoparticles; and forming an opening to the interconnect layer selectively through one of the first hardmask material and the second hardmask material.

A dielectric composition including a metal oxide particle including a diameter of 5 nanometers or less capped with an organic ligand at at least a 1:1 ratio. A method including synthesizing metal oxide particles including a diameter of 5 nanometers or less; and capping the metal oxide particles with an organic ligand at at least a 1:1 ratio. A method including forming an interconnect layer on a semiconductor substrate; forming a first hardmask material and a different second hardmask material on the interconnect layer, wherein at least one of the first hardmask material and the second hardmask material is formed over an area of interconnect layer target for a via landing and at least one of the first hardmask material and the second hardmask material include metal oxide nanoparticles; and forming an opening to the interconnect layer selectively through one of the first hardmask material and the second hardmask material.

Provided is a cathode active material comprising a lithium composite oxide and a covering material which covers a surface of the lithium composite oxide. The lithium composite oxide is a multi-phase mixture including a first phase having a crystal structure which belongs to a monoclinic crystal; a second phase having a crystal structure which belongs to a hexagonal crystal; and a third phase having a crystal structure which belongs to a cubical crystal. The lithium composite oxide has an integral intensity ratio I.sub.(18°-20°)/I.sub.(43°-46°) of not less than 0.05 and not more than 0.99, where the integral intensity I.sub.(α°-β°) is an integral intensity of a peak which is a maximum peak present within a range of a diffraction angle 2θ of not less than α° and not more than β° in an X-ray diffraction pattern of the lithium composite oxide. The covering material has an electronic conductivity of not more than 10.sup.6 S/m.

Provided is a cathode active material comprising a lithium composite oxide and a covering material which covers a surface of the lithium composite oxide. The lithium composite oxide is a multi-phase mixture including a first phase having a crystal structure which belongs to a monoclinic crystal; a second phase having a crystal structure which belongs to a hexagonal crystal; and a third phase having a crystal structure which belongs to a cubical crystal. The lithium composite oxide has an integral intensity ratio I.sub.(18°-20°)/I.sub.(43°-46°) of not less than 0.05 and not more than 0.99, where the integral intensity I.sub.(α°-β°) is an integral intensity of a peak which is a maximum peak present within a range of a diffraction angle 2θ of not less than α° and not more than β° in an X-ray diffraction pattern of the lithium composite oxide. The covering material has an electronic conductivity of not more than 10.sup.6 S/m.