There is provided a near-infrared absorbing fine particle dispersion liquid containing near-infrared absorbing fine particles, thereby as well as exhibiting near-infrared light absorption properties and suppressing a scorching sensation on the skin when used in structures such as window materials and the like, also enabling usage of communication devices, imaging devices, sensors and the like that employ near-infrared light through these structures, a near-infrared absorbing film or a near-infrared absorbing glass, a dispersion body or a laminated transparent substrate, the dispersion liquid containing at least composite tungsten oxide fine particles and antimony doped tin oxide fine particles and/or tin doped indium oxide fine particles as near-infrared absorbing fine particles, wherein in the composite tungsten oxide fine particles, an average value of a transmittance in a wavelength range of 800 to 900 nm is 30% or more and 60% or less, and an average value of a transmittance in a wavelength range of 1200 to 1500 nm is 20% or less, and a transmittance at a wavelength of 2100 nm is 22% or less, when a visible light transmittance is 85% at the time of calculating only light absorption by the composite tungsten oxide fine particles, and containing mixed particles of the composite tungsten oxide fine particles and antimony-doped tin oxide fine particles and/or tin-doped indium oxide fine particles dispersed in a liquid medium, wherein the liquid medium is selected from rater, an organic solvent, an oil and fat, a liquid resin, a liquid plasticizer for plastics, or a mixture thereof, wherein when a visible light transmittance is adjusted to 85% at the time of calculating only light absorption by the near-infrared absorbing fine particles in the dispersion liquid by diluting with the liquid medium, an average value of a transmittance in the wavelength range of 800 to 900 nm is 30% or more and 60% or less, an average value of a transmittance in the wavelength range of 1200 to 1500 nm is 20% or less, and a transmittance at the wavelength of 2100 nm is 11% or less.

There is provided a near-infrared absorbing fine particle dispersion liquid containing near-infrared absorbing fine particles, thereby as well as exhibiting near-infrared light absorption properties and suppressing a scorching sensation on the skin when used in structures such as window materials and the like, also enabling usage of communication devices, imaging devices, sensors and the like that employ near-infrared light through these structures, a near-infrared absorbing film or a near-infrared absorbing glass, a dispersion body or a laminated transparent substrate, the dispersion liquid containing at least composite tungsten oxide fine particles and antimony doped tin oxide fine particles and/or tin doped indium oxide fine particles as near-infrared absorbing fine particles, wherein in the composite tungsten oxide fine particles, an average value of a transmittance in a wavelength range of 800 to 900 nm is 30% or more and 60% or less, and an average value of a transmittance in a wavelength range of 1200 to 1500 nm is 20% or less, and a transmittance at a wavelength of 2100 nm is 22% or less, when a visible light transmittance is 85% at the time of calculating only light absorption by the composite tungsten oxide fine particles, and containing mixed particles of the composite tungsten oxide fine particles and antimony-doped tin oxide fine particles and/or tin-doped indium oxide fine particles dispersed in a liquid medium, wherein the liquid medium is selected from rater, an organic solvent, an oil and fat, a liquid resin, a liquid plasticizer for plastics, or a mixture thereof, wherein when a visible light transmittance is adjusted to 85% at the time of calculating only light absorption by the near-infrared absorbing fine particles in the dispersion liquid by diluting with the liquid medium, an average value of a transmittance in the wavelength range of 800 to 900 nm is 30% or more and 60% or less, an average value of a transmittance in the wavelength range of 1200 to 1500 nm is 20% or less, and a transmittance at the wavelength of 2100 nm is 11% or less.

A method for manufacturing a tungsten trioxide/silicon nanocomposite structure includes steps as follows. A silicon substrate is provided, wherein a surface of the silicon substrate is formed with a plurality of microstructures. A tungsten trioxide precursor solution is provided, wherein the tungsten trioxide precursor solution is contacted with the silicon substrate. A hydrothermal synthesis step is conducted, wherein the tungsten trioxide precursor solution is reacted to form a plurality of tungsten trioxide particles on the plurality of microstructures, so as to obtain the tungsten trioxide/silicon nanocomposite structure.

A method for manufacturing a tungsten trioxide/silicon nanocomposite structure includes steps as follows. A silicon substrate is provided, wherein a surface of the silicon substrate is formed with a plurality of microstructures. A tungsten trioxide precursor solution is provided, wherein the tungsten trioxide precursor solution is contacted with the silicon substrate. A hydrothermal synthesis step is conducted, wherein the tungsten trioxide precursor solution is reacted to form a plurality of tungsten trioxide particles on the plurality of microstructures, so as to obtain the tungsten trioxide/silicon nanocomposite structure.

The present invention relates to a method for synthesizing tungsten oxide nanoparticles and to the tungsten oxide nanoparticles obtainable on the basis of the claimed synthesis method.

The present invention relates to a method for synthesizing tungsten oxide nanoparticles and to the tungsten oxide nanoparticles obtainable on the basis of the claimed synthesis method.

A W.sub.18O.sub.49 peak is confirmed by X-ray diffraction analysis of a sputtering surface and a cross section orthogonal to the sputtering surface, a ratio I.sub.S(103)/I.sub.S(010) of a diffraction intensity I.sub.S(103) of a (103) plane to a diffraction intensity I.sub.S(010) of a (010) plane of W.sub.18O.sub.49 of the sputtering surface is 0.57 or more, a ratio I.sub.C(103)/I.sub.C(010) of a diffraction intensity I.sub.C(103) of the (103) plane to a diffraction intensity I.sub.C(010) of the (010) plane of W.sub.18O.sub.49 of the cross section is 0.38 or less, and an area ratio of the W.sub.18O.sub.49 phase of a surface parallel to the sputtering surface is 37% or more.

A W.sub.18O.sub.49 peak is confirmed by X-ray diffraction analysis of a sputtering surface and a cross section orthogonal to the sputtering surface, a ratio I.sub.S(103)/I.sub.S(010) of a diffraction intensity I.sub.S(103) of a (103) plane to a diffraction intensity I.sub.S(010) of a (010) plane of W.sub.18O.sub.49 of the sputtering surface is 0.57 or more, a ratio I.sub.C(103)/I.sub.C(010) of a diffraction intensity I.sub.C(103) of the (103) plane to a diffraction intensity I.sub.C(010) of the (010) plane of W.sub.18O.sub.49 of the cross section is 0.38 or less, and an area ratio of the W.sub.18O.sub.49 phase of a surface parallel to the sputtering surface is 37% or more.

A heat ray shielding fine particle dispersion body and a heat ray shielding laminated transparent substrate that as well as exhibit heat ray shielding properties and suppressing a scorching sensation on the skin when used in structures such as window materials and the like, also enable usage of communication devices, imaging devices, sensors and the like that use near-infrared light interposing the heat ray shielding film or the heat ray shielding glass, containing a transparent thermoplastic resin, and wherein heat ray shielding fine particles are dispersed in the transparent thermoplastic resin, the heat ray shielding fine particles having elements L, M, tungsten, and oxygen, and a hexagonal crystal structure represented by a general formula (L.sub.AM.sub.B) W.sub.CO.sub.D, wherein the element L is an element selected from K, Rb, Cs, and the element M is one or more elements selected from K, Rb, and Cs and is different from the element L.

A method for manufacturing an environmental-friendly heat shielding film using a non-radioactive stable isotope includes: a substrate layer providing step of providing a substrate layer; and a heat shielding layer forming step of, after the substrate layer providing step, forming, on one surface of the substrate layer, a heat shielding layer containing a non-radioactive stable isotope tungsten bronze compound that does not emit radiation.