The present disclosure provides a method and an apparatus for manufacturing a porous graphene layer across a precursor material layer on a substrate. The method comprises: determining a first temperature threshold and a second temperature threshold, the first temperature threshold being a minimum temperature required for forming the porous graphene layer from a precursor material layer on a portion of the substrate, the second temperature threshold being one at which the substrate is likely to experience thermal damages above this temperature threshold; determining at least one of operating parameters of a light source, wherein exposing the precursor material layer to the light source that is operating under the at least one of the operating parameters causes a temperature of the portion of the substrate adjoining a side of the precursor material layer to maintain below the second temperature threshold and a temperature of the opposite side of the precursor material layer to rise above the first temperature threshold; and generating an a beam of light from the light source to the precursor material layer based on the at least one of operating parameters of the light source to form the porous graphene layer.

The present invention provides a composite oxide that can achieve a high low-temperature output characteristic, a method for manufacturing the same, and a positive electrode active material in which the generation of soluble lithium is suppressed and a problem of gelation is not caused during the paste preparation. A positive electrode active material for non-aqueous electrolyte secondary batteries, including a lithium-metal composite oxide powder including a secondary particle configured by aggregating primary particles containing lithium, nickel, manganese, and cobalt, or a lithium-metal composite oxide powder including both the primary particles and the secondary particle. The secondary particle has a porous structure inside as a main inside structure, the slurry pH is 11.5 or less, the soluble lithium content rate is 0.5[% by mass] or less, the specific surface area is 3.0 to 4.0 [m.sup.2/g], and the porosity is more than 50 to 80[%].

Disclosed is an infill for an artificial turf field, the infill comprising: from about 40 wt. % to about 60 wt. % of a polyvinyl chloride resin; from about 5 wt. % to about 30 wt. % of a plasticizer derived from a naturally occurring source; from about 2 wt. % to about 10 wt. % of a reflective pigment; from about 0.01 wt. % to about 0.1 wt. % of a blowing agent; and from about 5 wt. % to about 30 wt. % of a filler. The infill is pelletized and maintains the temperature of an artificial turf field, when disposed throughout the artificial turf field, at a temperature about 15° F. to about 25° F. less than a temperature of a comparative artificial turf under substantially similar ambient and environmental conditions, wherein a comparative infill of the comparative artificial turf consists essentially of crumbed rubber infill.

Fumed silica powder, surface treated with a surface treatment agent selected from the group consisting of organosilanes, silazanes, acyclic polysiloxanes, cyclic polysiloxanes, and mixtures thereof, wherein the powder has: a) a number of silanol groups relative to BET surface area d.sub.SiOH of at least 0.85 SiOH/nm.sup.2, as determined by reaction with lithium aluminium hydride; b) a methanol wettability of more than 40% by volume of methanol in methanol-water mixture; c) a tamped density of not more than 200 g/L.

A titanium sulfide (TiS) nanomaterial and a composite material thereof for wave absorption are disclosed. The TiS nanomaterial is in a form of dispersed micro-particles which are bulks formed by stacking two-dimensional nano-sheets. The TiS nanomaterial is a bulk formed by stacking two-dimensional nano-sheets, thereby having a laminated structure that improves the wave absorption effect. In addition, experimental results demonstrate that the TiS nanomaterial with a dose of 40 wt% has the most excellent wave absorption performance, with a minimum reflection loss up to -47.4 dB, an effective absorption bandwidth of 5.9 GHz and an absorption peak frequency of 6.8 GHz, which are superior to those of existing two-dimensional bulk materials. One of reasons for the excellent wave absorption performance of the TiS nanomaterial may be because the laminated micro-morphology of TiS results in the electromagnetic wave refraction loss.

A powdered catalyst material on a titanium oxide basis. The powdered catalyst material includes a combined content of at least 90 wt.-% of a hydrated titanium oxide having the general formula TiO.sub.(2-x)(OH).sub.2x, with 0<x≤1, (calculated as TiO.sub.2), and a silicon dioxide and hydrated precursors of the silicon dioxide (calculated as SiO.sub.2). A weight ratio of TiO.sub.2/SiO.sub.2, determined for TiO.sub.2 and SiO.sub.2 respectively, is at least 3 and less than 30. The wt.-% is based on a total weight of the catalyst material after the catalyst material has been dried at 105° C. for at least 2 hours. The powdered catalyst material has a specific surface area of >300 m.sup.2/g and an isoelectric point of from 4.0 to 7.0.

A method is provided for producing an article which is transparent to near-wave IR, mid-wave and Long-wave multi-spectral and IR wavelength in the region of 0.4 μm to 16 μm. The method includes the steps of (a) Producing ultra-fine powder of CaLa.sub.2S.sub.4 via SPLTS process, (b) followed by pretreatment of the ultra-fine powder under inert and reducing gas conditions including H.sub.2 or Argon or N.sub.2 or H.sub.2/H.sub.2S, H.sub.2S, and mixtures there of (c) followed by sieving the powder in 140 mesh screen and cold pressing the powder at 7000 psi for 7 min. into a disk shaped green body (d) then Cold-Isostatic Pressing (CIP) at 40,000 psi for 5 min in a rubber mold (e) finally sintered article of CaLa.sub.2S.sub.4 disk of 25.4 mm diameter with ultra-high density containing cubic phase of CaLa.sub.2S.sub.4 to yield IR transmission of a peak value of 57% within the IR wavelength range of 2 μm to 16 μm, either by using microwave sintering followed by hot isostatic press or spark plasma sintering followed by hot isostatic press or vacuum sintering at (3×10.sup.−6 torr) followed by hot isostatic press or hot press sintering followed by hot isostatic press and finally followed by mirror polished IR article, is obtained.

A near-infrared absorbing material fine particle dispersion, a near-infrared absorber laminate, and a laminated structure for near-infrared absorption can exhibit higher near-infrared absorption property, compared to near-infrared fine particle dispersions, near-infrared absorber laminates, and laminated structures for near-infrared absorption, containing tungsten oxides or composite tungsten oxides according to the conventional art. Also, a near-infrared absorbing material fine particle dispersion in which composite tungsten oxide fine particles, each particle containing a hexagonal crystal structure, and a polymer compound with maleic anhydride introduced therein are contained in the polypropylene resin, and the near-infrared absorber laminate and the laminated structure for near-infrared absorption using the dispersion.

Ligand-capped scattering nanoparticles, curable ink compositions containing the ligand-capped scattering nanoparticles, and methods of forming films from the ink compositions are provided. Also provided are cured films formed by curing the ink compositions and photonic devices incorporating the films. The ligands bound to the inorganic scattering nanoparticles include a head group and a tail group. The head group includes a polyamine chain and binds the ligands to the nanoparticle surface. The tail group includes a polyalkylene oxide chain.

The present invention is polishing particles for polishing a synthetic quartz glass substrate. The polishing particles contain cerium-based polishing particles and have a breaking strength, which is measured by a compression tester, of 30 MPa or more. This provides polishing particles for polishing a synthetic quartz glass substrate while sufficiently reducing generation of defects due to polishing.